公开(公告)号：US20180011029A1

公开(公告)日：2018-01-11

申请号：US15641579

申请日：2017-07-05

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus TINNEMANS ,  Nan Lin ,  Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen

IPC: G01N21/88 ,  G02F1/35 ,  G01N21/47 ,  G01N21/956

CPC classification number: G01N21/8806 ,  G01N21/4788 ,  G01N21/956 ,  G01N2021/95676 ,  G01N2201/0697 ,  G02F1/353 ,  G03F7/70008 ,  G03F7/70616

Abstract: Disclosed is an illumination source for generating measurement radiation for an inspection apparatus. The source generates at least first measurement radiation and second measurement radiation such that the first measurement radiation and the second measurement radiation interfere to form combined measurement radiation modulated with a beat component. The illumination source may be a HHG source. Also disclosed is an inspection apparatus comprising such a source and an associated inspection method.

公开(公告)号：US12269229B2

公开(公告)日：2025-04-08

申请号：US17433774

申请日：2020-01-28

Applicant: ASML Netherlands B.V.

Inventor： Sander Bas Roobol ,  Sietse Thijmen Van Der Post

IPC: B29D11/00 ,  G03F7/00

Abstract: Disclosed is a method of manufacturing a reflector. The method comprises polishing (520) at least the uppermost surface of the uppermost substantially flat substrate of a plurality of substantially flat substrates, deforming (530) each substantially flat substrate into the desired shape, and bonding (540) the deformed substrates together to form said reflector. In an embodiment, the deforming and bonding is performed together using a mold.

公开(公告)号：US11626704B2

公开(公告)日：2023-04-11

申请号：US15902454

申请日：2018-02-22

Applicant: ASML Netherlands B.V.

Inventor： Sietse Thijmen Van Der Post ,  Sander Bas Roobol ,  Pavel Evtushenko

IPC: H01S3/0959 ,  H01S3/00 ,  G03F7/20 ,  H01S3/109 ,  H01J47/02 ,  H01S3/0971 ,  H01L21/263 ,  H05G2/00

Abstract: A radiation source arrangement causes interaction between pump radiation (340) and a gaseous medium (406) to generate EUV or soft x-ray radiation by higher harmonic generation (HHG). The operating condition of the radiation source arrangement is monitored by detecting (420/430) third radiation (422) resulting from an interaction between condition sensing radiation and the medium. The condition sensing radiation (740) may be the same as the first radiation or it may be separately applied. The third radiation may be for example a portion of the condition sensing radiation that is reflected or scattered by a vacuum-gas boundary, or it may be lower harmonics of the HHG process, or fluorescence, or scattered. The sensor may include one or more image detectors so that spatial distribution of intensity and/or the angular distribution of the third radiation may be analyzed. Feedback control based on the determined operating condition stabilizes operation of the HHG source.

公开(公告)号：US11353796B2

公开(公告)日：2022-06-07

申请号：US16556603

申请日：2019-08-30

Applicant: ASML Netherlands B.V.

Inventor： Teis Johan Coenen ,  Han-Kwang Nienhuys ,  Sandy Claudia Scholz ,  Sander Bas Roobol

IPC: G03F7/20 ,  G21K1/06 ,  G01T1/29

Abstract: Methods and apparatus for determining an intensity profile of a radiation beam. The method comprises providing a diffraction structure, causing a relative movement of the diffraction structure relative to the radiation beam from a first position, wherein the radiation beam does not irradiate the diffraction structure to a second position, wherein the radiation beam irradiates the diffraction structure, measuring, with a radiation detector, diffracted radiation signals produced from a diffraction of the radiation beam by the diffraction structure as the diffraction structure transitions from the first position to the second position or vice versa, and determining an intensity profile of the radiation beam based on the measured diffracted radiation signals.

公开(公告)号：US10649344B2

公开(公告)日：2020-05-12

申请号：US15788258

申请日：2017-10-19

Applicant: ASML Netherlands B.V.

Inventor： Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen

IPC: G03F7/20 ,  G01N21/956 ,  H01S3/00 ,  G01N21/47 ,  G01N21/88 ,  G02F1/35 ,  H05G2/00 ,  G02B5/10

Abstract: Disclosed is an illumination source apparatus comprising a high harmonic generation medium, a pump radiation source and a spatial filter. The pump radiation source emits a beam of pump radiation having a profile comprising no pump radiation in a central region of the beam and excites the high harmonic generation medium so as to generate high harmonic radiation. The pump radiation and the generated high harmonic radiation are spatially separated beyond the focal plane of the beam of pump radiation. The spatial filter is located beyond a focal plane of the beam of pump radiation, and blocks the pump radiation. Also disclosed is a method of generating high harmonic measurement radiation optimized for filtration of pump radiation therefrom.

公开(公告)号：US10578979B2

公开(公告)日：2020-03-03

申请号：US16279001

申请日：2019-02-19

Applicant: ASML Netherlands B.V.

Inventor： Sietse Thijmen Van Der Post ,  Ferry Zijp ,  Sander Bas Roobol

IPC: G03B27/54 ,  G03F7/20

Abstract: A method involving a radiation intensity distribution for a target measured using an optical component at a gap from the target, the method including: determining a value of a parameter of interest using the measured radiation intensity distribution and a mathematical model describing the target, the model including an effective medium approximation for roughness of a surface of the optical component or a part thereof.

公开(公告)号：US10530111B2

公开(公告)日：2020-01-07

申请号：US15903392

申请日：2018-02-23

Applicant: ASML Netherlands B.V.

Inventor： Sudhir Srivastava ,  Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen ,  Nan Lin ,  Sjoerd Nicolaas Lambertus Donders ,  Krijn Frederik Bustraan ,  Petrus Wilhelmus Smorenburg ,  Gerrit Jacobus Hendrik Brussaard

IPC: G03F7/20 ,  H01S3/00 ,  H05G2/00 ,  G03F1/84 ,  G01N21/956 ,  G02F1/35 ,  G01N21/88

Abstract: Disclosed is gas delivery system which is suitable for a high harmonic generation (HHG) radiation source which may be used to generate measurement radiation for an inspection apparatus. In such a radiation source, a gas delivery element delivers gas in a first direction. The gas delivery element has an optical input and an optical input, defining an optical path running in a second direction. The first direction is arranged relative to the second direction at an angle that is not perpendicular or parallel. Also disclosed is a gas delivery element having a gas jet shaping device, or a pair of gas delivery elements, one of which delivers a second gas, such that the gas jet shaping device or second gas is operable to modify a flow profile of the gas such that the number density of the gas falls sharply.

公开(公告)号：US20190212657A1

公开(公告)日：2019-07-11

申请号：US16351771

申请日：2019-03-13

Applicant: ASML Netherlands B.V.

Inventor： Sudhir SRIVASTAVA ,  Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen ,  Nan Lin ,  Sjoerd Nicolaas Lambertus Donders ,  Krijn Frederik Bustraan ,  Petrus Wilhelmus Smorenburg ,  Gerrit Jacobus Hendrik Brussaard

IPC: G03F7/20 ,  G01N21/956 ,  G03F1/84

CPC classification number: G03F7/7085 ,  G01N21/8806 ,  G01N21/956 ,  G02F2001/354 ,  G03F1/84 ,  G03F7/70616 ,  G03F7/7065 ,  G03F7/70883 ,  H01S3/00 ,  H01S3/0092 ,  H05G2/008

Abstract: Disclosed is a high harmonic generation (HHG) radiation source which may be used to generate measurement radiation for an inspection apparatus. In such a radiation source, a pump radiation source is operable to emit pump radiation at a high harmonic generation gas medium thereby exciting the high harmonic generation gas medium within a pump radiation interaction region so as to generate the high harmonic radiation and an ionization radiation source is operable to emit ionization radiation at the high harmonic generation gas medium to ionize a gas at an ionization region between the pump radiation interaction region and an optical output of the illumination source.

公开(公告)号：US10330606B2

公开(公告)日：2019-06-25

申请号：US15683216

申请日：2017-08-22

Applicant: ASML Netherlands B.V.

Inventor： Peter Danny Van Voorst ,  Nan Lin ,  Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen ,  Sietse Thijmen Van Der Post

IPC: G01N21/88 ,  G03F7/20 ,  G01N21/95 ,  H05G2/00 ,  G01N21/956

Abstract: Disclosed is an inspection apparatus and associated method for measuring a target structure on a substrate. The inspection apparatus comprises an illumination source for generating measurement radiation; an optical arrangement for focusing the measurement radiation onto said target structure; and a compensatory optical device. The compensatory optical device may comprise an SLM operable to spatially modulate the wavefront of the measurement radiation so as to compensate for a non-uniform manufacturing defect in said optical arrangement. In alternative embodiments, the compensatory optical device may be located in the beam of measurement radiation, or in the beam of pump radiation used to generate high harmonic radiation in a HHG source. Where located in in the beam of pump radiation, the compensatory optical device may be used to correct pointing errors, or impart a desired profile or varying illumination pattern in a beam of the measurement radiation.

公开(公告)号：US10067068B2

公开(公告)日：2018-09-04

申请号：US15388463

申请日：2016-12-22

Applicant: ASML Netherlands B.V.

Inventor： Arie Jeffrey Den Boef ,  Simon Gijsbert Josephus Mathijssen ,  Nan Lin ,  Sander Bas Roobol

IPC: G03F7/20 ,  G03F9/00 ,  G01N21/88

Abstract: A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. A lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs). The lithographic apparatus has an inspection apparatus with an illumination system that utilizes illuminating radiation with a wavelength of 2-40 nm. The illumination system includes an optical element that splits the illuminating radiation into a first and a second illuminating radiation and induces a time delay to the first or the second illuminating radiation. A detector detects the radiation that has been scattered by a target structure. The inspection apparatus has a processing unit operable to control a time delay between the first scattered radiation and the second scattered radiation so as to optimize a property of the combined first and second scattered radiation.