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    SYSTEMS AND METHODS FOR PREDICTING LAYER DEFORMATION
    13.
    发明申请
    SYSTEMS AND METHODS FOR PREDICTING LAYER DEFORMATION 审中-公开

    公开(公告)号：US20200320238A1

    公开(公告)日：2020-10-08

    申请号：US16763376

    申请日：2018-11-29

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Chrysostomos BATISTAKIS ,  Scott Anderson MIDDLEBROOKS ,  Sander Frederik WUISTER

    IPC: G06F30/28 ,  G03F7/20

    Abstract: A method involving obtaining a resist deformation model for simulating a deformation process of a pattern in resist, the resist deformation model being a fluid dynamics model configured to simulate an intrafluid force acting on the resist, performing, using the resist deformation model, a computer simulation of the deformation process to obtain a deformation of the developed resist pattern for an input pattern to the resist deformation model, and producing electronic data representing the deformation of the developed resist pattern for the input pattern.

    METHOD OF SIMULATING FORMATION OF LITHOGRAPHY FEATURES BY SELF-ASSEMBLY OF BLOCK COPOLYMERS
    15.
    发明申请
    METHOD OF SIMULATING FORMATION OF LITHOGRAPHY FEATURES BY SELF-ASSEMBLY OF BLOCK COPOLYMERS 审中-公开
    通过块状共聚物自组装模拟成像特征的方法

    公开(公告)号：US20160078160A1

    公开(公告)日：2016-03-17

    申请号：US14890867

    申请日：2014-05-05

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Sander Frederik WUISTER ,  Tamara DRUZHININA ,  Jan VAN MALE ,  Joanne KLEIN-WOLTERINK ,  Davide AMBESI

    IPC: G06F17/50

    CPC classification number: G06F17/5009 ,  G03F7/0002 ,  G06F17/5081 ,  G06F2217/12

    Abstract: A method of determining an uncertainty in the position of a domain within a self-assembly block copolymer (BCP) feature. The method includes simulating a BCP feature, calculating a minimum energy position of a first domain within the simulated BCP feature, simulating the application of a potential that causes the position of the first domain to be displaced from the minimum energy position, simulating release of the potential back toward the minimum energy, recording a plurality of energies of the BCP feature during the release and recording at each of the plurality of energies a displacement of the first domain from the minimum energy position, calculating, from the recorded energies and recorded displacements, a probability distribution indicating a probability of the first domain being displaced from the minimum energy position, and, from the probability distribution, calculating an uncertainty in the position of the first domain within the BCP feature.

    Abstract translation: 确定自组装嵌段共聚物（BCP）特征中域的位置的不确定性的方法。 该方法包括模拟BCP特征，计算模拟BCP特征中的第一域的最小能量位置，模拟使第一域的位置从最小能量位置移位的电位的应用，模拟BCP特征的释放 在释放期间记录多个能量的BCP特征，并且在多个能量中的每一个处记录第一域从最小能量位置的位移，从记录的能量和记录的位移计算出， 指示第一域从最小能量位置移位的概率的概率分布，并且从概率分布计算BCP特征中的第一域的位置的不确定性。

    METHOD FOR CONTROLLING A MANUFACTURING APPARATUS AND ASSOCIATED APPARATUSES
    18.
    发明申请
    METHOD FOR CONTROLLING A MANUFACTURING APPARATUS AND ASSOCIATED APPARATUSES 审中-公开

    公开(公告)号：US20200310254A1

    公开(公告)日：2020-10-01

    申请号：US16765595

    申请日：2018-12-10

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Marleen KOOIMAN ,  Sander Frederik WUISTER

    IPC: G03F7/20 ,  G01N21/956

    Abstract: A method of predicting the dominant failure mode and/or the failure rate of a plurality of features formed on a substrate, and an associated inspection apparatus. The method may include determining a placement metric for each feature, the placement metric including a measure of whether the feature is in an expected position, and comparing a distribution of the placement metric to a reference (e.g., Gaussian) distribution. The placement metric may include a boundary metric for a plurality of boundary points on a boundary defining each feature, the boundary metric including a measure of whether a boundary point is in an expected position. The dominant failure mode and/or the failure rate of the plurality of features is predicted from the comparison.

    RESIST COMPOSITIONS
    19.
    发明申请
    RESIST COMPOSITIONS 审中-公开

    公开(公告)号：US20190129301A1

    公开(公告)日：2019-05-02

    申请号：US16301465

    申请日：2017-04-21

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Willem-Pieter VOORTHUIJZEN ,  Marie-Claire VAN LARE ,  Sander Frederik WUISTER

    IPC: G03F7/004 ,  G03F7/039 ,  G03F7/038 ,  G03F7/20 ,  G03F7/32 ,  G03F7/16 ,  H01L21/027

    Abstract: A resist composition having a) metal-containing nanoparticles and/or nanoclusters, and b) ligands and or organic linkers, wherein one or both of a) or b) are multivalent. A resist composition wherein: the resist composition is a negative resist and the nanoparticles and/or nanoclusters cluster upon crosslinking of the ligands and/or organic linkers following exposure to electromagnetic radiation or an electron beam; or the resist composition is a negative resist and the ligands and/or organic linkers are crosslinked and the crosslinking bonds are broken upon exposure to electromagnetic radiation or an electron beam allowing the nanoparticles and/or nanoclusters to cluster together; or the resist composition is a positive resist and the ligands and/or organic linkers are crosslinked and the crosslinking bonds are broken upon exposure to electromagnetic radiation or an electron beam.

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