16.
    发明专利
    未知

    公开(公告)号:DE59005153D1

    公开(公告)日:1994-05-05

    申请号:DE59005153

    申请日:1990-04-24

    Applicant: BASF AG

    Abstract: The UV-curable compositions are based on a binder preparation comprising (1) from 99.0 to 20% by weight of a copolymer, (2) from 1.0 to 80% by weight of monoolefinically unsaturated compounds and (3) from 0.0 to 20% by weight of olefinically polyunsaturated compounds and are characterised in that the copolymer (1) is obtainable by subjecting a mixture of (A) from 80 to 99.9% by weight of olefinically unsaturated monomers, (B) from 0 to 10% by weight of a copolymerisable olefinically unsaturated photoinitiator, and (C) from 0 to 10% by weight of a polymerisation-regulating photoinitiator to free-radical polymerisation, where the sum of (B) and (C) is at least 0.1% by weight and the stated percentages by weight are based on the sum of the weights of (A) + (B) + (C).

    18.
    发明专利
    未知

    公开(公告)号:DE58906664D1

    公开(公告)日:1994-02-24

    申请号:DE58906664

    申请日:1989-05-10

    Applicant: BASF AG

    Abstract: The invention relates to a radiation-sensitive mixture and to a process for the formation of relief patterns. The radiation-sensitive mixture contains (a) a polymeric binder which is insoluble in water and soluble in aqueous-alkaline solutions, and (b) an organic compound whose solubility in an aqueous-alkaline developer is increased by the action of acid and which contains at least one grouping cleavable by acid and additionally one grouping which forms a strong acid under the action of radiation, the polymeric binder (a) containing 5 to 35 mol% of copolymerised or co-condensed monomer units having acid-sensitive groupings, or the acid-sensitive groupings having been introduced by a polymer-analogous reaction. It is suitable for the formation of relief patterns.

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