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公开(公告)号:DK171353B1
公开(公告)日:1996-09-16
申请号:DK295979
申请日:1979-07-13
Applicant: BASF AG
Inventor: LECHTKEN PETER , BUETHE INGOLF , BRONSTERT BERND , HESSE ANTON , HOFFMANN GERHARD , JACOBI MANFRED , LYNCH JOHN , TRIMBORN WERNER , VYVIAL RUDOLF
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公开(公告)号:DK164933B
公开(公告)日:1992-09-07
申请号:DK327282
申请日:1982-07-21
Applicant: BASF AG
Inventor: LYNCH JOHN , ELZER ALBERT
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公开(公告)号:CA1261192A
公开(公告)日:1989-09-26
申请号:CA443944
申请日:1983-12-21
Applicant: BASF AG
Inventor: BRONSTERT BERND , HOFFMANN GERHARD , LYNCH JOHN
Abstract: Relief plates and printing plates are produced by a positive-working process, using a photopolymerizable layer which contains one or more photopolymerizable, olefinically unsaturated compounds, one or more photoinitiators which can be activated by UV light, and a combination of a phenothiazinium, phenoxazinium, phenazinium or acridinium dye wiht a mild reducing agent which, on exposure to visible light, is capable of reducing the dye in the excited electronic state. The photopolymerizable layer is exposed imagewise to light having a wavelength longer than 450 nm, and simultaneously or subsequently exposed uniformly to light having a wavelength of from 300 to 420 nm, after which the unpolymerized areas of the layer are removed.
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公开(公告)号:FI69085C
公开(公告)日:1985-12-10
申请号:FI840240
申请日:1984-01-20
Applicant: BASF AG
Inventor: LECHTKEN PETER , BUETHE INGOLF , BRONSTERT BERND , HESSE ANTON , HOFFMANN GERHARD , JACOBI MANFRED , LYNCH JOHN , TRIMBORN WERNER , VYVIAL RUDOLF
IPC: C08F20060101 , C08F2/50 , C08F261/04 , C08F283/00 , G03F7/00
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公开(公告)号:CA1176896A
公开(公告)日:1984-10-30
申请号:CA407734
申请日:1982-07-21
Applicant: BASF AG
Inventor: LYNCH JOHN , ELZER ALBERT , SCHOEFFEL GERHARD
Abstract: O.Z. 0050/35291 A photopolymer gravure printing plate which has improved hardness and abrasionresistance is produced by imagewise exposure of a layer which is applied to a base and comprises a photoinitiatorcontaining mixture of polymers and photopolymerizable monomers, development of the relief image by removing the unexposed areas of the layer, drying the resulting plate at from 60.degree. to 130.degree.C, and subsequently baking it at from 200.degree. to 260.degree.C to reduce its thickness by 10 to 50%.
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公开(公告)号:CA1129703A
公开(公告)日:1982-08-17
申请号:CA331828
申请日:1979-07-13
Applicant: BASF AG
Inventor: LECHTKEN PETER , BRONSTERT BERND , HOFFMANN GERHARD , VYVIAL RUDOLF , LYNCH JOHN
IPC: C07F9/32 , C07F9/40 , C07F9/46 , C07F9/48 , C07F9/53 , C08F2/48 , C08F2/50 , C08F283/00 , C08F291/18 , G03F7/029
Abstract: of the disclosure: A photopolymerizable recording composition which comprises a mixture, containing a photoinitiator, of a) a photopolymerizable olefinically unsaturated monomer and b) an organic polymeric binder, wherein the photoinitiator is an acylphosphine oxide compound of the formula R1R2PO-CO-R3, where R1 and R2 are certain organic radicals and R3 is tert.-alkyl or a cyclic radical with two substituents in the ortho-position to the carbonyl group. The recording compositions have a high reactivity when irradiated with W light and are used in particular for the preparation of printing plates, relief plates and photoresists.
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公开(公告)号:NO841028A
公开(公告)日:1980-01-15
申请号:NO841028
申请日:1984-03-16
Applicant: BASF AG
Inventor: LECHTKEN PETER , BUETHE INGOLF , BRONSTERT BERND , HESSE ANTON , HOFFMANN GERHARD , JACOBI MANFRED , LYNCH JOHN , TRIMBORN WERNER , VYVIAL RUDOLF
IPC: C08K20060101 , C08K5/53 , C08K
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公开(公告)号:NO792333A
公开(公告)日:1980-01-15
申请号:NO792333
申请日:1979-07-13
Applicant: BASF AG
Inventor: LECHTKEN PETER , BUETHE INGOLF , BRONSTERT BERND , HESSE ANTON , HOFFMANN GERHARD , JACOBI MANFRED , LYNCH JOHN , TRIMBORN WERNER , VYVIAL RUDOLF
IPC: C07F20060101 , C07F
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公开(公告)号:DE59703435D1
公开(公告)日:2001-05-31
申请号:DE59703435
申请日:1997-02-19
Applicant: BASF AG
Inventor: LYNCH JOHN , FISCHER DAVID , GOERTZ HANS-HELMUT , SCHWEIER GUENTHER
IPC: C08F2/14 , C08F2/18 , C08F4/02 , C08F4/60 , C08F4/642 , C08F4/646 , C08F4/659 , C08F4/6592 , C08F4/68 , C08F10/00 , C08F110/02
Abstract: Polymers of alkenes are prepared by suspension polymerization in the presence of catalyst systems by a process in which the catalyst systems used are supported catalyst systems obtainable by A) reaction of an inorganic carrier with a metal compound of the general formula I M1(R1)r(R2)s(R3)t(R4)u I where M1 is an alkali metal, an alkaline earth metal or a metal of main group III or IV of the Periodic Table, R1 is hydrogen, C1-C10-alkyl, C6-C15-aryl, alkylaryl or arylalkyl, each having 1 to 10 carbon atoms in the alkyl radical and 6 to 20 carbon atoms in the aryl radical, R2 to R4 are each hydrogen, halogen, C1-C10-alkyl, C6-C15-aryl, alkylaryl, arylalkyl, alkoxy or dialkylamino, each having 1 to 10 carbon atoms in the alkyl radical and 6 to 20 carbon atoms in the aryl radical, r is an integer from 1 to 4 and s, t and u are integers from 0 to 3, the sum r+s+t+u corresponding to the valency of M1, B) reaction of the material obtained according to A) with a metallocene complex in its metal dihalide form and a compound forming metallocenium ions and C) subsequent reaction with a metal compound of the general formula II M2(R5)o(R6)p(R7)q IIin which M2 is an alkali metal, an alkaline earth metal or a metal of main group III of the Periodic Table, R5 is hydrogen, C1-C10-alkyl, C6-C15-aryl, alkylaryl or arylalkyl, each having 1 to 10 carbon atoms in the alkyl radical and 6 to 20 carbon atoms in the aryl radical, R6 and R7 are each hydrogen, halogen, C1-C
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公开(公告)号:AT200786T
公开(公告)日:2001-05-15
申请号:AT97903319
申请日:1997-02-19
Applicant: BASF AG
Inventor: LYNCH JOHN , FISCHER DAVID , GOERTZ HANS-HELMUT , SCHWEIER GUENTHER
IPC: C08F4/12 , C08F4/44 , C08F4/60 , C08F4/619 , C08F4/6192 , C08F4/646 , C08F4/68 , C08F10/00 , C08F110/02
Abstract: Supported catalyst systems are obtainable byA) reaction of an inorganic carrier with a metal compound of the general formula I whereM1 is an alkali metal, an alkaline earth metal or a metal of main group III or IV of the Periodic Table,R1 is hydrogen, Ch1-C10-alkyl, C6-C15-aryl, alkylaryl or arylalkyl each having 1 to 10 carbon atoms in the alkyl radical and 6 to 20 carbon atoms in the aryl radical,R2 to R4 are each hydrogen, halogen, C1-C10-alkyl, C6-C15-aryl, alkylaryl, arylalkyl, alkoxy or dialkylamino each having 1 to 10 carbon atoms in the alkyl radical and 6 to 20 carbon atoms in the aryl radical,r is an integer from 1 to 4 ands, t and u are integers from 0 to 3 the sum r+s+t+u corresponding to the valency of M1,B) reaction of the material obtained according to A) with a metallocene complex in its metal dihalide form and a compound forming metallocenium ions andC) subsequent reaction with a metal compound of the general formula II whereM2 is an alkali metal, an alkaline earth metal or a metal of main group III of the Periodic Table,R5 is hydrogen, C1-C10-alkyl, C6-C15-aryl, alkylaryl or arylalkyl each having 1 to 10 carbon atoms in the alkyl radical and 6 to 20 carbon atoms in the aryl radical,R6 and R7 are hydrogen, halogen, C1-C10-alkyl, C6-C15-aryl, alkylaryl, arylalkyl or alkoxy each having 1 to 10 carbon atoms in the alkyl radical and 6 to 20 carbon atoms in the aryl radical,o is an integer from 1 to 3 andp and q are integers from 0 to 2 the sum o+p+q corresponding to the valency of M2.
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