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    2.
    发明专利
    未知

    公开(公告)号：DE3687396D1

    公开(公告)日：1993-02-11

    申请号：DE3687396

    申请日：1986-10-14

    Applicant: BASF AG

    Inventor： HOFFMANN GERHARD

    IPC: C08F2/48 ,  C08F285/00 ,  C08F287/00 ,  G03F7/027 ,  G03F7/028

    Abstract: Mixts. (I) which are crosslinkable by photopolymerisation are claimed, based on soluble elastomeric block copolymers (II), compatible photopolymerisable comonomers (III), photoinitiators (IV) and 8-40C chloroalkanes (V) contg. 30-73 wt.% Cl as plasticisers. Printing forms, photoresists and photopolymerised materials based on (I) are claimed. Pref. (II) are e.g. styrene/isoprene.styrene block copolymers (VI) as described in GP-PS 1366769; (III) are e.g. (meth)acrylic esters, vinyl esters etc.; (IV) are e.g. benzoin or benzil derivs. Pref. (V) have 11-35 (esp. pref. 12-30)C and are e.g. trichloro-octanes, esp. commercial 'trichloroparaffins'; (I) contain 3-22 (pref. 8-18) wt.% (V).

    4.
    发明专利
    未知

    公开(公告)号：DK160907C

    公开(公告)日：1991-10-14

    申请号：DK555086

    申请日：1986-11-20

    Applicant: BASF AG

    Inventor： HOFFMANN GERHARD ,  KOCH HORST ,  SCHULZ GUENTHER

    IPC: G03F7/032 ,  C08G65/32 ,  G03F7/00 ,  G03F7/033

    Abstract: The invention relates to a novel photosensitive recording material which can be developed in aqueous solvents after its imagewise irradiation with actinic light and which consists essentially of a dimensionally stable base (A) and of a photosensitive recording layer (B). The said photosensitive recording layer (B) contains from about 48 to about 85% by weight, based on the photosensitive recording layer (B) of one or more elastomeric graft copolymers (B1) which are selected from the group consisting of polyalkylene oxide - vinyl ester - graft copolymers whose vinyl ester structural units have been hydrolyzed to a degree of not less 50 mol.-% from about 0.01 to about 10% by weight, based on the photosensitive recording layer (B), of one or more photoinitiators (B2), and from about 5 to about 30% by weight, based on the photosensitive recording layer (B), of one or more photopolymerizable monomers (B3). In addition to these components, the photosensitive recording layer (B) might contain further assistants or additives. The novel photosensitive recording material is especially well suited for the production of lithographic printing plates, resists and relief plates, in particular relief printing plates. The invention is furthermore related to a process for preparing the novel photosensitive recording material by polymerizing vinylesters in the presence of polyalkylene oxides to yield polyalkylene oxide - vinylester - graft copolymers, hydrolyzing or transesterifying said polyalkylene oxide - vinylester - graft copolymers to yield the said elastomeric graft copolymer (B1), mixing the said elastomeric graft copolymers (B1) with the other components of the photosensitive recording layer (B), and forming the said photosensitive recording layer (B) from the mixture consisting of its components on the dimensionally stable base (A).

    5.
    发明专利
    未知

    公开(公告)号：DK160659C

    公开(公告)日：1991-09-02

    申请号：DK124082

    申请日：1982-03-19

    Applicant: BASF AG

    Inventor： GRASER FRITZ ,  HOFFMANN GERHARD ,  LEYRER REINHOLD J ,  NEUMANN PETER

    IPC: C09B5/62 ,  G03G5/06 ,  G03G5/14

    Abstract: An electrophotographic recording medium which consists essentially of an electrically conductive base and a photosemiconductive double layer which comprises a first layer containing charge carrier-producing dyes, and a second layer containing one or more compounds which are charge carrier-transporting when exposed to light, wherein perylene-3,4,9,10-tetracarboxylic acid N,N'-bis-(2',6'-dichlorophenyl)-diimide is employed as the charge carrier-producing dye, and the production of this recording medium.

    PRODUCTION OF RELIEF PLATES AND PRINTING PLATES
    7.
    发明专利
    PRODUCTION OF RELIEF PLATES AND PRINTING PLATES 未知

    公开(公告)号：AU2288783A

    公开(公告)日：1984-07-05

    申请号：AU2288783

    申请日：1983-12-23

    Applicant: BASF AG

    Inventor： BRONSTERT BERND ,  HOFFMANN GERHARD ,  LYNCH JOHN

    IPC: G03C1/72 ,  G03F7/004 ,  G03F7/031 ,  G03F7/105 ,  G03F7/26 ,  G03C1/68 ,  G03F7/02

    Abstract: Relief plates and printing plates are produced by a positive-working process, using a photopolymerizable layer which contains one or more photopolymerizable, olefinically unsaturated compounds, one or more photoinitiators which can be activated by UV light, and a combination of a phenothiazinium, phenoxazinium, phenazinium or acridinium dye with a mild reducing agent which, on exposure to visible light, is capable of reducing the dye in the excited electronic state. The photopolymerizable layer is exposed imagewise to light having a wavelength longer than 450 nm, and simultaneously or subsequently exposed uniformly to light having a wavelength of from 300 to 420 nm, after which the unpolymerized areas of the layer are removed.

    10.
    发明专利
    未知

    公开(公告)号：NO174604C

    公开(公告)日：1994-06-01

    申请号：NO870012

    申请日：1987-01-02

    Applicant: BASF AG

    Inventor： HOFFMANN GERHARD ,  KURTZ KARL-RUDOLF

    IPC: G03F7/00 ,  G03F7/30 ,  G03F7/32

    Abstract: Relief plates crosslinked by photopolymerization are produced by exposing layers which are crosslinkable by photopolymerization imagewise to actinic light and washing out the noncrosslinked parts of the layers with a developer, by a process in which the developer used contains, as an essential component, a branched or straight-chain, monoolefinically, diolefinically or triolefinically unsaturated acryclic or saturated or monoolefinically, diolefinically or triolefinically unsaturated cyclic aliphatic hydrocarbon, alcohol or ketone of 8 to 15 carbon atoms.

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