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公开(公告)号：ES2240834T3
公开(公告)日：2005-10-16
申请号：ES02791453
申请日：2002-07-16
Applicant: BASF AG
Inventor： WAGNER DANIEL , WEINKOTZ PETER , MORGENSTERN HERBERT , RENNER HANS-JURGEN
Abstract: Procedimiento para aumentar la resistencia a la fisuración bajo tensión de masas de moldeo de poliestireno constituidas por un poliestireno resistente al impacto, brillante (HIPS) con un brillo superficial mayor que el 40 %, medido bajo un ángulo de medición de 60 º según DIN 67530, o una mezcla del mismo con poliestireno estándar (GPPS), caracterizado porque se añade a la masa de moldeo de poliestireno un elastómero termoplástico a base de estireno (S-TPE).
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公开(公告)号：DE10359450A1
公开(公告)日：2005-07-28
申请号：DE10359450
申请日：2003-12-17
Applicant: BASF AG
Inventor： KNOLL KONRAD , DARDIN ULRIKE , DESBOIS PHILIPPE , MITULLA KONRAD , NAEGELE PAUL , KOCH JUERGEN , WAGNER DANIEL , NIESNER NORBERT
IPC: C08F297/04 , C08K5/00 , C08K5/13 , C08K5/134 , C08L53/02 , C08F297/00
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公开(公告)号：DE50007384D1
公开(公告)日：2004-09-16
申请号：DE50007384
申请日：2000-02-17
Applicant: BASF AG
Inventor： RENNER HANS-JUERGEN , WAGNER DANIEL
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公开(公告)号：AT273130T
公开(公告)日：2004-08-15
申请号：AT00907577
申请日：2000-02-17
Applicant: BASF AG
Inventor： RENNER HANS-JUERGEN , WAGNER DANIEL
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公开(公告)号：DE50202935D1
公开(公告)日：2005-06-02
申请号：DE50202935
申请日：2002-07-16
Applicant: BASF AG
Inventor： WAGNER DANIEL , WEINKOETZ PETER , MORGENSTERN HERBERT , RENNER HANS-JUERGEN
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Patent Agency Ranking
公开(公告)号：AT294218T
公开(公告)日：2005-05-15
申请号：AT02791453
申请日：2002-07-16
Applicant: BASF AG
Inventor： WAGNER DANIEL , WEINKOETZ PETER , MORGENSTERN HERBERT , RENNER HANS-JUERGEN
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公开(公告)号：AU2912000A
公开(公告)日：2000-09-21
申请号：AU2912000
申请日：2000-02-17
Applicant: BASF AG
Inventor： RENNER HANS-JURGEN , WAGNER DANIEL
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公开(公告)号：DE59501857D1
公开(公告)日：1998-05-14
申请号：DE59501857
申请日：1995-06-03
Applicant: BASF AG
Inventor： MC KEE GRAHAM , WELZ MARTIN , DECKERS ANDREAS , WAGNER DANIEL , DAMM PAUL , OSLOWSKI HANS-JOSEF
Abstract: PCT No. PCT/EP95/02110 Sec. 371 Date Dec. 4, 1996 Sec. 102(e) Date Dec. 4, 1996 PCT Filed Jun. 3, 1995 PCT Pub. No. WO95/33793 PCT Pub. Date Dec. 14, 1995Transparent molded articles having a high-contrast laser inscription thereon are produced from a polymer mixture consisting of A) from 40 to 99% by weight of a polymer of an alkyl ester of (meth)acrylic acid, B) from 1 to 50% by weight of a copolymer of styrene and acrylonitrile having an acrylonitrile content of from 8 to 30% by weight, C) from 0 to 50% by weight of rubber particles, and D) from 0 to 20% by weight of additives and processing auxiliaries, by preparing a transparent molded article from the polymer mixture, and exposing the transparent molded article to laser radiation.
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公开(公告)号：DE102005001637A1
公开(公告)日：2006-07-20
申请号：DE102005001637
申请日：2005-01-12
Applicant: BASF AG
Inventor： KNOLL KONRAD , STEININGER HELMUT , SCHUSTER MICHAEL , WAGNER DANIEL , MERKEL PETER
IPC: C08L53/02 , C08F12/08 , C08F293/00 , C08F297/02 , C08J5/18
Abstract: A mixture which comprises from 5 to 50% by weight of a block copolymer A, which comprises one or more copolymer blocks (B/S)A each composed of from 65 to 95% by weight of vinylaromatic monomers and from 35 to 5% by weight of dienes and of a glass transition temperature TgA in the range from 40° to 90° C.; from 95 to 50% by weight of a block copolymer B, which comprises at least one hard block S composed of vinylaromatic monomers and comprises one or more copolymer blocks (B/S)B each composed of from 20 to 60% by weight of vinylaromatic monomers and from 80 to 40% by weight of dienes and of a glass transition temperature TgB in the range from −70° to 0° C.; from 0 to 45% by weight of polystyrene or of a block copolymer C other than A and B; and from 0 to 6% by weight of a plasticizer; and its use for production of shrink films.
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公开(公告)号：CA2591623A1
公开(公告)日：2006-07-20
申请号：CA2591623
申请日：2005-12-31
Applicant: BASF AG
Inventor： SCHUSTER MICHAEL , WAGNER DANIEL , KNOLL KONRAD , STEININGER HELMUT , MERKEL PETER
IPC: C08L53/02
Abstract: A mixture which comprises from 5 to 50% by weight of a block copolymer A, which comprises one or more copolymer blocks (B/S)A each composed of from 65 to 95% by weight of vinylaromatic monomers and from 35 to 5% by weight of dienes and of a glass transition temperature TgA in the range from 40° to 90° C.; from 95 to 50% by weight of a block copolymer B, which comprises at least one hard block S composed of vinylaromatic monomers and comprises one or more copolymer blocks (B/S)B each composed of from 20 to 60% by weight of vinylaromatic monomers and from 80 to 40% by weight of dienes and of a glass transition temperature TgB in the range from −70° to 0° C.; from 0 to 45% by weight of polystyrene or of a block copolymer C other than A and B; and from 0 to 6% by weight of a plasticizer; and its use for production of shrink films.
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