14.
    发明专利
    未知

    公开(公告)号:DE502005001905D1

    公开(公告)日:2007-12-20

    申请号:DE502005001905

    申请日:2005-05-17

    Applicant: BASF AG

    Abstract: A process for removing residual monomers from polyoxymethylene homo- or copolymers, comprising the following process steps: a) the residual monomers are removed in gaseous form as vapors from the polymer in a devolatilization apparatus, b) the residual monomer vapors are removed through a vapor pipe, c) the residual monomers are condensed from the vapors in a condensation apparatus at from 1.09 to 102.4 bar and from 102 to 230° C., the temperature not falling below 102° C. at any point of the condensation apparatus, and those surfaces of the condensation apparatus which come into contact with the vapors being coated with a liquid film of condensed residual monomers.

Patent Agency Ranking