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公开(公告)号:EP3440148A1
公开(公告)日:2019-02-13
申请号:EP17720311.4
申请日:2017-04-07
Applicant: BASF SE
Inventor: DAVIS, John, Michael , MAIER, Ralph Dieter , MATOS, Karl , NEIGH, Kevin, M. , SCHROEDER, Kristin
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公开(公告)号:EP3440147A1
公开(公告)日:2019-02-13
申请号:EP17720310.6
申请日:2017-04-07
Applicant: BASF SE
Inventor: DAVIS, John, Michael , KUMAR, Rajesh , MAIER, Ralph, Dieter , MATOS, Karl , NEIGH, Kevin, M. , SCHROEDER, Kristin
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公开(公告)号:EP3384065A1
公开(公告)日:2018-10-10
申请号:EP16804762.9
申请日:2016-11-29
Applicant: BASF SE
Inventor: ABELS, Falko , SCHWEINFURTH, David, Dominique , MATOS, Karl , LOEFFLER, Daniel , AHLF, Maraike , BLASBERG, Florian , SCHAUB, Thomas , SPIELMANN, Jan , KIRSTE, Axel , GASPAR, Boris
CPC classification number: C23C16/45553 , C07F9/5027 , C07F9/547 , C07F9/65848 , C23C16/06
Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. It relates to a process for preparing metal films comprising (a) depositing a metal-containing compound from the gaseous state onto a solid substrate and (b) bringing the solid substrate with the deposited metal-containing compound in contact with a reducing agent in the gaseous state, wherein the reducing agent is or at least partially forms at the surface of the solid substrate a carbene, a silylene or a phosphor radical.
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公开(公告)号:EP2318418A2
公开(公告)日:2011-05-11
申请号:EP09780698.8
申请日:2009-07-16
Applicant: BASF SE
Inventor: MATOS, Karl , ATTLESEY, Alex, J. , ROUDA, David, F. , PICHLMAIR, Stefan
IPC: C07F5/02
CPC classification number: C07F5/022
Abstract: A process for producing a 1,3,2-dioxaborinane compound of the general formula (I) in which each R individually is selected from the group consisting of H and C
1-6 -alkyl, by reacting a diol of the general formula (II) HO-CRR-CRR-CRR-OH with diborane is performed without using a solvent.Abstract translation: 一种通式(I)的1,3,2-二氧杂环戊烷化合物的制备方法,其中每个R分别选自H和C 1-6 - 烷基,通过使通式(II) II)HO-CRR-CRR-CRR-OH与乙硼烷在不使用溶剂的情况下进行。
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