公开(公告)号：WO2017093265A1

公开(公告)日：2017-06-08

申请号：PCT/EP2016/079156

申请日：2016-11-29

Applicant: BASF SE

Inventor： ABELS, Falko ,  SCHWEINFURTH, David, Dominique ,  MATOS, Karl ,  LOEFFLER, Daniel ,  AHLF, Maraike ,  BLASBERG, Florian ,  SCHAUB, Thomas ,  SPIELMANN, Jan ,  KIRSTE, Axel ,  GASPAR, Boris

IPC: C23C16/455 ,  C23C16/06 ,  C07F9/547 ,  C07F5/02 ,  C07F7/02 ,  C23C16/18

CPC classification number: C23C16/45553 ,  C07F9/5027 ,  C07F9/65848 ,  C23C16/06

Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. It relates to a process for preparing metal films comprising (a) depositing a metal-containing compound from the gaseous state onto a solid substrate and (b) bringing the solid substrate with the deposited metal-containing compound in contact with a reducing agent in the gaseous state, wherein the reducing agent is or at least partially forms at the surface of the solid substrate a carbene, a silylene or a phosphor radical.

Abstract translation: 本发明属于用于在衬底上产生无机薄膜的工艺领域，尤其是原子层沉积工艺。 它涉及一种制备金属膜的方法，该方法包括（a）将含金属的化合物从气态沉积到固体基质上，和（b）使含沉积的含金属化合物的固体基质与还原剂 气态，其中还原剂在固体基质的表面上或至少部分形成卡宾，亚甲硅烷基或磷基团。

公开(公告)号：WO2022008306A1

公开(公告)日：2022-01-13

申请号：PCT/EP2021/067916

申请日：2021-06-29

Applicant: BASF SE

Inventor： KAO, Chi Yueh ,  SHEN, Mary ,  KLIPP, Andreas ,  GUEVENC, Haci Osman ,  LOEFFLER, Daniel

IPC: C11D11/00 ,  G03F7/40 ,  H01L21/02

Abstract: The present invention relates to a non-aqueous composition essentially consisting of (a) an organic solvent selected from (i) a linear, branched or cyclic C5 to C12 alkane, and (ii) a benzene substituted by 1 to 3 C1 to C4 alkyl groups; and (b) at least one additive of formulae I or II wherein R1 is H R2 is selected from H, C1 to C10 alkyl, C1 to C10 alkoxy, C6 to C10 aryl, and C6 to C10 aroxy,R3 is selected from R2, R4 is selected from C1 to C10 alkyl, C1 to C10 alkoxy, C6 to C10 aryl, and C6 to C10 aroxy,R10, R12 are independently selected from C1 to C10 alkyl and C1 to C10 alkoxy,m is 1, 2 or 3,n is 0 or an integer from 1 to 100.

公开(公告)号：WO2019224032A1

公开(公告)日：2019-11-28

申请号：PCT/EP2019/062178

申请日：2019-05-13

Applicant: BASF SE

Inventor： BRILL, Marcel ,  LOEFFLER, Daniel ,  PIRRUNG, Frank ,  ENGELBRECHT, Lothar ,  CSIHONY, Szilard ,  BERGELER, Maike ,  BOYKO, Volodymyr ,  WILKE, Patrick

IPC: C11D7/50 ,  C11D11/00 ,  G03F7/40

Abstract: The invention relates to the use of a composition comprising a C 1 to C 6 alkanol and a carboxylic acid ester of formula (I) wherein R 1 is selected from a C 1 to C 6 alkyl, which may be unsubstituted or substituted by OH or F, and -X 21 -[O-X 22 ] n -H; R 2 is selected from a C 1 to C 6 alkyl, which may be unsubstituted or substituted by OH or F, and -X 21 -[O-X 22 ] n -H; X 21 , X 22 are independently selected from C 1 to C 6 alkandiyl, which may be unsubstituted or substituted by OH or F; n is an integer from 1 to 5. wherein, the C 1 to C 6 alkanol and the carboxylic acid ester are selected so as to form an azeotropic mixture and are present in an amount from 20 % by weight below to 20 % by weight above such azeotropic mixture.

公开(公告)号：WO2020212173A1

公开(公告)日：2020-10-22

申请号：PCT/EP2020/059580

申请日：2020-04-03

Applicant: BASF SE

Inventor： CSIHONY, Szilard ,  LOEFFLER, Daniel ,  BRILL, Marcel ,  PIRRUNG, Frank ,  ENGELBRECHT, Lothar ,  BERGELER, Maike ,  WILKE, Patrick ,  BURK, Yeni ,  BOYKO, Volodymyr

IPC: G03F7/40 ,  B81C1/00 ,  H01L21/02 ,  H01L21/027 ,  H01L21/306 ,  C11D11/00

Abstract: The present invention relates to a non-aqueous composition comprising (a) an organic solvent (b) at least one additive of formulae I, Formula (I) wherein R 1 , R 2 , R 3 , and R 4 are independently selected from C 1 to C 10 alkyl, C 1 to C 11 alkylcarbonyl, C 6 to C 12 aryl, C 7 to C 14 alkylaryl, and C 7 to C 14 arylalkyl; and n is 0 or 1.

公开(公告)号：WO2020064916A1

公开(公告)日：2020-04-02

申请号：PCT/EP2019/076010

申请日：2019-09-26

Applicant: BASF SE

Inventor： LINDNER, Jean-Pierre Berkan ,  CSIHONY, Szilard ,  LOEFFLER, Daniel ,  BURK, Yeni ,  GERKE, Birgit ,  PIRRUNG, Frank ,  HENDERSON, Lucas Benjamin ,  BOYKO, Volodymyr ,  DE OLIVEIRA, Rui ,  HENNIG, Ingolf ,  YU, Miran

IPC: C08L63/00

Abstract: A resin composition, comprising (a) at least one epoxy resin, and (b) at least one siloxane-type curing agent of formula C22 or C31 (C22) (C31) wherein the resin composition does essentially not contain any fluoride or bromide.

公开(公告)号：WO2019086374A1

公开(公告)日：2019-05-09

申请号：PCT/EP2018/079555

申请日：2018-10-29

Applicant: BASF SE

Inventor： LOEFFLER, Daniel ,  SHEN, Mei Chin ,  WEI, Sheng Hsuan ,  PIRRUNG, Frank ,  ENGELBRECHT, Lothar ,  BURK, Yeni ,  KLIPP, Andreas ,  BRILL, Marcel ,  CSIHONY, Szilard

IPC: G03F7/40 ,  C11D1/66 ,  C11D11/00 ,  H01L21/02 ,  H01L21/027

CPC classification number: G03F7/40 ,  C11D3/373 ,  C11D3/3734 ,  C11D3/3738 ,  C11D7/5004 ,  C11D7/5022 ,  C11D11/0047 ,  G03F7/405 ,  H01L21/02057

Abstract: The invention relates to the use of a non-aqueous composition comprising an organic solvent and at least one particular siloxane-type additive for treating substrates comprising patterns having line-space dimensions of 50 nm or below and aspect ratios of 4 or more as well as a method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices,the said method comprising the steps of (1) providing a substrate having patterned material layers having line-space dimensions of 50 nm, aspect ratios of greater or equal 4, or a combination thereof, (2) contacting the substrate at least once with a non-aqueous composition, and (3) removing the non-aqueous composition from the contact with the substrate, wherein the non-aqueous composition comprising an organic solvent and at least one of such siloxane-type additives.

公开(公告)号：WO2017129440A1

公开(公告)日：2017-08-03

申请号：PCT/EP2017/050858

申请日：2017-01-17

Applicant: BASF SE

Inventor： ABELS, Falko ,  LOEFFLER, Daniel ,  WILMER, Hagen ,  WOLF, Robert

IPC: C07F9/6568 ,  C07F15/06 ,  C23C16/18

CPC classification number: C07F9/65686 ,  C07F15/06 ,  C23C16/34 ,  C23C16/40 ,  C23C16/4486 ,  C23C16/45525

Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. In particular, the present invention relates to a process comprising bringing a compound of general formula (I) into the gaseous or aerosol state L n ....M... X m (I) and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein M is a metal, L is a ligand which coordinates to M and contains at least one phosphorus-carbon multiple bond, wherein L contains a phosphorus-containing heterocyclic ring or a phosphorus-carbon triple bond, X is a ligand which coordinates to M, n is 1 to 5, and m is 0 to 5.

Abstract translation: 本发明属于用于在衬底上产生无机薄膜的工艺领域，尤其是原子层沉积工艺。 特别地，本发明涉及一种方法，该方法包括使通式（I）的化合物进入气态或气溶胶状态L n ... M ... X m m （I）化合物和从气态或气溶胶状态将通式（I）的化合物沉积到固体基质上，其中M是金属，L是与M配位且包含至少一个磷 - 碳重键的配体 其中L含有含磷杂环或磷 - 碳三键，X是与M配位的配位体，n为1至5，m为0至5。

公开(公告)号：WO2022184551A1

公开(公告)日：2022-09-09

申请号：PCT/EP2022/054695

申请日：2022-02-24

Applicant: BASF SE

Inventor： STREMPEL, Verena ,  REINOSO GARCIA, Marta ,  LOEFFLER, Daniel ,  SUELING, Carsten

IPC: B01J13/14 ,  C11D17/00

Abstract: Process for making a particulate coated chelating agent (A) wherein said process comprises the following steps: (a) Providing a granule or powder containing an alkali metal salt of methyl glycine diacetic acid (MGDA)or glutamic acid diacetic acid (GLDA), preferably with a moisture content in the range of from 1 to 15% by weight, (b) treating said salt with a metal alkoxide or metal halide or metal amide or alkyl metal compound or with an alkoxide, amide, halide or alkyl compound of silicon, (c) treating the material obtained in step (b) with moisture or (c*) with ozone, (d) optionally, repeating the sequence of steps (b) and (c) once to 25 times.

公开(公告)号：WO2021239467A1

公开(公告)日：2021-12-02

申请号：PCT/EP2021/062618

申请日：2021-05-12

Applicant: BASF SE

Inventor： KAO, Chi Yueh ,  SHEN, Mary ,  LOEFFLER, Daniel ,  KLIPP, Andreas ,  GUEVENC, Haci Osman

IPC: H01L21/02 ,  B81C1/00 ,  C11D11/00

Abstract: The invention relates to the use of a composition essentially consisting of 0.1 to 3 % by weight ammonia and a C1 to C4 alkanol for anti-pattern collapse treatment of a substrate comprisingpatterned material layers having line-space dimensions with a line width of 50 nm or below, aspect ratios of greater or equal 4, or a combination thereof.

公开(公告)号：WO2021008902A1

公开(公告)日：2021-01-21

申请号：PCT/EP2020/068823

申请日：2020-07-03

Applicant: BASF SE

Inventor： CSIHONY, Szilard ,  LINDNER, Jean-Pierre Berkan ,  LOEFFLER, Daniel ,  BURK, Yeni ,  HENNIG, Ingolf ,  HENDERSON, Lucas Benjamin ,  GERKE, Birgit ,  DE OLIVEIRA, Rui ,  BOYKO, Volodymyr ,  PIRRUNG, Frank

IPC: C07F7/04 ,  B32B15/08 ,  C08K3/22 ,  C08K9/06 ,  C08L43/04 ,  H01L23/14 ,  H05K1/03

Abstract: A composition comprising a monomer of the general formula (M1) wherein M is a metal or semimetal of main group 3 or 4 of the periodic table; X M1 , X M2 are each O; R M1 , R M2 are the same or different and are each an -CR a R b -Ar-O-R c ; Ar is a C 6 to C 30 carbocyclic ring system; R a , R b are the same or different and are each H or C 1 to C 6 alkyl; R c is C 1 -C 22 -alkyl, benzyl or phenyl; q according to the valency and charge of M is 0 or 1; X M3 , X M4 are the same or different and are each O, C 6 to C 10 aryl, or -CH 2- ; R M3 , R M4 are the same or different and are each R M1 , H, C 1 -C 22 alkyl, or a polymer selected from a polyalkylene, a polysiloxane, or a polyether.