公开(公告)号：BR0011982A

公开(公告)日：2002-09-17

申请号：BR0011982

申请日：2000-06-27

Applicant: CALIFORNIA INST OF TECHN

Inventor： UNGER MARC A ,  CHUO HOU-PU ,  THORSEN TODD A ,  SCHERER AXEL ,  QUAKE STEPHEN R

IPC: G03F7/20 ,  B01L3/00 ,  B81B1/00 ,  B81B3/00 ,  B81B7/00 ,  B81C1/00 ,  B81C99/00 ,  C12Q1/68 ,  F04B17/00 ,  F04B35/04 ,  F04B43/04 ,  F15C5/00 ,  F16K7/00 ,  F16K17/02 ,  F16K99/00 ,  F16K17/00

Abstract: A method of fabricating an elastomeric structure, comprising: forming a first elastomeric layer on top of a first micromachined mold, the first micromachined mold having a first raised protrusion which forms a first recess extending along a bottom surface of the first elastomeric layer; forming a second elastomeric layer on top of a second micromachined mold, the second micromachined mold having a second raised protrusion which forms a second recess extending along a bottom surface of the second elastomeric layer, bonding the bottom surface of the second elastomeric layer onto a top surface of the first elastomeric layer such that a control channel forms in the second recess between the first and second elastomeric layers; and positioning the first elastomeric layer on top of a planar substrate such that a flow channel forms in the first recess between the first elastomeric layer and the planar substrate.

公开(公告)号：MXPA01012959A

公开(公告)日：2002-07-30

申请号：MXPA01012959

申请日：2000-06-27

Applicant: CALIFORNIA INST OF TECHN

Inventor： UNGER MARC A

IPC: G03F7/20 ,  B01L3/00 ,  B81B1/00 ,  B81B3/00 ,  B81B7/00 ,  B81C1/00 ,  B81C99/00 ,  C12Q1/68 ,  F04B17/00 ,  F04B35/04 ,  F04B43/04 ,  F15C5/00 ,  F16K7/00 ,  F16K17/02 ,  F16K99/00 ,  F16K17/00

Abstract: Se da a conocer un metodo para fabricar una estructura elastomerica, que comprende: formar una primera capa elastomerica sobre la parte superior de un primer molde micro- maquinado, este primer molde micro-maquinado tiene una primer proyeccion elevada, la cual forma un primer rebajo, que se extiende a lo largo de una superficie de fondo de la primera capa elastomerica; formar una segunda capa elastomerica sobre la parte superior de un segundo molde micro-maquinado, este segundo molde micro-maquinado tiene una segunda proyeccion elevada, la cual forma un segundo rebajo, que se extiende a lo largo de una superficie de fondo de la segunda capa elastomerica; unir la superficie de fondo de la segunda capa elastomerica sobre una superficie superior de la primera capa elastomerica.. de modo que un canal de control se forme en el segundo rebajo, entre la primera y segunda capas elastomericas; y colocar la primera capa elastomerica sobre la parte superior de un substrato plano, de modo que un canal de flujo se forme dentro del primer rebajo, entre la primera capa elastomerica y el substrato plano.

公开(公告)号：NO20016268L

公开(公告)日：2002-02-27

申请号：NO20016268

申请日：2001-12-20

Applicant: CALIFORNIA INST OF TECHN

Inventor： UNGER MARC A ,  CHOU HOU-PU ,  THORSEN TODD A ,  SCHERER AXEL ,  QUAKE STEPHEN R

IPC: G03F7/20 ,  B01L3/00 ,  B81B1/00 ,  B81B3/00 ,  B81B7/00 ,  B81C1/00 ,  B81C99/00 ,  C12Q1/68 ,  F04B17/00 ,  F04B35/04 ,  F04B43/04 ,  F15C5/00 ,  F16K7/00 ,  F16K17/02 ,  F16K99/00 ,  F16K

Abstract: A method of fabricating an elastomeric structure, comprising: forming a first elastomeric layer on top of a first micromachined mold, the first micromachined mold having a first raised protrusion which forms a first recess extending along a bottom surface of the first elastomeric layer; forming a second elastomeric layer on top of a second micromachined mold, the second micromachined mold having a second raised protrusion which forms a second recess extending along a bottom surface of the second elastomeric layer, bonding the bottom surface of the second elastomeric layer onto a top surface of the first elastomeric layer such that a control channel forms in the second recess between the first and second elastomeric layers; and positioning the first elastomeric layer on top of a planar substrate such that a flow channel forms in the first recess between the first elastomeric layer and the planar substrate.

公开(公告)号：AU5773400A

公开(公告)日：2001-01-31

申请号：AU5773400

申请日：2000-06-27

Applicant: CALIFORNIA INST OF TECHN

Inventor： UNGER MARC A ,  CHOU HOU-PU ,  THORSEN TODD A ,  SCHERER AXEL ,  QUAKE STEPHEN R

IPC: G03F7/20 ,  B01L3/00 ,  B81B1/00 ,  B81B3/00 ,  B81B7/00 ,  B81C1/00 ,  B81C99/00 ,  C12Q1/68 ,  F04B17/00 ,  F04B35/04 ,  F04B43/04 ,  F15C5/00 ,  F16K7/00 ,  F16K17/02 ,  F16K99/00 ,  F16K17/00

Abstract: A method of fabricating an elastomeric structure, comprising: forming a first elastomeric layer on top of a first micromachined mold, the first micromachined mold having a first raised protrusion which forms a first recess extending along a bottom surface of the first elastomeric layer; forming a second elastomeric layer on top of a second micromachined mold, the second micromachined mold having a second raised protrusion which forms a second recess extending along a bottom surface of the second elastomeric layer, bonding the bottom surface of the second elastomeric layer onto a top surface of the first elastomeric layer such that a control channel forms in the second recess between the first and second elastomeric layers; and positioning the first elastomeric layer on top of a planar substrate such that a flow channel forms in the first recess between the first elastomeric layer and the planar substrate.

公开(公告)号：CA2767084A1

公开(公告)日：2001-01-04

申请号：CA2767084

申请日：2000-06-27

Applicant: CALIFORNIA INST OF TECHN

Inventor： UNGER MARC A ,  CHOU HOU-PU ,  THORSEN TODD A ,  SCHERER AXEL ,  QUAKE STEPHEN R

IPC: B81B3/00 ,  B29C69/00 ,  B81B7/02 ,  F15C1/06 ,  F15C1/22 ,  F15C3/04 ,  F15C3/16 ,  F15C5/00 ,  F16K20060101

Abstract: A microfabricated elastomeric device comprises a planar substrate and a first elastomeric layer having a top surface and a bottom surface. The bottom surface comprises a first recess, wherein the bottom surface of the first elastomeric layer is bonded to the planar substrate such that the first recess forms a first flow channel. The device also comprises a second elastomeric layer having a top surface and a bottom surface. The bottom surface comprises a second recess. The bottom surface of the second elastomeric layer is bonded to the top surface of the first elastomeric layer such that the second recess forms a second flow channel. The first and second elastomeric layers form an elastomeric structure. The second flow channel extends across and above the first flow channel such that a fluid flow within the second flow channel is directed from before a first side of the first flow channel to beyond a second side of the first flow channel. A portion of the first elastomeric layer is a deflectable portion and is deflectable into the first flow channel upon pressurization of the second flow channel to form a planar sealing surface between the planar substrate and the deflectable portion of the first elastomeric layer.

公开(公告)号：CA2378190A1

公开(公告)日：2001-01-04

申请号：CA2378190

申请日：2000-06-27

Applicant: CALIFORNIA INST OF TECHN

Inventor： THORSEN TODD A ,  CHOU HOU-PU ,  SCHERER AXEL ,  UNGER MARC A ,  QUAKE STEPHEN R

IPC: G03F7/20 ,  B01L3/00 ,  B81B1/00 ,  B81B3/00 ,  B81B7/00 ,  B81C1/00 ,  B81C99/00 ,  C12Q1/68 ,  F04B17/00 ,  F04B35/04 ,  F04B43/04 ,  F15C5/00 ,  F16K7/00 ,  F16K17/02 ,  F16K99/00

Abstract: A method of fabricating an elastomeric structure, comprising : forming a fir st elastomeric layer on top of a first micromachined mold, the first micromachined mold having a first raised protrusion which forms a first rece ss extending along a bottom surface of the first elastomeric layer; forming a second elastomeric layer on top of a second micromachined mold, the second micromachined mold having a second raised protrusion which forms a second recess extending along a bottom surface of the second elastomeric layer; bonding the bottom surface of the second elastomeric layer onto a top surfac e of the first elastomeric layer such that a control channel forms in the seco nd recess between the first and second elastomeric layers; and positioning the first elastomeric layer on top of a planar substrate such that a flow channe l forms in the first recess between the first elastomeric layer and the planar substrate.

公开(公告)号：AT343724T

公开(公告)日：2006-11-15

申请号：AT00943235

申请日：2000-06-27

Applicant: CALIFORNIA INST OF TECHN

Inventor： UNGER MARC A ,  CHOU HOU-PU ,  THORSEN TODD A ,  SCHERER AXEL ,  QUAKE STEPHEN R

IPC: G03F7/20 ,  B01L3/00 ,  B81B1/00 ,  B81B3/00 ,  B81B7/00 ,  B81C1/00 ,  B81C99/00 ,  C12Q1/68 ,  F04B17/00 ,  F04B35/04 ,  F04B43/04 ,  F15C5/00 ,  F16K7/00 ,  F16K17/02 ,  F16K99/00

Abstract: A method of fabricating an elastomeric structure, comprising: forming a first elastomeric layer on top of a first micromachined mold, the first micromachined mold having a first raised protrusion which forms a first recess extending along a bottom surface of the first elastomeric layer; forming a second elastomeric layer on top of a second micromachined mold, the second micromachined mold having a second raised protrusion which forms a second recess extending along a bottom surface of the second elastomeric layer, bonding the bottom surface of the second elastomeric layer onto a top surface of the first elastomeric layer such that a control channel forms in the second recess between the first and second elastomeric layers; and positioning the first elastomeric layer on top of a planar substrate such that a flow channel forms in the first recess between the first elastomeric layer and the planar substrate.

公开(公告)号：DE60018425T2

公开(公告)日：2006-04-06

申请号：DE60018425

申请日：2000-06-27

Applicant: CALIFORNIA INST OF TECHN

Inventor： UNGER MARC A ,  SCHERER AXEL ,  QUAKE STEPHEN R ,  CHOU HOU-PU ,  THORSEN TODD A

IPC: F04B43/04 ,  G03F7/20 ,  B01L3/00 ,  B81B1/00 ,  B81B3/00 ,  B81B7/00 ,  B81C1/00 ,  B81C99/00 ,  C12Q1/68 ,  F04B17/00 ,  F04B35/04 ,  F15C5/00 ,  F16K7/00 ,  F16K17/02 ,  F16K99/00

Abstract: A method of fabricating an elastomeric structure, comprising: forming a first elastomeric layer on top of a first micromachined mold, the first micromachined mold having a first raised protrusion which forms a first recess extending along a bottom surface of the first elastomeric layer; forming a second elastomeric layer on top of a second micromachined mold, the second micromachined mold having a second raised protrusion which forms a second recess extending along a bottom surface of the second elastomeric layer, bonding the bottom surface of the second elastomeric layer onto a top surface of the first elastomeric layer such that a control channel forms in the second recess between the first and second elastomeric layers; and positioning the first elastomeric layer on top of a planar substrate such that a flow channel forms in the first recess between the first elastomeric layer and the planar substrate.

公开(公告)号：AU2866402A

公开(公告)日：2002-06-11

申请号：AU2866402

申请日：2001-11-28

Applicant: CALIFORNIA INST OF TECHN

Inventor： UNGER MARC A ,  CHOU HOU-PU ,  THORSEN TODD A ,  SCHERER AXEL ,  QUAKE STEPHEN R ,  LIU JIAN ,  ADAMS MARK L ,  HANSEN CARL L

IPC: B01L3/00 ,  B01L7/00 ,  B01L9/00 ,  B67D99/00 ,  B81B1/00 ,  B81B3/00 ,  B81C1/00 ,  C12Q1/68 ,  F04B43/04 ,  F15C5/00 ,  F16K7/00 ,  F16K31/126 ,  F16K99/00 ,  A61F2/00

Abstract: A method of fabricating an elastomeric structure, comprising: forming a first elastomeric layer on top of a first micromachined mold, the first micromachined mold having a first raised protrusion which forms a first recess extending along a bottom surface of the first elastomeric layer; forming a second elastomeric layer on top of a second micromachined mold, the second micromachined mold having a second raised protrusion which forms a second recess extending along a bottom surface of the second elastomeric layer; bonding the bottom surface of the second elastomeric layer onto a top surface of the first elastomeric layer such that a control channel forms in the second recess between the first and second elastomeric layers; and positioning the first elastomeric layer on top of a planar substrate such that a flow channel forms in the first recess between the first elastomeric layer and the planar substrate.

公开(公告)号：AU1154202A

公开(公告)日：2002-04-15

申请号：AU1154202

申请日：2001-10-03

Applicant: CALIFORNIA INST OF TECHN

Inventor： DAM R MICHAEL VAN ,  UNGER MARC A ,  QUAKE STEPHEN R

IPC: B01J19/00 ,  B81B1/00 ,  C07B61/00 ,  C40B40/06 ,  C40B40/10 ,  C40B50/14 ,  C40B60/14 ,  B01L3/00

Abstract: The present invention provides a chemical reaction apparatus for synthesizing an array of compounds and methods for using the same. In particular, the chemical reaction apparatus of the present invention comprises a solid support base, a first elastic member attached to the solid support base, and a first plurality of flow channels between the solid support base and the first elastic member. In addition, the solid support base comprises a functional group within at least a portion of the first plurality of flow channels for attaching compounds thereto. Optionally, the chemical reaction apparatus may further comprise a second plurality of flow channels which are in a different direction than the first plurality of flow channels. Moreover, the chemical reaction apparatus of the present invention can also include a second elastic member attached to the first elastic member. A plurality of pressure channels present in between the first and the second elastic members allows control of fluid flow within the first plurality of flow channels and/or the second plurality of flow channels.