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公开(公告)号：JPH06212415A
公开(公告)日：1994-08-02
申请号：JP812493
申请日：1993-01-21
Applicant: CHUGAI RO KOGYO KAISHA LTD
Inventor： KISODA KINYA , TOUCHI HACHIRO
Abstract: PURPOSE:To provide the sheet type sputtering film forming device which rapidly forms good films without sticking of impurities on the opposite surfaces of targets and substrates. CONSTITUTION:A perpendicular side wall 2 of a main vacuum chamber 1 is provided with plural apertures 3a to 3f of the same shape which are provided at equal intervals on the same circumference and plural film forming chambers 30b to 30e which have substrate supplying parts and substrate extracting parts formed in the adjacent apertures mentioned above and shutters 38 provided in the apertures exclusive of the substrate supplying parts and extracting parts and used to close independent a gas introducing system 42 and vacuum discharge system and the apertures. A rotatable and retreatable rotary pallet 10 having mounting parts 12 for mounting the substrates (W) to be formed with films on the aperture side at equal intervals on the same circumference as the circumference of the respective apertures mentioned above is disposed within the above-mentioned main vacuum chamber.
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公开(公告)号：JPH052738B2
公开(公告)日：1993-01-13
申请号：JP11756287
申请日：1987-05-13
Applicant: CHUGAI RO KOGYO KAISHA LTD
Inventor： MINAMI TOSHIMI , KISODA KINYA
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公开(公告)号：JPS63282260A
公开(公告)日：1988-11-18
申请号：JP11756287
申请日：1987-05-13
Applicant: CHUGAI RO KOGYO KAISHA LTD
Inventor： MINAMI TOSHIMI , KISODA KINYA
Abstract: PURPOSE:To enable two system of moving and stationary sputtering with one sputtering device of a simple structure by holding the plural works opposed to radially arranged target materials on a concentric circle, and providing a means for confirming the rotation stop position of a pallet supported by a reciprocating spindle. CONSTITUTION:Plural works W are held on a concentric circle on the vertical pallet 9, and the pallet supporting spindle 23 reciprocating between the positions of both side walls of a treating chamber 2 opposed to each other is provided. A stepping motor 24 is connected to at least one spindle 23b. Plural attachable and detachable target materials 25 are radially arranged on at least one side wall of the treating chamber 2. The means 27 for confirming the rotation stop position of a pallet is further provided at specified position of the treating chamber 2. As a result, sputtering can be carried out with only one sputtering device by continuously rotating the pallet 9 by the motor 24 to revolve or revolve and rotate the work W. In addition, the work W is accurately rested on a specified position by intermittently rotate the pallet 9 by the control of the speed of the motor 24 and the means 27, and sputtering is carried out.
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公开(公告)号：JP2000096217A
公开(公告)日：2000-04-04
申请号：JP26460698
申请日：1998-09-18
Applicant: CHUGAI RO KOGYO KAISHA LTD
Inventor： KISODA KINYA
IPC: C23C14/32
Abstract: PROBLEM TO BE SOLVED: To provide a sheet plasma type PVD system capable of forming a uniform thin film stably for a long time regardless of the size of a substrate. SOLUTION: In this sheet plasma type PVD system in which a crucible 13 rotated with a vertical rotary shaft 17a as the center is arranged in a vacuum chamber 12, and a plasma beam 20 from a plasma gun 11 is made into a sheet shape by the repulsing magnetic fields by a pair of sheet magnets 16, which is introduced into the surface of an evaporating raw material M in a crucible 13, the recessed part 13a for charging the evaporating raw material on the crucible 13 is formed into a round shape of a radius(r) which is concentric with the rotary axis, and, moreover, an anode magnet 19 having poles up and down is arranged at the lower direction of the recessed part 13a, in the width direction of the sheet-shaped plasma beam 20 and along the vertical face in which the distance from the center of the rotary axis 17a is
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公开(公告)号：JPH11269636A
公开(公告)日：1999-10-05
申请号：JP7895898
申请日：1998-03-26
Applicant: CHUGAI RO KOGYO KAISHA LTD , DAINIPPON PRINTING CO LTD
Inventor： KISODA KINYA , FURUYA EIJI , DAITO RYOICHI
IPC: C23C14/32
Abstract: PROBLEM TO BE SOLVED: To provide a vacuum film forming device capable of prolonging the continuous safety maintaining time of plasma discharge and improving the film forming rate. SOLUTION: This vacuum film forming device is provided with a pressure gradient-type plasma gun 11 forming a plasma beam 22 toward the inside of a vacuum chamber 12, and a conversing coil provided so as to surround the short tube part of the vacuum chamber 12 protruded toward the outlet part of the plasma gun 11 and shrinking the cross-sectional face of the plasma beam 22 to form a thin film on a substrate 13 arranged in the vacuum chamber 11 by the plasma beam 22. The vacuum film forming device is composed of an insulating tube 1 surrounding the circumference of the plasma beam 22 and electrically protruded in a floating state at the outlet part, and an electron feedback electrode 2 surrounding the outer circumferential side of the insulating tube 1 in the short tube part and whose potential state is made the one higher than that in the outlet part.
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Patent Agency Ranking
公开(公告)号：JPH0925575A
公开(公告)日：1997-01-28
申请号：JP17327695
申请日：1995-07-10
Applicant: CHUGAI RO KOGYO KAISHA LTD
Inventor： KISODA KINYA , SHINTANI MASANORI
Abstract: PROBLEM TO BE SOLVED: To form an ITO film having low resistivity on a substrate in a state in which the temp. of the substrate is lowly held. SOLUTION: At the time of forming an ITO film on a substrate by an activated reaction vapor deposition method using a pressure gradient type plasma gun 5, the temp. of a substrate 11 is held within a region including the temp. at which the resistivity of the film reaches the minimum value and also from the low temp. side one to the high temp. side one in a temp. region in which desired resistivity can be obtd.
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公开(公告)号：JPH08296033A
公开(公告)日：1996-11-12
申请号：JP9838895
申请日：1995-04-24
Applicant: CHUGAI RO KOGYO KAISHA LTD
Inventor： KISODA KINYA , TAMURA SEIICHI
Abstract: PURPOSE: To impart an excellent wear resistance to a base metal by successively forming the chromium nitride film and chromium oxide film each having a specified composition on the surface of a metallic material to be treated under specified conditions. CONSTITUTION: The surface of a material 13 (die) to be treated is cleaned in a film forming device, and metallic chromium is vaporized to form a chromium film. Gaseous N2 is then gradiently increased and supplied to a specified amt., and a film (a) changing gradiently from a chromium film to a chromium nitride film having a specified composition. When the amt. of gaseous N2 to be supplied reaches the amt. to form a chromium nitride film, the amt. is maintained, and a chromium nitride film (b) is formed. The supply of gaseous N2 is then gradiently decreased, the supply of gaseous oxygen is gradiently increased, and a mixed film (c) changing gradiently from chromium nitride film to chromium oxide film is formed. When the supply of gaseous N2 is decreased to zero and only gaseous oxygen is supplied, the supply of gaseous oxygen is kept at an amt. to form a chromium oxide film of specified composition, and a chromium oxide film (d) is formed in a specified thickness.
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公开(公告)号：JPH07324711A
公开(公告)日：1995-12-12
申请号：JP12105794
申请日：1994-06-02
Applicant: CHUGAI RO KOGYO KAISHA LTD
Inventor： MATSUO SHIGEMI , KISODA KINYA
Abstract: PURPOSE:To dissolve a problem, such as corrosion of a tube and limitation of a tube shape, by a method wherein the interior of a furnace is heated by gas for combustion heated by one heat accumulation body and fuel injected through the other burner is burnt. CONSTITUTION:Fuel fed to a first burner 11 through a fuel feed device 19 is burnt by air for fuel fed through a second heat accumulating body 14 and a radiant tube 4 through. an air for combustion feeding device 7 and a first heat accumulating body 13 is directly heated. Exhaust gas passing through the first heat accumulating body 13 is discharged by a selectively connected exhaust gas discharge device 8. Further, air for combustion is heated by heat accumulated by combustion of a second burner 12 during the passage of it through the second heat accumulation body 14. After heated air for combustion emits heat during the flow of it through a radiant tube 14 and heats the interior of a furnace, the air for combustion is fed to the first burner 11 for combustion. The combustion operation stated above is repeated alternately by the first and second burners 11 and 12.
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公开(公告)号：JPH07243039A
公开(公告)日：1995-09-19
申请号：JP3219094
申请日：1994-03-02
Applicant: CHUGAI RO KOGYO KAISHA LTD
Inventor： KISODA KINYA , TOUCHI HACHIRO , KAMIIDE MASAO , FURUYA EIJI
IPC: C23C14/35
Abstract: PURPOSE:To conduct stabilized sputtering for a long time. CONSTITUTION:In this DC-magnetron reactive sputtering method, the magnetic field of a magnet 3 disposed on the rear side of a target 4 is moved to form an erosion region over the whole surface of the target, hence the formation of a reaction product layer is suppressed on the target surface, and further a negative DC voltage contg. a pulse having a positive peak voltage is impressed on a magnetron cathode 2 to doubly prevent the generation of an abnormal discharge on the target surface.
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公开(公告)号：JP2002324486A
公开(公告)日：2002-11-08
申请号：JP2001129239
申请日：2001-04-26
Applicant: CHUGAI RO KOGYO KAISHA LTD
Inventor： KISODA KINYA
Abstract: PROBLEM TO BE SOLVED: To provide a defective panel detecting method which can detect defective panels in an exhaust treatment and exhausts the other remaining panels, which prevents degradation in production efficiency in a continuous exhaust treatment of a plurality of hollow panels loaded on an exhaust cart. SOLUTION: In the process that a plurality of panels P2 are held in an exhaust cart 10 equipped with an exhaust means at least, and a tip tube Pa of each panel is connected to each exhaust head 18 in the exhaust cart, and the exhaust head 18 is individually connected to the exhaust means with an exhaust tube 19 having a shutoff valve 20 through an exhaust header 17 to implement the exhaust treatment while moving the exhaust cart in a furnace. If exhaust failures are detected in a plurality of panels, after all the shutoff valves of the panels are closed, the degree of vacuum in each panel is measured sequentially by opening and closing the shutoff valve of each panel. If the degree of vacuum of a panel is outside an allowable range, the panel is determined as defective.
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