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公开(公告)号：DE69919675D1
公开(公告)日：2004-09-30
申请号：DE69919675
申请日：1999-09-15
Applicant: CHUGAI RO KOGYO KAISHA LTD
Inventor： KISODA KINYA , FURUYA EIJI , OHIGASHI RYOICHI
Abstract: The invention provides a vacuum coating forming device for forming a thin-film coating by a plasma beam on a substrate arranged in a vacuum chamber, the vacuum coating forming device being provided with a pressure gradient type plasma gun for generating the plasma beam toward the vacuum chamber and a converging coil which is provided so as to surround a short-tube portion of the vacuum chamber projecting toward an outlet of the plasma gun and which reduces a cross section of the plasma beam. This vacuum coating forming device further comprises an insulating tube provided at the outlet so as to surround the plasma beam and project in electric floating state, and an electron return electrode which surrounds the insulating tube within the short-tube portion and which is higher in electric potential than the outlet.
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公开(公告)号：DE602004032352D1
公开(公告)日：2011-06-01
申请号：DE602004032352
申请日：2004-07-22
Applicant: CHUGAI RO KOGYO KAISHA LTD
Inventor： KISODA KINYA
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公开(公告)号：DE69919675T2
公开(公告)日：2005-09-08
申请号：DE69919675
申请日：1999-09-15
Applicant: CHUGAI RO KOGYO KAISHA LTD
Inventor： KISODA KINYA , FURUYA EIJI , OHIGASHI RYOICHI
Abstract: The invention provides a vacuum coating forming device for forming a thin-film coating by a plasma beam on a substrate arranged in a vacuum chamber, the vacuum coating forming device being provided with a pressure gradient type plasma gun for generating the plasma beam toward the vacuum chamber and a converging coil which is provided so as to surround a short-tube portion of the vacuum chamber projecting toward an outlet of the plasma gun and which reduces a cross section of the plasma beam. This vacuum coating forming device further comprises an insulating tube provided at the outlet so as to surround the plasma beam and project in electric floating state, and an electron return electrode which surrounds the insulating tube within the short-tube portion and which is higher in electric potential than the outlet.
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公开(公告)号：JP2000219961A
公开(公告)日：2000-08-08
申请号：JP2362599
申请日：1999-02-01
Applicant: CHUGAI RO KOGYO KAISHA LTD , DAINIPPON PRINTING CO LTD
Inventor： KISODA KINYA , FURUYA EIJI , DAITO RYOICHI
Abstract: PROBLEM TO BE SOLVED: To provide a vacuum film forming device which is capable of increasing the continuous stable maintaining time of the plasma discharge, and improving the film forming speed. SOLUTION: In a vacuum film forming device which is provided with a plasma gun 11 to generate a plasma beam 22 and a converging coil 18 which surrounds a short pipe part 12A of a vacuum chamber 12 and contracts the transverse section of the plasma beam 22, leads the plasma beam 22 to the surface of a vapor deposition source material 20 in the vacuum chamber 12 and forms a thin film on a substrate 13 arranged on an upper part in the vacuum chamber 12, comprises an insulation pipe 1 which surrounds the periphery of the plasma beam 22 and is projected in the electrically stray condition, a first electronic feedback electrode 2A which surrounds the outer periphery of the insulation pipe 1 and kept at the electric potential condition higher than that of an outlet part, and a second electronic feedback electrode which is located closer to the substrate 13 than the vapor deposition source material 20 between the vapor deposition source material 20 and the substrate 13 in a space part on the far side from a plasma gun away from a part immediately above the vapor deposition source material 20, and equal in electric potential.
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公开(公告)号：JPH07258820A
公开(公告)日：1995-10-09
申请号：JP4851694
申请日：1994-03-18
Applicant: CHUGAI RO KOGYO KAISHA LTD
Inventor： KISODA KINYA
Abstract: PURPOSE:To perform cleaning treatment and sputtering film forming treatment continuously by allowing a conductive strip-like material, on which negative D.C. voltage is impressed, to travel, forming a closed magnetic field on the surface to be treated in a cleaning treatment chamber, and applying bias electric potential in a sputtering film forming chamber. CONSTITUTION:A conductive strip-like material 2 is allowed to travel from a delivery chamber 3 to a coiling chamber 4 and negative D.C. voltage V1 is applied by a feeder roll 11, and then the material 2 is fed to a cleaning treatment chamber 8 via a heating chamber 7. Because an electrode part 20 connected to the negative D.C. voltage V1 is disposed in a manner to be opposed to a surface 2b, to be nontreated, of the material 2 to be treated in the cleaning treatment chamber 8 and the magnetic field formed by a magnet 21 is closed to the surface 2b to be nontreated, a surface 2a to be treated can be efficiently cleaned. In a successive sputtering film forming chamber 9, a film forming material 24 is disposed in a manner to be opposed to the surface 2a to be treated and the magnetic field formed by a magnet 25 in an electrode part 23 closes the surface of the film forming material 24, and bias voltage is impressed on the material 2 to be treated. As a result, a film excellent in adhesion and having superior film quality can be formed.
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Patent Agency Ranking
公开(公告)号：JPH0712663A
公开(公告)日：1995-01-17
申请号：JP15498693
申请日：1993-06-25
Applicant: NIPPON KOKAN KK , CHUGAI RO KOGYO KAISHA LTD
Inventor： SEKIGUCHI TAKESHI , UCHINO SHUZO , MATSUMURA ETSUZO , KISODA KINYA , TOUCHI HACHIRO , FURUYA EIJI
Abstract: PURPOSE:To use a vertical load detector and to reduce in size and cost by detecting a force to be applied to a tension detecting roll by a load cell, and obtaining a tension applied to a strip from a lap angle obtained by a lap angle calculator and the detected load. CONSTITUTION:A strip S sent from a reel 4 is bridged to an outer periphery of a tension detecting roll 13, switched in its direction at about 90 degrees, and guided from a passage 3 to next step by a guide roll 7. A strip winding diameter of the reel 4 is detected by a winding diameter detector 5, and a lap angle theta of the roll 13 and the strip S is obtained by a lap angle calculator 6 based on its detected value. On the other hand, a load F operated at the roll 13 is detected by a load cell 15, and a tension of the strip S is detected by a tension calculator 18 based on the detected value and the angle theta obtained by the calculator 6.
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公开(公告)号：JPH06204190A
公开(公告)日：1994-07-22
申请号：JP106593
申请日：1993-01-07
Applicant: CHUGAI RO KOGYO KAISHA LTD , NIPPON KOKAN KK
Inventor： KISODA KINYA , TOUCHI HACHIRO , FURUYA EIJI , SEKIGUCHI TAKESHI , KIBE HIROSHI , NAGAISHI SHUICHI
IPC: H01L21/302 , H01L21/304 , H01L21/3065
Abstract: PURPOSE:To prevent the drop of discharge efficiency of a processing face and the condition of discharge impossibility by preventing the occurrence of plasma at the nonprocessed face of a processed material and the abnormal discharge. CONSTITUTION:This is an anode magnetron discharge type of cleaning processor in which a discharge preventive electrode 15 capable of advance and retreat to a processed material W is arranged on the side of the nonproessed face of the processed material W, and also the potential of an anode 12 is made equal to or larger than that of the discharge preventive electrode 15, while the potential of the processed material W is made equal to or smaller than that of the discharge preventive electrode 15, and besides the potential of the anode 12 is made larger than that of the processed material W.
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公开(公告)号：JPH06108249A
公开(公告)日：1994-04-19
申请号：JP25943092
申请日：1992-09-29
Applicant: CHUGAI RO KOGYO KAISHA LTD
Inventor： KISODA KINYA , FURUYA EIJI
Abstract: PURPOSE:To perform a uniform electric discharge machining to a large-area material to be treated by providing discharge gas supply means and ammeters, etc., which control the flow rate to plural electrodes, which are connected to a common power source in parallel, independently of one another to control the discharging current to a fixed value. CONSTITUTION:Plural electrodes 5a to 5e are set in a vacuum vessel 1 and are connected to a common power source 6 in parallel. Ammeters 7a to 7e are provided on feed lines to electrodes 5a to 5e, and gas supply means 8a to 8e which supply discharge gas to electrodes 5a to 5e are provided. Discharge gas flow rate controllers 9a to 9e for feedback control are provided, and quantities of gas from gas supply means 8a to 8e are varied by the current values of ammeters 7a to 7e to fix the current values.
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公开(公告)号：JPH09184070A
公开(公告)日：1997-07-15
申请号：JP30696
申请日：1996-01-05
Applicant: CHUGAI RO KOGYO KAISHA LTD
Inventor： KISODA KINYA , TOUCHI HACHIRO
IPC: C23C14/56
Abstract: PROBLEM TO BE SOLVED: To provide a shutter mechanism of a PVD film forming apparatus which forms thin films on substrates with good workability without contaminating the inside of a main chamber and without providing this apparatus with dummy plates. SOLUTION: The PVD film forming apparatus constituted to communicate the main chamber for transporting substrates W and a sub-chamber 20 having a thin film material supplying source S via an aperture 2 is disposed with two shutter plates 11a, 11b for V shielding the aperture in the main chamber. The first shutter plate 11a shielding the aperture 2 is moved synchronously without the spacing from the substrates at the point of the time the front end of the one or continuous plural substrates arrive at the aperture 2. The movement of the first shutter plate is stopped at the point of the time the front end of the one or plural substrates arrive at the aperture. On the other hand, the second shutter plate 11b is synchronously without the spacing from the rear ends of the substrate at the point of the time the front end of the one or plural substrates arrive at the aperture. The second shutter plate 11b is stopped at the point of the time the aperture is shielded.
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公开(公告)号：JPH08239750A
公开(公告)日：1996-09-17
申请号：JP3989095
申请日：1995-02-28
Applicant: CHUGAI RO KOGYO KAISHA LTD
Inventor： KISODA KINYA , SHINTANI MASANORI
Abstract: PURPOSE: To perform the treatment causing no changes in the material characteristics of sheet and capable of improving adhesion and film quality. CONSTITUTION: A sheet S, composed of copper, aluminum, or alloy thereof, is wound on a cooling roll 9 and conveyed. Simultaneously, the temp. of the sheet is maintained at
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