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公开(公告)号：JP2002063853A
公开(公告)日：2002-02-28
申请号：JP2000245803
申请日：2000-08-14
Applicant: CHUGAI RO KOGYO KAISHA LTD
Inventor： SHINTANI MASANORI
Abstract: PROBLEM TO BE SOLVED: To provide a plasma gun with a pressure gradient, which is resistant to heat and shocks, hardly causes damages to sealed part, being easy to position an insulation member at an assembly. SOLUTION: The plasma gun with pressure gradient I1, composed of a cathode part 11, and a cylindrical insulation member 14 with a first middle electrode 12 and a second middle electrode 13, forming a sealed space between the cathode part 11 and the first middle electrode 12, and sealing collars 3A, 3B with an insulation member 14 composed of a water cooled metallic cylindrical body 2 with a water-cooling jacket 1, interposed between the water-cooled metallic cylindrical body 2 and the cathode part 11, and between the water-cooled metallic cylindrical body 2 and the first middle electrode 12 respectively, keeping the water-cooled metallic cylindrical body 2 in a state of electrical isolation.
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公开(公告)号：JPH11350112A
公开(公告)日：1999-12-21
申请号：JP16341598
申请日：1998-06-11
Applicant: CHUGAI RO KOGYO KAISHA LTD
Inventor： SHINTANI MASANORI
IPC: C23C14/24
Abstract: PROBLEM TO BE SOLVED: To provide a packing method of an evaporating material in a PVD device, which makes it possible to uniformize the thickness of a formed thin film and to improve the variation between products. SOLUTION: In a PVD device in which a plasma beam 16 generated by a plasma gun 11 is guided onto a powdery, particulate or pellet like evaporating material M stored in a crucible 13 in the inside of a vacuum chamber 12 and a thin film is formed on the lower surface of a substrate 17 positioned at the upper side of the evaporating material M, the evaporation material M is supplied to a reduced amt. part of the evaporation material M in the crucible 13 and the upper surface of a newly supplied part of the material M in the crucible 13 is smoothed by uniformly pressurizing so that simultaneously the packing density of the newly supplied evaporation material M is maintained constant.
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公开(公告)号：JPH0641754A
公开(公告)日：1994-02-15
申请号：JP20110492
申请日：1992-07-28
Applicant: CHUGAI RO KOGYO KAISHA LTD
Inventor： HIGETA KAZUYA , KAMIIDE MASAO , SHINTANI MASANORI , MATSUSHIMA KATSUMI
IPC: C23C16/50 , C23C16/511
Abstract: PURPOSE:To enable the formation of a film uniform both in the thickness and quality thereof on the surface of a substrate by arranging at least a pair of magnets while making the same poles are arranged to each other so as to hold a sheet-shaped plasma therebetween. CONSTITUTION:Plural pairs of permanent magnets 7a, 7b to 10a, 10b are provided while making the same poles face each other so as to hold the sheet- shaped plasma P formed by the permanent magnet 5a, 5b threbeetween. After the plasma generated from a plasma gun 2 is formed in the sheet-shape by the permanent magnets 5a, 5b, the thickness thereof is increased as the influence of the magnetic field of the permanent magnets 5a, 5b is decreased. However, the thickness of the plasma is made thinner again by the permanent magnets 7a, 7a. Thereafter, the thickness of the plasma is made thinner by the next permanent magnets 8a, 8b, although the thickness of the plasma is increased again. Thereafter, the plasma reaches an anode 3 by repeating the increase and decrease in the thickness thereof. A gaseous raw material and a reaction gas supplied from a nozzle 6 are activated in the sheet-shaped plasma P, thus the film having uniform thickness and quality is formed on the substrate W.
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公开(公告)号：JPH05209269A
公开(公告)日：1993-08-20
申请号：JP1484492
申请日：1992-01-30
Applicant: CHUGAI RO KOGYO KAISHA LTD
Inventor： KAMIIDE MASAO , SHINTANI MASANORI
Abstract: PURPOSE:To provide a plasma scanning apparatus controlling the converging position of a plasma beam to the anode and capable of properly adjusting the condition of film forming. CONSTITUTION:In a thin film forming apparatus in which a plasma beam P generated by a plasma gun 10 is extracted into a vacuum vessel 2 by a magnetic field formed by a hollow coil 12, and this plasma beam P is converged on the anode 7 by a magnetic field formed by a magnet 8, an annular body 13 made of magnetic material provided with an electromagnets Ma and Mb concentrically confronted with the hollow coil 12 are deposited, and a power source 16 and a power source controller 17 are connected to the electromagnets Ma and Mb.
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公开(公告)号：JPH059706A
公开(公告)日：1993-01-19
申请号：JP16160491
申请日：1991-07-02
Applicant: CHUGAI RO KOGYO KAISHA LTD
Inventor： SHINTANI MASANORI
Abstract: PURPOSE:To efficiently and uniformly heat a metal strip travelling in vacuum. CONSTITUTION:A metal strip S travelling in vacuum is supported by a hollow roll 11, a plasma jet 14 from a plasma gun 13 is deformed into a slender sheet shape in the transverse direction of the strip S with magnetic field by permanent magnets 16 and the resulting sheet-shaped plasma jet is led onto the strip S with a magnetic field applied by a permanent magnet 12 set in the roll 11 to heat the strip S.
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Patent Agency Ranking
公开(公告)号：JPH04350157A
公开(公告)日：1992-12-04
申请号：JP12370491
申请日：1991-05-28
Applicant: CHUGAI RO KOGYO KAISHA LTD
Inventor： SHINTANI MASANORI
Abstract: PURPOSE:To provide a PVD device capable of producing a thin film vapor deposited on a surface of a substrate having a uniform thickness and being easily changeable the vapor deposit surface area. CONSTITUTION:In a PVD device in which plasma flow 3 from a plasma gun 2 is introduced by a magnetic field to upper of an evaporating material crusible 5 to evaporate a volatile raw material 4 and thin film is formed on a surface of a substrate 10 placed at upper of volatile raw material, plural permanent magnets 6a-6d are arranged to be movable in horizontal direction under the volatile material crusible.
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公开(公告)号：JP2001131733A
公开(公告)日：2001-05-15
申请号：JP31667399
申请日：1999-11-08
Applicant: CHUGAI RO KOGYO KAISHA LTD , ANELVA CORP
Inventor： SHINTANI MASANORI , NAKAKAWARA HITOSHI
IPC: C23C14/24
Abstract: PROBLEM TO BE SOLVED: To provide a substrate-passing type vacuum vapor deposition system which can adjust the angle of incidence and the range of incidence of evaporated particles on a substrate. SOLUTION: In the substrate-passing type vacuum vapor deposition system to communicate a main chamber 2 through which the substrate 1 passes with a sub chamber 4 arranged with a raw material 3 for vapor deposition via an opening part H, a forward stage shielding plate 11 to determine the position of a rear edge part of the opening part H and a rear stage shielding plate 12 to determine the position of a forward edge part of the opening part which are advanced/retracted to/from the substrate 1 parallel thereto, are provided in the main chamber 2.
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公开(公告)号：JP2000306695A
公开(公告)日：2000-11-02
申请号：JP11631399
申请日：1999-04-23
Applicant: CHUGAI RO KOGYO KAISHA LTD
Inventor： SHINTANI MASANORI
Abstract: PROBLEM TO BE SOLVED: To provide a plasma gun preventing generation of an abnormal discharge at the beginning of an operation to prevent generation of break of an insulating pipe caused by the abnormal discharge, gas leakage caused by the break, damage to a seal structure in an insulating pipe attachment part, or the like. SOLUTION: This plasma gun 1A has a cylindrical insulating pipe 3A interposed between a cathode mount 13 having a plasma gas inlet 12 in its center part and an annular first middle electrode 14; and a cathode 17 projecting from the cathode mount 13 toward the first middle electrode 14 in a space part within the insulating pipe 3A, and forming a plasma gas passage 16 continuing from the plasma gas inlet 12. An annular body 2A surrounding the cathode 17 in a non-contact state with the cathode 17 is projected from the inner circumferential face of the insulating pipe 3A.
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公开(公告)号：JPH0416722B2
公开(公告)日：1992-03-25
申请号：JP7602286
申请日：1986-04-01
Applicant: CHUGAI RO KOGYO KAISHA LTD
Inventor： SHINTANI MASANORI
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公开(公告)号：JPH0450625A
公开(公告)日：1992-02-19
申请号：JP15473190
申请日：1990-06-12
Applicant: CHUGAI RO KOGYO KAISHA LTD
Inventor： SHINTANI MASANORI
IPC: G01K13/06
Abstract: PURPOSE:To measure the temperature of a moving body accurately without any damages in a thermometer and the moving body by bringing a contact type thermometer into contact when the speed of the thermometer becomes the same speed of the moving speed of the moving body. CONSTITUTION:A moving table 2 moves on a guide rail at the same speed as that of a metal strip 1. When the moving table 2 is positioned at a movement starting point 0, the table 2 is located at a starting point which is higher than the metal strip 1 by l. When an operation-starting command signal 11 is outputted, an acceleration required for the contact of a contact type thermometer 5 with the metal strip 1 is computed in a Y acceleration computing element 10 when the moving table 2 reaches a first specified point (a). A motor 6 is rotated through a position mechanism 13 based on tghe computed acceleration. The thermometer comes into contact with the metal strip 1 at the first specified point (a). Thereafter, the contact type thermometer 5 is in contact with the surface of the metal strip 1.
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