公开(公告)号：US07952726B2

公开(公告)日：2011-05-31

申请号：US12280926

申请日：2007-02-28

Applicant: Seima Kato ,  Chidane Ouchi

Inventor： Seima Kato ,  Chidane Ouchi

IPC: G01B9/02 ,  G03B27/54

CPC classification number: G03F7/706

Abstract: A measurement apparatus includes a first mask that is arranged on an object plane of a target optical system, and has a window that transmits measurement light, a second mask that has a reflection surface for reducing coherence of the measurement light, and a diffraction grating configured to split the measurement light that has been reflected on the second mask, has passed the first mask and the target optical system, wherein a distance Lg between the diffraction grating and an image plane of the target optical system satisfies Lg=m·Pg2/λ where Pg is a grating pitch of the diffraction grating, λ is a wavelength of the measurement light, and m is an integer except for 0.

Abstract translation: 测量装置包括布置在目标光学系统的物平面上并具有透射测量光的窗口的第一掩模，具有用于减小测量光的相干性的反射表面的第二掩模和配置在所述衍射光栅中的衍射光栅 通过第一掩模和目标光学系统，将衍射光栅与目标光学系统的像面之间的距离Lg分别满足Lg = m·Pg2 /λ 其中Pg是衍射光栅的光栅间距，λ是测量光的波长，m是除0之外的整数。

公开(公告)号：US20100235137A1

公开(公告)日：2010-09-16

申请号：US12676002

申请日：2008-11-18

Applicant: Yuzo Seo ,  Chidane Ouchi ,  Takao Ukaji

Inventor： Yuzo Seo ,  Chidane Ouchi ,  Takao Ukaji

IPC: G01B11/14 ,  G06F15/00 ,  G06F17/18

CPC classification number: G01B9/02083 ,  G01B9/02007 ,  G01B2290/70

Abstract: An absolute position measurement apparatus measures an absolute position of an object to be measured using a first light source and a second light source which has coherency lower than that of the first light source. The absolute position measurement apparatus includes a measurement part which measures a point where phases of interference signals from the first and the second light sources coincide with each other or a point where an intensity of the interference signal from the second light source is maximized, an origin defining part which defines the point measured by the measurement part as an origin position, a phase storing part which stores the phase of the interference signal from the first light source at the origin position, an origin redefining part which redefines the origin position, and a position calculating part which calculates the absolute position of the object to be measured.

Abstract translation: 绝对位置测量装置使用具有低于第一光源的相干性的第一光源和第二光源来测量被测量物体的绝对位置。 绝对位置测量装置包括测量部分，其测量来自第一和第二光源的干扰信号的相位彼此一致的点或来自第二光源的干扰信号的强度最大化的点，原点 将由测量部分测量的点定义为原点位置的定义部分，存储来自第一光源的干涉信号在原点位置的相位的相位存储部分，重新​​定义原点位置的原点重新定义部分，以及 位置计算部，其计算被测量物体的绝对位置。

公开(公告)号：US06774982B2

公开(公告)日：2004-08-10

申请号：US09986323

申请日：2001-11-08

Applicant: Chidane Ouchi

Inventor： Chidane Ouchi

IPC: G03B2754

CPC classification number: G03F7/706 ,  G03F7/70991

Abstract: An exposure apparatus includes an illumination optical system for illuminating a pattern of a reticle with laser light outputted from a continuous emission laser, a projection optical system for projecting the illuminated pattern onto a subject to be exposed, and an interferometer, of a Fizeau type, being operable while using laser light outputted from the continuous emission laser.

Abstract translation: 曝光装置包括：照明光学系统，用于通过从连续发射激光器输出的激光照射标线图案;投影光学系统，用于将照射图案投射到待曝光的对象上;以及干涉仪，Fizeau型， 在使用从连续发射激光器输出的激光时可操作。

公开(公告)号：US5067811A

公开(公告)日：1991-11-26

申请号：US542652

申请日：1990-06-25

Applicant: Chidane Ouchi

Inventor： Chidane Ouchi

IPC: G01J1/02 ,  G01J1/42 ,  G01J1/44 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

CPC classification number: G01J1/4228 ,  G01J1/4257 ,  G03F7/70058 ,  G03F7/70358

Abstract: An illuminance distribution measuring system which includes a two-dimensional (area) sensor array to be disposed on the surface being illuminated by a pulsed laser beam from a pulsed laser and a signal processor operable, in response to output signals of the sensor array, to detect the illuminance distribution on the surface being illuminated.

Abstract translation: 一种照度分布测量系统，其包括要被布置在由脉冲激光器的脉冲激光束照射的表面上的二维（区域）传感器阵列和可响应于传感器阵列的输出信号而操作的信号处理器 检测被照射的表面上的照度分布。

公开(公告)号：US08520217B2

公开(公告)日：2013-08-27

申请号：US12765037

申请日：2010-04-22

Applicant: Toshiyuki Naoi ,  Seima Kato ,  Naoki Kohara ,  Chidane Ouchi

Inventor： Toshiyuki Naoi ,  Seima Kato ,  Naoki Kohara ,  Chidane Ouchi

IPC: G01B11/02 ,  G01B9/02

CPC classification number: G01B9/02097 ,  G01B9/02024 ,  G01B2290/30

Abstract: A Talbot interferometer includes a diffraction grating, an image pickup device, a moving unit configured to move at least one of the diffraction grating and the image pickup device in an optical axis direction of the test object, and a computer configured to adjust a position of the at least one of the diffraction grating and the image pickup device using the moving unit so that a Talbot condition can be met, based on a spatial frequency spectrum obtained from a plurality of interference fringes captured by the image pickup device while moving the at least one of the diffraction grating and the image pickup device using the moving unit.

Abstract translation: Talbot干涉仪包括衍射光栅，图像拾取装置，被配置为沿着测试对象的光轴方向移动衍射光栅和图像拾取装置中的至少一个的移动单元，以及计算机，被配置为调整 所述至少一个所述衍射光栅和所述图像拾取装置使用所述移动单元，从而可以基于从所述图像拾取装置捕获的多个干涉条纹获得的空间频谱，同时至少移动所述至少一个 衍射光栅中的一个和使用移动单元的图像拾取装置。

公开(公告)号：US20130070895A1

公开(公告)日：2013-03-21

申请号：US13610365

申请日：2012-09-11

Applicant: Chidane Ouchi

Inventor： Chidane Ouchi

IPC: G01N23/04

CPC classification number: G01N23/04 ,  A61B6/484 ,  G01N2223/313 ,  G01N2223/3301

Abstract: An X-ray imaging apparatus for imaging a subject includes a diffraction grating configured to form an interference pattern by diffracting X-ray radiation from an X-ray source, a shielding grating configured to shield part of the interference pattern, a detector configured to detect the X-ray radiation passing through the shielding grating, and a moving unit configured to change an angle between each of the diffraction grating, the shielding grating and the detector and an optical axis, wherein the detector is configured to detect the X-ray according to a change in the angle between each of the diffraction grating, the shielding grating and the detector and the optical axis.

Abstract translation: 用于成像对象的X射线成像装置包括被构造成通过衍射来自X射线源的X射线辐射而形成干涉图案的衍射光栅，被配置为屏蔽部分干涉图案的屏蔽光栅，被配置为检测 穿过屏蔽光栅的X射线辐射，以及被配置为改变每个衍射光栅，屏蔽光栅和检测器之间的角度和光轴的移动单元，其中检测器被配置为根据 涉及每个衍射光栅，屏蔽光栅和检测器之间的角度以及光轴的变化。

公开(公告)号：US20120236988A1

公开(公告)日：2012-09-20

申请号：US13416339

申请日：2012-03-09

Applicant: Toru Den ,  Kimiaki Yamaguchi ,  Chidane Ouchi

Inventor： Toru Den ,  Kimiaki Yamaguchi ,  Chidane Ouchi

IPC: G01N23/04

CPC classification number: G21K1/067 ,  A61B6/484 ,  G01N23/046 ,  G01N23/20075 ,  G01N2223/419 ,  G21K2207/005

Abstract: An X-ray imaging apparatus comprises a grating configured to form an interference pattern by diffracting X-rays from an X-ray source, a amplitude grating configured to partly shield X-rays forming the interference pattern, and an X-ray detector configured to detect an intensity distribution of X-rays from the amplitude grating. The amplitude grating is comprised of a central area and a peripheral area and the peripheral area shows an X-ray transmittance higher than the central area relative to X-rays perpendicularly entering the amplitude grating.

Abstract translation: 一种X射线摄像装置，其特征在于，包括：被配置为通过衍射来自X射线源的X射线形成干涉图案的光栅;被配置为部分地屏蔽形成所述干涉图案的X射线的振幅光栅;以及X射线检测器， 检测来自幅度光栅的X射线的强度分布。 振幅光栅由中心区域和外围区域组成，周边区域相对于垂直进入振幅光栅的X射线，显示高于中心区域的X射线透射率。

公开(公告)号：US08009797B2

公开(公告)日：2011-08-30

申请号：US12842937

申请日：2010-07-23

Applicant: Chidane Ouchi ,  Kentaro Nagai ,  Toru Den ,  Hidenosuke Itoh

Inventor： Chidane Ouchi ,  Kentaro Nagai ,  Toru Den ,  Hidenosuke Itoh

IPC: G03H5/00

CPC classification number: G06T7/0002 ,  A61B6/4291 ,  A61B6/484 ,  G01J9/02 ,  G01N23/04 ,  G01N23/20075 ,  G01N2223/401 ,  G21K1/06 ,  G21K2201/06 ,  G21K2201/067

Abstract: An X-ray imaging apparatus includes a phase grating, an absorption grating, a detector, and an arithmetic unit. The arithmetic unit executes a Fourier transform step of performing Fourier transform for an intensity distribution of a Moiré acquired by the detector, and acquiring a spatial frequency spectrum. Also, the arithmetic unit executes a phase retrieval step of separating a spectrum corresponding to a carrier frequency from a spatial frequency spectrum acquired in the Fourier transform step, performing inverse Fourier transform for the separated spectrum, and acquiring a differential phase image.

Abstract translation: X射线成像装置包括相位光栅，吸收光栅，检测器和运算单元。 算术单元执行对由检测器获取的莫尔的强度分布执行傅里叶变换并获取空间频谱的傅里叶变换步骤。 此外，运算单元执行相位检索步骤，从傅里叶变换步骤中获取的空间频谱中分离出与载波频率对应的频谱，对分离的频谱进行傅里叶逆变换，获取差分相位图像。

公开(公告)号：US20100290590A1

公开(公告)日：2010-11-18

申请号：US12842937

申请日：2010-07-23

Applicant: Chidane Ouchi ,  Kentaro Nagai ,  Toru Den ,  Hidenosuke Itoh

Inventor： Chidane Ouchi ,  Kentaro Nagai ,  Toru Den ,  Hidenosuke Itoh

IPC: G01N23/04

CPC classification number: G06T7/0002 ,  A61B6/4291 ,  A61B6/484 ,  G01J9/02 ,  G01N23/04 ,  G01N23/20075 ,  G01N2223/401 ,  G21K1/06 ,  G21K2201/06 ,  G21K2201/067

Abstract: An X-ray imaging apparatus includes a phase grating, an absorption grating, a detector, and an arithmetic unit. The arithmetic unit executes a Fourier transform step of performing Fourier transform for an intensity distribution of a Moiré acquired by the detector, and acquiring a spatial frequency spectrum. Also, the arithmetic unit executes a phase retrieval step of separating a spectrum corresponding to a carrier frequency from a spatial frequency spectrum acquired in the Fourier transform step, performing inverse Fourier transform for the separated spectrum, and acquiring a differential phase image.

Abstract translation: X射线成像装置包括相位光栅，吸收光栅，检测器和运算单元。 算术单元执行对由检测器获取的莫尔的强度分布执行傅里叶变换并获取空间频谱的傅里叶变换步骤。 此外，运算单元执行相位检索步骤，从傅里叶变换步骤中获取的空间频谱中分离出与载波频率对应的频谱，对分离的频谱进行傅里叶逆变换，获取差分相位图像。

公开(公告)号：US20050117168A1

公开(公告)日：2005-06-02

申请号：US10994331

申请日：2004-11-23

Applicant: Chidane Ouchi

Inventor： Chidane Ouchi

IPC: G21K1/06 ,  G01B9/02 ,  G01J9/02 ,  G01M11/02 ,  G03F7/20 ,  G21K5/00 ,  G21K5/02 ,  H01L21/027

CPC classification number: G03F7/706 ,  G01J9/0215 ,  G03F7/70266

Abstract: A measuring method for measuring wave front of light, which passed through a target optical system includes the steps of, generating an interference fringe using a shearing interference with light that passes a target optical system, calculating a differential wave front between a first wave front of the light that passes the target optical system and a second wave front made by offsetting the first wave front by a predetermined amount in a predetermined direction, and correcting the differential wave front based on the predetermined amount and the wave number in the predetermined direction.

Abstract translation: 用于测量通过目标光学系统的光的前端的测量方法包括以下步骤：利用通过目标光学系统的光的剪切干涉产生干涉条纹，计算第一波前的差分波前 通过目标光学系统的光和通过在预定方向上将第一波前偏移预定量而形成的第二波前，并且基于预定量和预定方向上的波数来校正差分波前。