11.
    发明专利
    未知

    公开(公告)号:AT410708T

    公开(公告)日:2008-10-15

    申请号:AT04727565

    申请日:2004-04-15

    Applicant: ESSILOR INT

    Abstract: The invention concerns a photocurable adhesive composition comprising, based on total weight of photopolymerizable monomers and/or oligomers of the composition: 5 to 60 wt % of at least one mono or polyacrylate monomer or oligomer thereof (A); 5 to 50 wt % of at least one thio(meth)acrylate monomer or oligomer thereof (B); and 20 to 50 wt % of at least one aromatic dimethacrylate monomer or oligomer thereof (C); with the proviso that the composition does not contain a brominated monofunctional acrylate.

    12.
    发明专利
    未知

    公开(公告)号:BRPI0409388A

    公开(公告)日:2006-04-18

    申请号:BRPI0409388

    申请日:2004-04-15

    Applicant: ESSILOR INT

    Abstract: The invention concerns a photocurable adhesive composition comprising, based on total weight of photopolymerizable monomers and/or oligomers of the composition: 5 to 60 wt % of at least one mono or polyacrylate monomer or oligomer thereof (A); 5 to 50 wt % of at least one thio(meth)acrylate monomer or oligomer thereof (B); and 20 to 50 wt % of at least one aromatic dimethacrylate monomer or oligomer thereof (C); with the proviso that the composition does not contain a brominated monofunctional acrylate.

    14.
    发明专利
    未知

    公开(公告)号:DE602004012537T2

    公开(公告)日:2008-11-27

    申请号:DE602004012537

    申请日:2004-03-24

    Applicant: ESSILOR INT

    Abstract: Disclosed is a thiophosphine compound of formula: wherein X represents with R 1 being H or -CH 3 , R and R' represent, independently from each other, an alkyl radical, an alkoxy radical, an aryl radical or a phenyl radical which may be substituted with one or more alkyl and/or alkoxy groups, n is an integer from 0 to 4, n' is an integer from 0 to 5, x is an integer from 0 to 2, y is an integer from 1 to 5 with the proviso that y+n is an integer from 1 to 5. The compounds can be used to make optically transparent articles such as ophthalmic lenses.

    16.
    发明专利
    未知

    公开(公告)号:DE60112261D1

    公开(公告)日:2005-09-01

    申请号:DE60112261

    申请日:2001-02-02

    Applicant: ESSILOR INT

    Abstract: A process for polymerizing/curing a photopolymerizable monomer composition comprising at least one diepisulfide monomer which comprises the steps of:a) mixing to the monomer composition an effective amount of a cationic photopolymerization initiator, andb) irradiating the mixture of a) with an ultraviolet radiation to at least partially cationically photopolymerize the monomer composition.

    17.
    发明专利
    未知

    公开(公告)号:AT300572T

    公开(公告)日:2005-08-15

    申请号:AT01925327

    申请日:2001-02-02

    Applicant: ESSILOR INT

    Abstract: A process for polymerizing/curing a photopolymerizable monomer composition comprising at least one diepisulfide monomer which comprises the steps of:a) mixing to the monomer composition an effective amount of a cationic photopolymerization initiator, andb) irradiating the mixture of a) with an ultraviolet radiation to at least partially cationically photopolymerize the monomer composition.

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