Abstract:
A method for manufacturing a conductive pattern material is provided with a process of directly bonding a graft polymer, which has a functional group and a crosslinkable functional group that can mutually interact with conductive particles, on a substrate in a pattern; a process of forming a conductive particle adsorbing layer by permitting the functional group which can mutually interact with conductive particles in the graft polymer to adsorb conductive particles; and a process of forming a crosslinking structure in the conductive particle adsorbing layer by applying energy to the conductive particle adsorbing layer. In this method, a conductive pattern material provided with a conductive pattern which has a high resolution without interruption and has excellent durability can be manufactured. The conductive pattern material can be also obtained by introducing a functional group which can mutually interact with an electroless plating catalyst, instead of the functional group which can mutually interact with conductive particles, and by adsorbing the electroless plating catalyst and the like and performing electroless plating process.
Abstract:
PROBLEM TO BE SOLVED: To provide a multilayer substrate manufacturing method which can leave a plating target layer even when a desmear treatment is performed and maintain smoothness of a surface of the plating target layer, and manufacture a multilayer substrate including metal layers excellent in adhesion formed on the plating target layer.SOLUTION: A multilayer substrate manufacturing method comprises: a process (A) of forming a plating target layer having a functional group changing from hydrophobic to hydrophilic by heat, acid or radiation on a surface of a substrate with a conductive layer on the conductive layer side; a process (B) of forming a via hole penetrating the plating target layer to reach the conductive layer; a process (C) of performing a desmear treatment using a desmear treatment liquid; a process (D) of performing heating, supply of acid or irradiation of radiation to transform the functional group from hydrophobic to hydrophilic; a process (E) of applying a plating catalyst or a precursor of the plating catalyst; and a process (F) of performing plating on the plating target layer to which the plating catalyst or the precursor of the plating catalyst is applied.
Abstract:
PROBLEM TO BE SOLVED: To provide a production method for a laminate having patterned metal films, capable of readily plasma etching a plating layer and of obtaining a laminate having excellent insulating properties between the patterned metal films.SOLUTION: The production method for the laminate having patterned metal films includes: a plating layer-forming step in which a plating layer is formed on top of a substrate, using a plating layer-forming composition including a polymer having a prescribed unit; a catalyst application step in which a plating catalyst or a precursor thereof is applied to the plating layer; a plating step in which plating is performed and a metal film is formed on top of the plating layer; a pattern-forming step in which an etching fluid is used to form the patterned metal film; an acidic solution contacting step in which the substrate having the patterned metal film and an acidic solution are brought in contact with each other; and a plating layer-removal step in which the plating layer in an area in which no patterned metal film is formed, is removed by plasma etching.
Abstract:
PROBLEM TO BE SOLVED: To provide a method for manufacturing a laminate having a metal film that inhibits the formation of nodules on a precipitated plating film (metal film).SOLUTION: The method for manufacturing the laminate having the metal film includes: a plating-target-layer formation step of using a plating-target-layer formation composition containing a polymer containing a prescribed functional group to form a plating-target layer 12 on a substrate 10; an aqueous-alkaline-solution contact step of bringing an aqueous alkaline solution containing a prescribed component into contact with the plating-target layer 12; a catalyst-application step of applying a plating catalyst or a precursor therefor to the plating-target layer 12 from which uncured parts have been removed; and a plating step of performing plating process to form the metal film 14 on the plating-target layer 12.
Abstract:
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for plating which allows a plating catalyst or its precursor accepting layer to be formed and which is excellent in adhesion with a metal film formed by plating and smoothness of the resin-metal interface and has high film formation sensitivity and good production suitability; and to provide a method for producing a substrate with a metal layer by which the substrate with a metal layer excellent in the adhesion between the metal layer and the substrate can be easily formed with a low energy. SOLUTION: The photosensitive resin composition for plating allowing a plating catalyst or its precursor accepting layer to be formed is characterized by containing a polymer having a functional group forming a coordination bond interaction with the plating catalyst or its precursor and a polymerizable group, and a polyfunctional monomer having at least two polymerizable groups in the molecule. COPYRIGHT: (C)2009,JPO&INPIT