公开(公告)号：US20180288863A1

公开(公告)日：2018-10-04

申请号：US16001441

申请日：2018-06-06

Applicant: GIGAPHOTON INC.

Inventor： Takahisa FUJIMAKI ,  Takayuki YABU ,  Yuta TAKASHIMA ,  Fumio IWAMOTO ,  Yutaka SHIRAISHI

IPC: H05G2/00

CPC classification number: H05G2/006 ,  G05D16/2006 ,  G05D23/19 ,  H05G2/00 ,  H05G2/008

Abstract: A target supply device may include a nozzle configured to output a liquid target substance contained in a tank, an excitation element, a droplet detection unit configured to detect a droplet output from the nozzle, a passage time interval measurement unit configured to measure a passage time interval of droplets, and a control unit. The control unit may be configured to set a proper range of the passage time interval, change the duty value of the electric signal to be input to the excitation element, store the passage time interval measurement values of the droplets generated with respect to a plurality of duty values and variation thereof in association with the duty values, and determine an operation duty value based on the variation from among the duty values with which the passage time interval measurement values are within the proper range, among the duty values.

公开(公告)号：US20170307979A1

公开(公告)日：2017-10-26

申请号：US15645295

申请日：2017-07-10

Applicant: Gigaphoton Inc.

Inventor： Tsukasa HORI ,  Fumio IWAMOTO ,  Kazukiyo KAMIKANNA

IPC: G03F7/20

CPC classification number: H05G2/008 ,  G03F7/2002 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006

Abstract: An EUV light generation device generates EUV light stably. The EUV light generation device may include a chamber in which extreme ultraviolet light is generated when a target is irradiated with laser light in a predetermined region inside the chamber, a target supply device configured to output the target to the predetermined region in the chamber to thereby supply the target to the predetermined region, and a target recovery apparatus configured to recover the target output from the target supply device and not irradiated with the laser light. The target recovery apparatus may include a receiver disposed to be inclined with respect to a trajectory of the target output from the target supply device, the receiver being configured to receive the target by allowing the target not irradiated with the laser light to collide with the receiver, and an excitation device configured to vibrate the receiver.

公开(公告)号：US20170053780A1

公开(公告)日：2017-02-23

申请号：US15346431

申请日：2016-11-08

Applicant: Gigaphoton Inc.

Inventor： Fumio IWAMOTO ,  Yutaka SHIRAISHI ,  Tsukasa HORI ,  Osamu WAKABAYASHI

IPC: H01J37/32

CPC classification number: H01J37/32449 ,  H05G2/00 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A target supply device may be provided with a tank configured to contain a metal as a target material, a nozzle having a nozzle hole through which the target material is output from the tank, a filter disposed in a communication portion for conducting the target material from the tank to the nozzle hole, a temperature adjuster configured to change the temperature of the target material in the tank, and a controller controlling the temperature adjuster to change the temperature of the target material in the tank such that oxygen in the target material is precipitated as metal oxide.

Abstract translation: 目标供给装置可以设置有容纳作为目标材料的金属的罐，具有目标材料从罐输出的喷嘴孔的喷嘴，设置在用于将目标材料传导的连通部中的过滤器 所述罐到喷嘴孔，温度调节器，其构造成改变罐中的目标材料的温度;以及控制器，控制温度调节器以改变罐中的目标材料的温度，使得靶材料中的氧沉淀 作为金属氧化物。

公开(公告)号：US20160227637A1

公开(公告)日：2016-08-04

申请号：US14992477

申请日：2014-06-13

Applicant: GIGAPHOTON INC.

Inventor： Tomohide ICHINOSE ,  Fumio IWAMOTO ,  Yutaka SHIRAISHI ,  Tsukasa HORI ,  Hideo HOSHINO

IPC: H05G2/00 ,  G03F7/20

CPC classification number: H05G2/006 ,  B01D25/16 ,  B01D29/46 ,  B01D46/406 ,  G03F7/70191 ,  H05G2/005

Abstract: A filter may include: a first member having a first surface provided with a channel; and a second member set with a second surface thereof covering the channel. The first member may include a first passable portion that allows a fluid to pass between the first surface and a first space, which is defined beside a surface of the first member opposite to the first surface, through a first area of the channel. The second member may include a second passable portion that allows the fluid to pass between the second surface and a second space, which is defined beside a surface of the second member opposite to the second surface, through a second area of the channel distanced from the first area.

Abstract translation: 过滤器可以包括：具有设置有通道的第一表面的第一构件; 以及第二构件，其具有覆盖所述通道的第二表面。 第一构件可以包括第一可通过部分，其允许流体在通道的第一区域之间在第一表面和限定在与第一表面相对的第一构件的表面旁边的第一空间之间通过。 第二构件可以包括第二可通过部分，其允许流体在第二表面和第二空间之间通过，第二空间限定在与第二表面相对的第二构件的表面旁边，通过与第二空间相距的通道的第二区域 第一区。

公开(公告)号：US20230266677A1

公开(公告)日：2023-08-24

申请号：US18149998

申请日：2023-01-04

Applicant: Gigaphoton Inc.

Inventor： Fumio IWAMOTO ,  Atsushi UEDA ,  Takayuki YABU

IPC: G03F7/20 ,  G03F1/24

CPC classification number: G03F7/70741 ,  G03F7/70841 ,  G03F1/24

Abstract: A target supply system includes a load lock chamber configured to contain a solid target substance, a solid target supply pipe connected to the load lock chamber, a pressure regulator configured to regulate an externally supplied gas pressure, a gas pressure supply pipe connected to the pressure regulator, a melting tank connected to both the solid target supply pipe and the gas pressure supply pipe, and configured to melt the solid target substance supplied from the load lock chamber via the solid target supply pipe to generate a liquid target substance, a nozzle configured to discharge the liquid target substance by a gas pressure supplied from the pressure regulator to the melting tank via the gas pressure supply pipe, and a buffer tank configured to communicate with the melting tank and supply a gas pressure thereto when the solid target substance is supplied to the melting tank.

公开(公告)号：US20220159818A1

公开(公告)日：2022-05-19

申请号：US17493407

申请日：2021-10-04

Applicant: Gigaphoton Inc.

Inventor： Koji YAMASAKI ,  Fumio IWAMOTO

IPC: H05G2/00

Abstract: A target supply device may include a tank configured to store a target substance, a pressure adjuster configured to adjust a pressure in the tank, a filter configured to filter the target substance in the tank, a nozzle configured to output a droplet of the target substance having passed through the filter, a droplet detector configured to detect outputting of the droplet from the nozzle, and a processor configured to control the pressure adjuster so that a pressure-increasing speed of the pressure in the tank is higher after detection of outputting of the droplet than before detection of outputting of the droplet, during a period in which the pressure in the tank is increased to a target pressure from a pressure at which outputting of the droplet is detected by the droplet detector for the first time after installation of the target supply device.

公开(公告)号：US20200341383A1

公开(公告)日：2020-10-29

申请号：US16925567

申请日：2020-07-10

Applicant: Gigaphoton Inc.

Inventor： Fumio IWAMOTO ,  Yutaka SHIRAISHI ,  Tsukasa HORI

IPC: G03F7/20 ,  H05G2/00

Abstract: A target supply device includes a tank body portion holding a target substance; a communication portion connected to the tank body portion and including a filter that filters the melted target substance and a nozzle that discharges the target substance having passed through the filter; a main heater that heats the tank body portion; a sub-heater that heats the communication portion; and a control unit, the control unit being configured to set the main heater to a temperature higher than a melting point of the target substance before the target substance is melted, to set the sub-heater to a temperature lower than the melting point of the target substance until the target substance in the tank body portion is melted, and to set the sub-heater to a temperature higher than the melting point of the target substance after the target substance in the tank body portion is melted.

公开(公告)号：US20170215266A1

公开(公告)日：2017-07-27

申请号：US15480454

申请日：2017-04-06

Applicant: Gigaphoton Inc.

Inventor： Toshiyuki HIRASHITA ,  Fumio IWAMOTO ,  Tsukasa HORI ,  Masaki NAKANO

IPC: H05G2/00

CPC classification number: H05G2/006 ,  H05G2/008

Abstract: A vibrator unit may be configured to apply vibration to a target material supplied to an inside of a target flow path. The vibrator unit may include a vibration transmission member to be brought into contact with a first member including the target flow path therein, and a piezoelectric member to be brought into contact with the vibration transmission member. The piezoelectric member may be configured to vibrate in response to an electric signal from the outside. The vibration dumping rate of the vibration transmission member may be smaller than the vibration dumping rate of the first member.

公开(公告)号：US20160255709A1

公开(公告)日：2016-09-01

申请号：US15152124

申请日：2016-05-11

Applicant: Gigaphoton Inc.

Inventor： Fumio IWAMOTO ,  Masaki NAKANO ,  Tsukasa HORI

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006

Abstract: An extreme ultraviolet light generation apparatus may include: a chamber in which extreme ultraviolet light is generated when a target is irradiated with a laser beam inside the chamber; a target supply part configured to supply the target into the chamber; and a target collector configured to collect the target which is supplied by the target supply part but is not irradiated with the laser beam in a collection container, by receiving the target on a receiving surface having a contact angle of equal to or smaller than 90 degrees with the target.

Abstract translation: 极紫外光发生装置可以包括：当在室内的激光束照射靶时在其中产生极紫外光的室; 目标供给部构造成将所述目标物供给到所述室内; 以及目标收集器，其被配置为通过在具有等于或小于90度的接触角的接收表面上接收目标而将由目标供给部提供但不被激光束照射的目标收集在收集容器中 与目标。

公开(公告)号：US20160165708A1

公开(公告)日：2016-06-09

申请号：US15019577

申请日：2016-02-09

Applicant: GIGAPHOTON INC.

Inventor： Toshihiro NISHISAKA ,  Yoshiaki KATO ,  Fumio IWAMOTO

IPC: H05G2/00

CPC classification number: H05G2/006 ,  H05G2/005 ,  H05G2/008

Abstract: A target supply device may include: a tank including a cylindrical main body, a first end portion blocking an axial first end of the main body, and a second end portion blocking an axial second end of the main body; a nozzle provided to the first end portion of the tank and configured to output a target material contained inside the tank; and an inert gas supply unit configured to supply inert gas into the tank, in which the inert gas supply unit includes a gas flow path penetrating the second end portion of the tank and configured to guide the inert gas in a direction toward an inner wall of the main body.

Abstract translation: 目标供给装置可以包括：罐，包括圆筒形主体，阻挡主体的轴向第一端的第一端部和阻挡主体的轴向第二端的第二端部; 喷嘴，设置在所述罐的所述第一端部，并且被配置为输出容纳在所述罐内的目标材料; 以及惰性气体供给单元，其构造成向所述罐供给惰性气体，其中所述惰性气体供给单元包括穿过所述罐的所述第二端部的气体流路，并且构造成沿着朝向所述罐的内壁的内壁的方向引导所述惰性气体 主体。