公开(公告)号：EP1478683A4

公开(公告)日：2005-06-15

申请号：EP02773961

申请日：2002-10-31

Applicant: HONEYWELL INT INC

Inventor： BALDWIN TERESA ,  HACKER NIGEL ,  KENNEDY JOSEPH ,  SPEAR RICHARD

IPC: G03F7/075 ,  C03C17/00 ,  C03C17/30 ,  C07F7/18 ,  C08G77/04 ,  C08G77/12 ,  C08K5/00 ,  C08L83/00 ,  C08L101/00 ,  C09D5/00 ,  C09D7/12 ,  C09D183/04 ,  C09D183/06 ,  C09D183/08 ,  G02B1/11 ,  G03F7/09 ,  G03F7/11 ,  H01L21/027 ,  C08G77/18

CPC classification number: G02B5/23 ,  C03C17/008 ,  C03C17/30 ,  C08G77/04 ,  C08G77/12 ,  C08K5/0008 ,  C09D183/04 ,  C09D183/06 ,  C09D183/08 ,  G03F7/091 ,  H01L21/0276 ,  Y10T428/31663 ,  C08L83/04 ,  C08L2666/28

Abstract: Anti-reflective coating materials for ultraviolet photolithography include at least one organic light-absorbing compound incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining at least one organic absorbing compound with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.

公开(公告)号：EP1478682A4

公开(公告)日：2005-06-15

申请号：EP02793921

申请日：2002-11-12

Applicant: HONEYWELL INT INC

Inventor： BALDWIN TERESA ,  KENNEDY JOSEPH ,  IWAMOTO NANCY ,  NAKANO TADASHI ,  BEDWELL WILLIAM ,  STUCK JASON ,  HEBERT MELLO ,  SUEDMEYER ARLENE

IPC: C08G77/04 ,  C09D183/04 ,  G03F7/09 ,  C08G77/08 ,  C08G77/18

CPC classification number: C08G77/04 ,  C09D183/04 ,  G03F7/091

Abstract: Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compound and at least one material modification agent, such as at least one porogen, at least one high-boiling solvent, at least one capping agent, at least one leveling agent, at least one catalyst, at least one replacement solvent, at least one pH tuning agent, and/or a combination thereof that are incorporated into inorganic-based materials or inorganic compositions and/or compounds. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography.

公开(公告)号：AU2003295517A8

公开(公告)日：2004-06-03

申请号：AU2003295517

申请日：2003-11-12

Applicant: HONEYWELL INT INC

Inventor： BALDWIN TERESA ,  STUCK JASON ,  NAKANO TADASHI ,  HEBERT MELLO ,  KENNEDY JOSEPH ,  SUEDEMEYER ARLENE ,  LI BO ,  IWAMOTO NANCY ,  BEDWELL WILLIAM

IPC: C08G20060101 ,  C08G77/02 ,  C08G77/14 ,  C08G77/18 ,  C08G77/22 ,  C08L83/06 ,  C09D183/06 ,  C09D183/08 ,  G03F7/075 ,  G03F7/09

Abstract: Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compound and at least one material modification agent, such as at least one porogen, at least one high-boiling solvent, at least one densifying agent, at least one capping agent, at least one leveling agent, at least one catalyst, at least one replacement solvent, at least one pH tuning agent, and/or a combination thereof that are incorporated into inorganic-based materials or inorganic compositions and/or compounds. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography.

公开(公告)号：AU2002359387A1

公开(公告)日：2003-06-10

申请号：AU2002359387

申请日：2002-11-12

Applicant: HONEYWELL INT INC

Inventor： BALDWIN TERESA ,  KENNEDY JOSEPH ,  IWAMOTO NANCY ,  NAKANO TADASHI ,  BEDWELL WILLIAM ,  STUCK JASON ,  HEBERT MELLO ,  SUEDMEYER ARLENE

IPC: C08G77/04 ,  C09D183/04 ,  G03F7/09 ,  C08G77/08 ,  C08G77/18

Abstract: Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compound and at least one material modification agent, such as at least one porogen, at least one high-boiling solvent, at least one capping agent, at least one leveling agent, at least one catalyst, at least one replacement solvent, at least one pH tuning agent, and/or a combination thereof that are incorporated into inorganic-based materials or inorganic compositions and/or compounds. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography.

公开(公告)号：AU2002336709A1

公开(公告)日：2003-06-10

申请号：AU2002336709

申请日：2002-10-31

Applicant: HONEYWELL INT INC

Inventor： HACKER NIGEL ,  KENNEDY JOSEPH ,  SPEAR RICHARD ,  BALDWIN TERESA

IPC: G03F7/075 ,  C03C17/00 ,  C03C17/30 ,  C07F7/18 ,  C08G77/04 ,  C08G77/12 ,  C08K5/00 ,  C08L83/00 ,  C08L101/00 ,  C09D5/00 ,  C09D7/12 ,  C09D183/04 ,  C09D183/06 ,  C09D183/08 ,  G02B1/11 ,  G03F7/09 ,  G03F7/11 ,  H01L21/027 ,  C08G77/18

Abstract: Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compound and at least one material modification agent, such as at least one porogen, at least one high-boiling solvent, at least one capping agent, at least one leveling agent, at least one catalyst, at least one replacement solvent, at least one pH tuning agent, and/or a combination thereof that are incorporated into inorganic-based materials or inorganic compositions and/or compounds. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography.

公开(公告)号：AU2003286758A8

公开(公告)日：2005-03-07

申请号：AU2003286758

申请日：2003-10-27

Applicant: HONEYWELL INT INC

Inventor： HUANG WEI ,  KATSANES RONALD ,  KENNEDY JOSEPH

IPC: G03C1/00 ,  B05D5/12 ,  B32B27/42 ,  C08J3/00 ,  C08J7/02

Abstract: A planarization composition is disclosed herein that comprises: a) a structural constituent; and b) a solvent system, wherein the solvent system is compatible with the structural constituent and lowers the lowers at least one of the intermolecular forces or surface forces components of the planarization composition. A film that includes this planarization composition is also disclosed. In addition, another planarization composition is disclosed herein that comprises: a) a cresol-based polymer compound; and b) a solvent system comprising at least one alcohol and at least one ether acetate-based solvent. A film that includes this planarization composition is also disclosed. A layered component is also disclosed herein that comprises: a) a substrate having a surface topography; and b) a planarization composition or a film such as those described herein, wherein the composition is coupled to the substrate. Methods of forming a planarization compositions are also disclosed herein that comprise: a) providing a structural constituent; b) providing a solvent system, wherein the solvent system is compatible with the structural constituent and lowers at least one of the intermolecular forces or surface forces components of the planarization composition; and c) blending the structural constituent and the solvent system to form a planarization composition. Methods of forming a film are also disclosed that comprise: a) providing a planarization composition such as those disclosed herein; and b) evaporating at least part of the solvent system to form a film.

公开(公告)号：AU2003295517A1

公开(公告)日：2004-06-03

申请号：AU2003295517

申请日：2003-11-12

Applicant: HONEYWELL INT INC

Inventor： IWAMOTO NANCY ,  NAKANO TADASHI ,  BEDWELL WILLIAM ,  STUCK JASON ,  SUEDEMEYER ARLENE ,  HEBERT MELLO ,  LI BO ,  BALDWIN TERESA ,  KENNEDY JOSEPH

IPC: C08G20060101 ,  C08G77/02 ,  C08G77/14 ,  C08G77/18 ,  C08G77/22 ,  C08L83/06 ,  C09D183/06 ,  C09D183/08 ,  G03F7/075 ,  G03F7/09

公开(公告)号：AU2002227106A1

公开(公告)日：2003-06-10

申请号：AU2002227106

申请日：2001-11-15

Applicant: HONEYWELL INT INC

Inventor： BALDWIN TERESA ,  KENNEDY JOSEPH

IPC: G03F7/11 ,  C08G77/00 ,  C08G77/04 ,  C09D1/00 ,  C09D5/32 ,  C09D7/12 ,  C09D183/04 ,  C09K3/00 ,  G03C1/492 ,  G03F7/09 ,  H01L21/027

Abstract: Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compounds and at least one pH tuning agent that are incorporated into spin-on materials. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. Suitable pH tuning agents not only adjust the pH of the final spin-on composition, but also influence the chemical performance and characteristics, mechanical performance and structural makeup of the final spin-on composition that is part of the layered material, electronic component or semiconductor component, such that the final spin-on composition is more compatible with the resist material that is coupled to it. A method of making absorbing and pH tuned spin-on materials includes combining at least one organic absorbing compound and at least one pH tuning agent with at least one silane reactant during synthesis of the spin-on materials and compositions.

公开(公告)号：SG11201509980QA

公开(公告)日：2016-01-28

申请号：SG11201509980Q

申请日：2014-06-02

Applicant: HONEYWELL INT INC

Inventor： XU HELEN X ,  SPEAR RICHARD A ,  LEUNG ROGER Y ,  METIN LEA M ,  XIE SONGYUAN ,  WU ZEYU BENJAMIN ,  KENNEDY JOSEPH

IPC: C09D1/00 ,  B01J13/00 ,  C01G23/04

Abstract: Liquid titanium oxide compositions, methods for forming such compositions, and methods for etching material layers using such compositions are provided. In accordance with an exemplary embodiment, a liquid titanium oxide composition contains a solvent system, an organotitanate, and a high boiling point solvent having a boiling point in the range of about 140° C. to about 400° C.

公开(公告)号：AU2003286758A1

公开(公告)日：2005-03-07

申请号：AU2003286758

申请日：2003-10-27

Applicant: HONEYWELL INT INC

Inventor： KATSANES RONALD ,  HUANG WEI ,  KENNEDY JOSEPH

IPC: B05D5/12 ,  B32B27/42 ,  C08J3/00 ,  C08J7/02 ,  G03C1/00

Abstract: A planarization composition is disclosed herein that comprises: a) a structural constituent; and b) a solvent system, wherein the solvent system is compatible with the structural constituent and lowers the lowers at least one of the intermolecular forces or surface forces components of the planarization composition. A film that includes this planarization composition is also disclosed. In addition, another planarization composition is disclosed herein that comprises: a) a cresol-based polymer compound; and b) a solvent system comprising at least one alcohol and at least one ether acetate-based solvent. A film that includes this planarization composition is also disclosed. A layered component is also disclosed herein that comprises: a) a substrate having a surface topography; and b) a planarization composition or a film such as those described herein, wherein the composition is coupled to the substrate. Methods of forming a planarization compositions are also disclosed herein that comprise: a) providing a structural constituent; b) providing a solvent system, wherein the solvent system is compatible with the structural constituent and lowers at least one of the intermolecular forces or surface forces components of the planarization composition; and c) blending the structural constituent and the solvent system to form a planarization composition. Methods of forming a film are also disclosed that comprise: a) providing a planarization composition such as those disclosed herein; and b) evaporating at least part of the solvent system to form a film.