ELECTROPLATING CHROMIUM AND ITS ALLOYS

    公开(公告)号:AU3269978A

    公开(公告)日:1979-08-02

    申请号:AU3269978

    申请日:1978-01-24

    Applicant: IBM

    Abstract: A plating solution and method of forming such a solution for plating chromium and its alloys from Cr(III) is disclosed. The solution is an aqueous solution of a chromium(III) thiocyanate complex having at least a ligand other than water or thiocyanate in the inner coordination sphere.

    15.
    发明专利
    未知

    公开(公告)号:DE2756763A1

    公开(公告)日:1978-06-29

    申请号:DE2756763

    申请日:1977-12-20

    Applicant: IBM

    Abstract: According to the disclosure, electrochromic display apparatus is provided, comprising, an electrolyte containing an electrochromic material, a plurality of display electrodes in the electrolyte, the display electrodes being connected in at least one group to enable selection of display electrodes, means for selecting at least some display electrodes, means to effect deposition of a visible coating of colored species derived from the electrochromic material onto the selected display electrodes, and means to effect deposition of an invisible coating of the colored species onto all unselected display electrodes, whereby the potentials of selected and unselected display electrodes are equalized.

    18.
    发明专利
    未知

    公开(公告)号:MX153195A

    公开(公告)日:1986-08-21

    申请号:MX17997779

    申请日:1979-11-09

    Applicant: IBM

    Abstract: A very low concentration (below 0.03 M) trivalent chromium plating bath in which the source of chromium is an equilibrated aqueous solution of a chromium (III) - thiocyanate complex gives a deposit of unexpectedly light color. Such a bath is employed to produce thin overcoatings of light colored chromium for decorative applications. The bath and process is also used to plate the initial layer of a thick (greater than 5 micron) deposit for engineering applications, the major part of which is plated from a higher chromium concentration bath. Such thick deposits from a higher concentration bath are more cohesive and smoother when plated over an initial layer from the low concentration bath.

    ELECTRODEPOSITION OF CHROMIUM
    19.
    发明专利

    公开(公告)号:AU550891B2

    公开(公告)日:1986-04-10

    申请号:AU9068182

    申请日:1982-11-17

    Applicant: IBM

    Abstract: A chromium electroplating electrolyte containing trivalent chromium ions, a complexant, a buffer agent and thiocyanate ions for promoting chromium deposition, the thiocyanate having a molar concentration lower than that of the chromium ions. The chromium preferably has a concentration lower than 0.01M. Preferably the complexant is selected so that the stability constant K1 of chromium complex is in the range 10 M . Complexants in this range include aspartic acid, iminodiacetic acid, nitrilotriacetic acid and 5-sulphosalicylic acid.

    20.
    发明专利
    未知

    公开(公告)号:AT18075T

    公开(公告)日:1986-03-15

    申请号:AT82306021

    申请日:1982-11-11

    Applicant: IBM

    Abstract: A chromium electroplating electrolyte comprising a source of trivalent chromium ions, a complexant, a buffer agent and a sulphur species selected from sulphites and dithionites, the complexant being selected so that the stability constant K1 of the chromium complex as defined herein is in the range 10 M preferably the chromium ions have a molar concentration lower than 0.01M. Complexants within this range include aspartic acid, iminodiacetic acid, nitrilotriacetic acid, 5-sulphosalicylic acid and citric acid.

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