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公开(公告)号：NO782046A
公开(公告)日：1978-12-15
申请号：NO782046
申请日：1978-06-12
Applicant: IBM
Inventor： BARCLAY DONALD JOHN , MORGAN WILLIAM MORRIS
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公开(公告)号：DE2723943A1
公开(公告)日：1978-07-27
申请号：DE2723943
申请日：1977-05-27
Applicant: IBM
Inventor： BARCLAY DONALD JOHN , MORGAN WILLIAM MORRIS
Abstract: A plating solution and method of forming such a solution for plating chromium and its alloys from Cr(III) is disclosed. The solution is an aqueous solution of a chromium(III) thiocyanate complex having at least a ligand other than water or thiocyanate in the inner coordination sphere.
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Patent Agency Ranking
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公开(公告)号：ZA828366B
公开(公告)日：1983-09-28
申请号：ZA828366
申请日：1982-11-15
Applicant: IBM
Abstract: A chromium electroplating electrolyte comprising a source of trivalent chromium ions, a complexant, a buffer agent and a sulphur species selected from sulphites and dithionites, the complexant being selected so that the stability constant K1 of the chromium complex as defined herein is in the range 10 M preferably the chromium ions have a molar concentration lower than 0.01M. Complexants within this range include aspartic acid, iminodiacetic acid, nitrilotriacetic acid, 5-sulphosalicylic acid and citric acid.
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公开(公告)号：AU9068282A
公开(公告)日：1983-05-26
申请号：AU9068282
申请日：1982-11-18
Applicant: IBM
Inventor： BARCLAY DONALD JOHN , VIGAR JAMES MICHAEL , MORGAN WILLIAM MORRIS
Abstract: A chromium electroplating electrolyte comprising a source of trivalent chromium ions, a complexant, a buffer agent and a sulphur species selected from sulphites and dithionites, the complexant being selected so that the stability constant K1 of the chromium complex as defined herein is in the range 10 M preferably the chromium ions have a molar concentration lower than 0.01M. Complexants within this range include aspartic acid, iminodiacetic acid, nitrilotriacetic acid, 5-sulphosalicylic acid and citric acid.
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