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公开(公告)号:CA1251519A
公开(公告)日:1989-03-21
申请号:CA503288
申请日:1986-03-04
Applicant: IBM
Inventor: RUH WOLF-DIETER , SCHAFER ROLF
Abstract: METHOD OF DESMEARING HOLES The invention relates to a process of desmearing drilled holes in PCBs with a high aspect ratio through plasma cleaning. The plasma processing is carried out with a CF4/O2 gas mixture. By a respective selection of the CF4 contents, the method can be optimized with respect to the etching speed and uniformity through the individual drilled hole, across each individual panel and with respect to the entire panel set of the plasma reactor. It was found that an optimum is reached for these parameters with a CF4 contents of 60 Vol.% and the remainder oxygen.
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13.
公开(公告)号:DE2961717D1
公开(公告)日:1982-02-18
申请号:DE2961717
申请日:1979-10-31
Applicant: IBM
Inventor: TRIPPEL GERHARD DR , BRUNSCH ARWED DR , RUH WOLF-DIETER , SCHNEIDER JOCHEN
IPC: G01R33/18
Abstract: Direct method for measuring the magnetostriction constant lambda s of soft magnetic and isotropic magnetic materials. A thin film sample is cantilevered and clamped at one edge. Under the influence of a magnetic AC field and the magnetostriction effect of the sample material, the free end of the cantilevered sample is deflected and oscillates with twice the frequency of the AC field. The resonance amplitude ares is measured by using a laser beam impinging upon the oscillating sample and measuring the reflected beam amplitude by means of a position-sensitive photodiode. The AC output signal of the photodiode is proportional to the sample amplitude. The magnetostriction constant lambda s is directly proportional to the resonance amplitude ares multiplied by a constant factor which depends on known geometry and properties of the sample material.
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公开(公告)号:DE2638826A1
公开(公告)日:1978-03-09
申请号:DE2638826
申请日:1976-08-28
Applicant: IBM DEUTSCHLAND
Inventor: BRUNSCH ARNOLD DIPL PHYS DR , SCHNEIDER JOCHEN DIPL PHYS , TRIPPEL GERHARD DIPL PHYS DR , RUH WOLF-DIETER
Abstract: In the prodn. of amorphous films contg. at least Gd and Co by vapour deposition, a high vacuum is produced in the equipment and then a definite partial pressure of a reactive gas (mixt.) is built up and maintained during deposition at a definite rate, until the required film thickness is attained. These films are used as storage media for magnetic bubble memories. They have perpendicular anisotropy, besides the other magnetic properties for bubble memory applications.
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