Abstract:
A film bulk acoustic resonator formed on a substrate includes a layer of piezoelectric material having a first major surface, and a second major surface sandwiched between a first conductive and a second conductive layer. The substrate on which the film bulk acoustic resonator is formed has an opening therein which exposes the first conductive layer of the film bulk acoustic resonator. The opening is substantially in the shape of a parallelogram having a first pair of parallel sides and a second pair of parallel sides. One of the first pair of parallel sides makes an angle at other than 90 degrees with one of the second pair of parallel sides.
Abstract:
A microelectromechanical system (MEMS) that includes a first electro-thermal actuator, a second electro-thermal actuator and a beam having a first side and a second side. The first electro-thermal actuator applies a force to the first side of the beam as current passes through the first electro-thermal actuator and the second electro-thermal actuator applies a force to the second side of the beam as current passes through the second electro-thermal actuator.
Abstract:
A microelectromechanical system (32) may be enclosed in a hermetic cavity (44) defined by joined, first and second semiconductor structures (14, 12). The joined structures (14, 12) may be sealed by a soldier sealing ring (18), which extends completely around the cavity (44). One of the semiconductor structures (14, 12) may have the system (32) formed thereon and an open area (38) may be formed from the underside of the structure (14, 12) and may be closed by covering with a suitable film (20) in one embodiment.
Abstract:
A MEMS device (14) may be formed in a hermetic cavity (42) by sealing a pair of semiconductor structures (22, 32) to one another, enclosing the MEMS device (12). The two structures (22, 32) may be coupled using surface mount techniques as one example, so that the temperatures utilized may be compatible with many MEMS applications. Electrical interconnection layers (40) in one or the other of these structures may be utilized to allow electrical interconnections from the exterior world to the MEMS components (14) within the cavity (42).
Abstract:
A film bulk acoustic resonator is formed on a substrate having a major surface. The film bulk acoustic resonator includes an elongated stack. The elongated stack includes a layer of piezoelectric material positioned between a first conductive layer deposited on a first surface of the layer of piezoelectric material, and a second conductive layer deposited on a second surface of the layer of piezoelectric material. The elongated stack is positioned substantially perpendicular with respect to the major surface of the substrate. The first and second conductive layers are placed on the layer of piezoelectric material substantially simultaneously and in one processing step. The major surface of the substrate is in a horizontal plane and the stack of the film bulk acoustic resonator is in a substantially vertical plane. The resonator structure formed may be used either as a resonator or a filter.
Abstract:
A method for varying the resonance frequency of a resonator beam is disclosed. The method comprises first manufacturing a resonator beam having a first end and a second end. The resonator beam is suspended above a substrate by the first end and the second end. At least one end of the resonator beam is connected to an actuator that applies an actuation force to the resonator beam to apply tensile strain or compressive strain onto said resonator beam. By varying the amount of actuation force, the resonance frequency of the resonator beam may be tuned. Additionally, by varying the magnitude and direction of the actuation force, the resonator beam may be used as a temperature sensor or a temperature compensated resonator.
Abstract:
An electromechanical switch (l00) includes an actuation electrode (110), an anchor (115), a cantilever electrode (105), a contact (120), and signal lines. The actuation electrode (110) and anchor (115) are mounted to a substrate (130). The cantilever electrode (105) is supported by the anchor (115) above the actuation electrode (110). The contact (120) is mounted to the cantilever electrode (105). The signal lines are positioned to form a closed circuit with the contact (120) when an actuation voltage is applied between the actuation electrode (110) and the cantilever electrode (105) causing the cantilever electrode (105) to bend towards the actuation electrode (110) in a zipper like movement starting from a distal end of the cantilever electrode (105).
Abstract:
Briefly, in accordance with one embodiment of the invention, a slot antenna may include a primary slot (210) and one or more secondary slots (212). The size of the antenna may be reduced by adding one or more of the secondary slots which may add additional inductance to the antenna. Furthermore, the size of the antenna may be reduced by increasing the inductance of the secondary slots via increasing the length of the slots or by changing the shape of the slots. The antenna may include one or more MEMS varactors (216) coupled to one or more of the secondary slots. The resonant frequency of the slot antenna may be tuned to a desired frequency by changing the capacitance value of one or more of the MEMS varactors to a desired capacitance value.
Abstract:
Plural band film bulk acoustic resonators may be formed on the same integrated circuit using lithographic techniques. As a result, high volume production of reproducible components can be achieved, wherein the resonators, as manufactured, are designed to have different frequencies.