公开(公告)号：EP1398339A4

公开(公告)日：2006-11-29

申请号：EP02722907

申请日：2002-04-30

Applicant: JSR CORP

Inventor： IWASAWA HARUO ,  HAYASHI AKIHIRO ,  SHIMOKAWA TSUTOMU ,  YAMAMOTO MASAFUMI

IPC: C08G77/08 ,  C08G77/22 ,  C08G77/24 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  H01L21/027 ,  C08L83/08

CPC classification number: G03F7/0397 ,  C08G77/08 ,  C08G77/24 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0757

Abstract: A polysiloxane resin exhibiting high transparency even at a wavelength of 193nm (particularly 157nm) or below and excellent dry etching resistance, which comprises units represented by the general formula (I) and/or the general formula (II) and has acid−dissociable groups: (I) (II) (wherein R 1 is a fluorinated or fluoroalkylated monovalent aromatic group or a fluorinated or fluoroalkylated monovalent alicyclic group; and R 2 is a monovalent aromatic group described above, a monovalent alicyclic group described above, hydrogen, halogeno, a monovalent hydrocarbon group, haloalkyl, or amino). A radiation−sensitive resin composition excellent in sensitivity and resolution, which comprises (A) the above resin and (B) a radiation−sensitive acid generator.

公开(公告)号：EP1551057A4

公开(公告)日：2006-03-22

申请号：EP03792692

申请日：2003-08-15

Applicant: JSR CORP

Inventor： MATSUKI YASUO ,  IWASAWA HARUO ,  KATO HITOSHI

IPC: H01L21/208 ,  C23C24/10 ,  C23C26/02 ,  H01L31/18

CPC classification number: C23C24/10 ,  C23C26/02 ,  C30B7/005 ,  H01L21/02422 ,  H01L21/02532 ,  H01L21/02601 ,  H01L21/02628 ,  H01L21/02667 ,  H01L21/02686

Abstract: A composition for forming a silicon film containing silicon particles and a dispersing medium, and a method for forming a silicon film wherein a coating film of the above composition is formed on a substrate and then, an instantaneous fusion, a heat treatment or an optical treatment is conducted. Using the composition and method, a poly-crystal silicon film having a desired thickness that may be used as a silicon film for a solar battery can be efficiently produced in a simple and easy way.