公开(公告)号：JP2010237466A

公开(公告)日：2010-10-21

申请号：JP2009085731

申请日：2009-03-31

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SHIMIZU TATSUYA ,  ISHIKAWA OSAMU ,  OMAGARI MASAYOSHI ,  TSUKIMAWASHI KEISUKE ,  NUMATA ATSUSHI

IPC: G03F7/004 ,  G02B5/20 ,  G02F1/1335 ,  G03F7/032

Abstract: PROBLEM TO BE SOLVED: To provide a color composition which is suitable for a reflective color liquid crystal display element and is capable of forming a pixel having a high color purity. SOLUTION: The color composition contains color particles (A), a binder polymer (B), and a multi-functional monomer (C). The color particles (A) includes polymer particles which have a polymer phase containing a polymer and a pigment, and in the polymer phase of which the pigment is dispersed, and in which at least one void is present in each of the polymer particles. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供适用于反射型彩色液晶显示元件的能够形成色纯度高的像素的颜色组合物。 颜料组合物含有着色颗粒（A），粘合剂聚合物（B）和多官能单体（C）。 着色颗粒（A）包括具有聚合物相的聚合物颗粒，聚合物相含有聚合物和颜料，并且在其聚合物相中分散有颜料，并且其中每个聚合物颗粒中存在至少一个空隙。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2003015302A

公开(公告)日：2003-01-17

申请号：JP2002120079

申请日：2002-04-23

Applicant: Jsr Corp ,  ジェイエスアール株式会社

Inventor： NAGAI TOMOKI ,  NUMATA ATSUSHI ,  KOBAYASHI HIDEKAZU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08F12/24 ,  G03F7/004 ,  H01L21/027

CPC classification number: G03F7/0392 ,  G03F7/0045 ,  Y10S430/121

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having high sensitivity, high resolution and a high radiation transmittance, excellent in smoothness of a pattern surface in micropattern and capable of preventing partial insolubilization in overexposure without impairing basic solid state properties as a resist such as pattern shape, dry etching resistance and heat resistance. SOLUTION: The radiation sensitive resin composition contains (A) a compound having an alkaloid backbone such as t-butyl cholic acid or t- butoxycarbonylmethyl lithocholic acid, (B) an alkali-insoluble or slightly alkali- soluble resin having hydroxystyrene-base repeating units and acid dissociable group-containing repeating units and (C) a radiation sensitive acid generator.

Abstract translation: 要解决的问题：提供具有高灵敏度，高分辨率和高透射率的辐射敏感性树脂组合物，微图案中的图案表面的平滑度优异，并且能够在不损害作为抗蚀剂的基本固态特性的情况下防止过度曝光中的部分不溶解 例如图案形状，耐干蚀刻性和耐热性。 解决方案：辐射敏感性树脂组合物含有（A）具有生物碱骨架的化合物，例如叔丁基胆酸或叔丁氧基羰基甲基石胆酸，（B）具有羟基苯乙烯基重复单元的碱不溶性或微碱溶性树脂 和酸解离基团的重复单元和（C）辐射敏感性酸发生剂。

公开(公告)号：JP2002265446A

公开(公告)日：2002-09-18

申请号：JP2001061922

申请日：2001-03-06

Applicant: JSR CORP

Inventor： NAGAI TOMOKI ,  NUMATA ATSUSHI ,  KUSUMOTO SHIRO ,  KOBAYASHI HIDEKAZU

IPC: C07D209/86 ,  C08F8/30 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a new carbazole derivative extremely useful as a sensitizing component for a chemically amplified resist and provide a radiation-sensitive resin composition containing the carbazole derivative and having especially high sensitivity without deteriorating the principal performance of a resist such as resolution, pattern form and PED stability. SOLUTION: The carbazole derivative is expressed by general formula (1) (R and R are each H or a univalent organic group or R and R together form a bivalent organic group having a 3-8 membered carbocyclic structure or a 3-8 membered heterocyclic structure; and R is H or a univalent organic group). The chemically amplified radiation-sensitive resin composition contains the carbazole derivative.

公开(公告)号：JP2001109155A

公开(公告)日：2001-04-20

申请号：JP28972899

申请日：1999-10-12

Applicant: JSR CORP

Inventor： NUMATA ATSUSHI ,  KUSUMOTO SHIRO ,  KOBAYASHI HIDEKAZU

IPC: C08K5/42 ,  C08L25/18 ,  G03F7/004 ,  G03F7/029 ,  G03F7/039

Abstract: PROBLEM TO BE SOLVED: To obtain a radiation sensitive resin composition effectively sensitive to various radiations, having high sensitivity, also having satisfactory resolution and focus latitude in various patterns including dense lines, isolated lines and contact holes, particularly in a line pattern and capable of forming a minute pattern with low surface roughness. SOLUTION: The radiation sensitive resin composition contains (A) an onium salt compound of an aromatic sulfonic acid consisting of a 2,4- difluorobenzenesulfonic acid anion, a 4-trifluoromethylbenzenesulfonic acid anion or a 2-trifluoromethylbenzenesulfonic acid anion and an onium cation of sulfur or iodine and (B) a copolymer typified by a 4-hydroxystyrene/4-t-butoxystyrene copolymer or a 4-hydroxystyrene/4-(1'-ethoxyethoxy)styrene copolymer.

公开(公告)号：JP2011022542A

公开(公告)日：2011-02-03

申请号：JP2009170004

申请日：2009-07-21

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： RYU KYOICHIRO ,  NUMATA ATSUSHI

IPC: G03F7/004 ,  C09B57/10 ,  C09B67/20 ,  C09B67/46 ,  G02B5/20 ,  G02B5/22 ,  G02F1/1335

Abstract: PROBLEM TO BE SOLVED: To provide a colored composition which enables to form a pixel having higher luminance and contrast ratio, as compared with those that use C.I. Pigment Yellow 150, and which has proper stability without using a dye derivative.
SOLUTION: The colored composition contains (A) a colorant, (B) a dispersant, (C) a binder resin and (D) a polyfunctional monomer, wherein the colorant (A) comprises an azobarbituric acid nickel complex pigment composed of an azobarbituric acid nickel complex, melamine, and the like, and wherein the dispersant (B) comprises a block copolymer having an A block, having a quaternary ammonium salt group and an amino group in a side chain, and a B block not having a quaternary ammonium salt group or an amino group in a side chain.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：与使用C.I.的相比，提供能够形成具有更高亮度和对比度的像素的着色组合物。 颜料黄150，并且在不使用染料衍生物的情况下具有适当的稳定性。 着色组合物包含（A）着色剂，（B）分散剂，（C）粘合剂树脂和（D）多官能单体，其中着色剂（A）包含偶氮巴比妥酸镍络合物颜料，其由 偶氮巴比妥酸镍络合物，三聚氰胺等，并且其中分散剂（B）包含具有侧嵌段的季铵盐基团和氨基的嵌段共聚物和不具有 季铵盐基或侧链中的氨基。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2005316388A

公开(公告)日：2005-11-10

申请号：JP2005016799

申请日：2005-01-25

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NUMATA ATSUSHI ,  KOBAYASHI KAZUHIRO ,  MORISHITA SATOSHI

IPC: G03F7/004 ,  G02B5/20 ,  G02F1/1335 ,  G03F7/033

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive composition for a color filter having adhesion to a substrate and satisfactory developability even under low exposure energy and excellent in surface smoothness of a pattern, storage stability, etc. SOLUTION: The radiation sensitive composition for a color filter comprises (A) a pigment, (B) a dispersant, (C) an alkali-soluble resin comprising a copolymer of (c1) a carboxylic unsaturated monomer including (meth)acrylic acid, (c2) N-substituted maleimide and (c3) at least one selected from the group consisting of styrene, styrenic materials such as α-methylstyrene, acrylate materials such as methyl (meth)acrylate, a polystyrene macromonomer and a polymethyl methacrylate macromonomer, (D) a polyfunctional monomer, (E) a photopolymerization initiator and (F) a solvent, wherein the dispersant (B) comprises an acrylic copolymer obtained through living anionic polymerization and having an amine value (unit; mgKOH/g) and an acid value (unit; mgKOH/g) each greater than 0. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种具有对基片的粘附性的滤色片的辐射敏感组合物，即使在低曝光能量下也具有令人满意的显影性，并且具有优异的图案的表面光滑度，储存稳定性等。解决方案： 用于滤色器的辐射敏感组合物包括（A）颜料，（B）分散剂，（C）包含（c1）包含（甲基）丙烯酸的羧酸不饱和单体的共聚物的碱溶性树脂，（c2） N-取代马来酰亚胺和（c3）选自苯乙烯，苯乙烯类材料如α-甲基苯乙烯，丙烯酸酯材料如（甲基）丙烯酸甲酯，聚苯乙烯大分子单体和聚甲基丙烯酸甲酯大分子单体的至少一种，（D） 多官能单体，（E）光聚合引发剂和（F）溶剂，其中分散剂（B）包含通过活性阴离子聚合得到的具有胺值（单位：mgKOH / g）和酸va ; mgKOH / g）各自大于0.版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005283950A

公开(公告)日：2005-10-13

申请号：JP2004097425

申请日：2004-03-30

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NUMATA ATSUSHI ,  KOBAYASHI KAZUHIRO ,  MAKIHIRA ISAMU ,  ITOU YUKIKO

IPC: G03F7/004 ,  G02B5/20 ,  G02B5/23 ,  G02F1/1335

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition for a color filter having high contrast and excellent developing property, storage stability or the like. SOLUTION: The radiation-sensitive composition for a color filter contains (A) a pigment, (B) a dispersant, (C) an alkali-soluble resin, (D) a polyfunctional monomer, (E) a photopolymerization initiator and (F) solvent. The dispersant (B) essentially comprises an acrylic copolymer obtained by living anion polymerization and having >0 amine value (mgKOH/g) and 0 acid value (mgKOH/g). The use amount (in terms of solid content) of the acrylic copolymer is 3 to 35 parts by weight with respect to 100 parts by weight of the pigment (A). COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 解决的问题：提供具有高对比度和优异显影性，保存稳定性等的用于滤色器的辐射敏感组合物。 ＆lt; P＆gt;解决方案：用于滤色器的辐射敏感组合物包含（A）颜料，（B）分散剂，（C）碱溶性树脂，（D）多官能单体，（E）光聚合引发剂和 （F）溶剂。 分散剂（B）主要包含通过活性阴离子聚合获得的具有> 0胺值（mgKOH / g）和0酸值（mgKOH / g）的丙烯酸共聚物。 相对于100重量份的颜料（A），丙烯酸系共聚物的使用量（以固体成分计）为3〜35重量份。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2003302515A

公开(公告)日：2003-10-24

申请号：JP2002106220

申请日：2002-04-09

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NUMATA ATSUSHI ,  ABE SHIGERU ,  SHINYAMA YASUMASA

IPC: G03F7/004 ,  C08F2/44 ,  C08F257/02 ,  G02B5/00 ,  G02B5/20 ,  G02F1/1335 ,  G03F7/033

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive composition which does not cause chips or peeling in a pattern or prevents production of residue or contamination of the base on an substrate and on a light shielding layer of an unexposed part even under low light exposure and raised injection pressure of a developer liquid, to provide a color filter and a black matrix formed from the composition, and to provide a liquid crystal display element having the color filter or the black matrix. SOLUTION: The composition comprises (A) a colorant, (B) an alkali-soluble resin comprising a copolymer of a specified monomer and another copolymerizable monomer, (C) a polyfunctional monomer and (D) a photopolymerization initiator. The color filter and the black matrix are formed from the above composition, and the liquid crystal display device is equipped with the above color filter or the black matrix. COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：提供一种辐射敏感性组合物，其不会在图案上引起碎片或剥离，或者即使在低的温度下也可以防止基底上的基底和未曝光部分的遮光层的残留物或污染 曝光和提高显影剂液体的注入压力，以提供由该组合物形成的滤色器和黑色矩阵，并提供具有滤色器或黑色矩阵的液晶显示元件。 组合物包含（A）着色剂，（B）包含特定单体与另一种可共聚单体的共聚物的碱溶性树脂，（C）多官能单体和（D）光聚合引发剂。 由上述组成形成滤色器和黑色矩阵，并且液晶显示装置配备有上述滤色器或黑色矩阵。 版权所有（C）2004，JPO