公开(公告)号：JP2003055341A

公开(公告)日：2003-02-26

申请号：JP2001248430

申请日：2001-08-17

Applicant: Jsr Corp ,  ジェイエスアール株式会社

Inventor： SHIRAKI SHINJI ,  YOKOYAMA KENICHI ,  EHATA SATOSHI ,  O ISAMU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/004 ,  C07C381/00 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a compound having a sulfonyl structure, giving excellent resist pattern and useful as an acid generating agent sensitive to active radiation such as far ultraviolet radiation, a radiation-sensitive acid generating agent produced by using the compound and a positive-type or negative-type chemical- amplification radiation-sensitive resin composition. SOLUTION: The compound having a sulfonyl structure is expressed by general formula I [R to R are each H, a 1-20C substituted/unsubstituted alkyl or alkenyl or a substituted/unsubstituted aryl or heteroaryl; and Y is O, S, =N-R , =N-OR , =N-N-R or the like (R and R are each same as R to R )]. Concrete example of the compound of general formula I is 2- methoxyimino-2-indanonoxime-1-propanesulfonate.

Abstract translation: 要解决的问题：为了提供具有磺酰结构的化合物，提供优异的抗蚀剂图案并且可用作对诸如远紫外线辐射的活性辐射敏感的酸产生剂，使用该化合物和阳性产生的辐射敏感性酸产生剂 型或负型化学放大辐射敏感树脂组合物。 解决方案：具有磺酰结构的化合物由通式I表示[R 1至R 3各自为H，1-20C取代/未取代的烷基或烯基或取代/未取代的芳基或杂芳基; 并且Y是O，S，= NR 4，= N-OR 4，= NNR 5等（R 4和R 5各自与R 1至R' 3>）]。 通式I的化合物的具体实例是2-甲氧基亚氨基-2-茚满酮肟-1-丙磺酸盐。

公开(公告)号：JP2003043678A

公开(公告)日：2003-02-13

申请号：JP2001234457

申请日：2001-08-02

Applicant: Jsr Corp ,  ジェイエスアール株式会社

Inventor： NAGAI TOMOKI ,  KOBAYASHI HIDEKAZU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive composition excellent in storage stability as well as in resolution and environmental resistance as a chemical amplification type resist sensitive to active radiation, e.g. UV rays such as g- or i-line, KrF, ArF or F
2 excimer laser light, far UV typified by EUV (extreme-ultraviolet radiation) or an electron beam.
SOLUTION: The radiation sensitive resin composition contains a nitrogen- containing compound having a specified structure.
COPYRIGHT: (C)2003,JPO

Abstract translation: 要解决的问题：提供具有优异的储存稳定性以及分辨率和耐环境性的辐射敏感性组合物，作为对活性辐射敏感的化学放大型抗蚀剂，例如， 诸如g-或i-线，KrF，ArF或F2准分子激光的紫外线，由EUV（极紫外辐射）代表的远紫外线或电子束。 解决方案：辐射敏感性树脂组合物含有具有特定结构的含氮化合物。

公开(公告)号：JP2003043677A

公开(公告)日：2003-02-13

申请号：JP2001234136

申请日：2001-08-01

Applicant: Jsr Corp ,  ジェイエスアール株式会社

Inventor： NAGAI TOMOKI ,  KOBAYASHI HIDEKAZU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive composition excellent in storage stability as well as in resolution and environmental resistance as a chemical amplification type resist sensitive to active radiations, e.g. UV rays such as g- or i-line, KrF, ArF or F2 excimer laser light, far UV typified by EUV (extreme-ultraviolet radiation) or an electron beam. SOLUTION: The radiation sensitive resin composition contains a nitrogen- containing compound having a specified structure.

Abstract translation: 要解决的问题：提供具有优异的储存稳定性以及分辨率和耐环境性的辐射敏感性组合物，作为对活性辐射敏感的化学放大型抗蚀剂，例如， 诸如g-或i-线，KrF，ArF或F2准分子激光的紫外线，由EUV（极紫外辐射）代表的远紫外线或电子束。 解决方案：辐射敏感性树脂组合物含有具有特定结构的含氮化合物。

公开(公告)号：JP2003020335A

公开(公告)日：2003-01-24

申请号：JP2002048643

申请日：2002-02-25

Applicant: Jsr Corp ,  ジェイエスアール株式会社

Inventor： IWAZAWA HARUO ,  HAYASHI AKIHIRO ,  SHIMOKAWA TSUTOMU ,  YAMAMOTO MASASHI

IPC: C08G77/08 ,  C08G77/22 ,  C08G77/24 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  H01L21/027

CPC classification number: G03F7/0397 ,  C08G77/08 ,  C08G77/24 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0757

Abstract: PROBLEM TO BE SOLVED: To provide a novel polysiloxane which exhibits a high transparency at a wavelength of 193 nm or lower, even at a wavelength of 157 nm or lower, and even at a wavelength of 147 nm, 134 nm, etc., and is excellent in resistance to dry etching; and a radiation-sensitive resin composition containing the polysiloxane. SOLUTION: This polysiloxane has structural units (I) and/or structural units (II) represented by formula (1) (wherein R is a fluorinated or fluoroalkylated monovalent aromatic or alicyclic group; and R is the above monovalent aromatic or alicyclic group, H, a halogen, a monovalent hydrocarbon group, a haloalkyl group or an amino group) and has acid-associable groups. The radiation-sensitive resin composition contains the polysiloxane and a radiation-sensitive acid generator.

Abstract translation: 要解决的问题：即使在157nm或更低的波长，甚至在147nm，134nm等的波长下，也提供了在193nm以下的波长下显示高透明度的新型聚硅氧烷，以及 耐干蚀刻性优异; 和含有聚硅氧烷的辐射敏感性树脂组合物。 解决方案：该聚硅氧烷具有由式（1）表示的结构单元（I）和/或结构单元（II）（其中R 1是氟化或氟代烷基化的单价芳族或脂环族基团; R 2是上述一价 芳族或脂环族基团，H，卤素，一价烃基，卤代烷基或氨基），并且具有酸相关基团。 辐射敏感性树脂组合物含有聚硅氧烷和辐射敏感性酸发生剂。

公开(公告)号：JP2003015302A

公开(公告)日：2003-01-17

申请号：JP2002120079

申请日：2002-04-23

Applicant: Jsr Corp ,  ジェイエスアール株式会社

Inventor： NAGAI TOMOKI ,  NUMATA ATSUSHI ,  KOBAYASHI HIDEKAZU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08F12/24 ,  G03F7/004 ,  H01L21/027

CPC classification number: G03F7/0392 ,  G03F7/0045 ,  Y10S430/121

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having high sensitivity, high resolution and a high radiation transmittance, excellent in smoothness of a pattern surface in micropattern and capable of preventing partial insolubilization in overexposure without impairing basic solid state properties as a resist such as pattern shape, dry etching resistance and heat resistance. SOLUTION: The radiation sensitive resin composition contains (A) a compound having an alkaloid backbone such as t-butyl cholic acid or t- butoxycarbonylmethyl lithocholic acid, (B) an alkali-insoluble or slightly alkali- soluble resin having hydroxystyrene-base repeating units and acid dissociable group-containing repeating units and (C) a radiation sensitive acid generator.

Abstract translation: 要解决的问题：提供具有高灵敏度，高分辨率和高透射率的辐射敏感性树脂组合物，微图案中的图案表面的平滑度优异，并且能够在不损害作为抗蚀剂的基本固态特性的情况下防止过度曝光中的部分不溶解 例如图案形状，耐干蚀刻性和耐热性。 解决方案：辐射敏感性树脂组合物含有（A）具有生物碱骨架的化合物，例如叔丁基胆酸或叔丁氧基羰基甲基石胆酸，（B）具有羟基苯乙烯基重复单元的碱不溶性或微碱溶性树脂 和酸解离基团的重复单元和（C）辐射敏感性酸发生剂。

公开(公告)号：DE60018350D1

公开(公告)日：2005-04-07

申请号：DE60018350

申请日：2000-11-08

Applicant: JSR CORP

Inventor： WANG YONG ,  KOBAYASHI EIICHI ,  MIYAJI MASAAKI ,  NUMATA JUN ,  SHIMOKAWA TSUTOMU

IPC: G03F7/028 ,  C07D207/46 ,  C07D209/76 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C07D209/48

Abstract: An N-sulfonyloxyimide compound having the formula (1): wherein X represents a single bond or a double bond, Y and Z represent a hydrogen atom or others and may combine to form a cyclic structure; and R is a group having the formula (2): wherein X represents an organic group having an ester linkage, R represents an alkyl group or an alkoxyl group; and m is an integer of 1 to 11 and n is an integer of 0 to 10, satisfying m + n ≤ 11; and chemically amplified positive and negative radiation-sensitive resin compositions using the compound are provided. The N-sulfonyloxyimide compound is a good radiation-sensitive acid-generating agent, has no problem of volatilization or side reaction, can keep dark reaction from taking place during the storage. The compound is useful as a component of radiation-sensitive chemically amplified resists.

公开(公告)号：AU8015701A

公开(公告)日：2002-03-13

申请号：AU8015701

申请日：2001-08-24

Applicant: JSR CORP

Inventor： NISHIMURA ISAO ,  BESSHO NOBUO ,  KUMANO ATSUSHI ,  SHIMOKAWA TSUTOMU ,  YAMADA KENJI

IPC: C08L67/00 ,  C08L69/00 ,  C08L83/14 ,  G02B1/04 ,  G02B5/18 ,  G02B6/124 ,  G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  G03F7/36 ,  C08L101/00 ,  G02B3/00 ,  G02B6/12 ,  G03H1/02

Abstract: A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a lower refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) a stabilizer. By exposing the composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion are decomposed and a refractive index difference is made between the exposed portion and unexposed portion, thereby forming a pattern having different refractive indices.

公开(公告)号：DE60018350T2

公开(公告)日：2006-07-06

申请号：DE60018350

申请日：2000-11-08

Applicant: JSR CORP

Inventor： WANG YONG ,  KOBAYASHI EIICHI ,  MIYAJI MASAAKI ,  NUMATA JUN ,  SHIMOKAWA TSUTOMU

IPC: C07D209/48 ,  G03F7/028 ,  C07D207/46 ,  C07D209/76 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039

Abstract: An N-sulfonyloxyimide compound having the formula (1): wherein X represents a single bond or a double bond, Y and Z represent a hydrogen atom or others and may combine to form a cyclic structure; and R is a group having the formula (2): wherein X represents an organic group having an ester linkage, R represents an alkyl group or an alkoxyl group; and m is an integer of 1 to 11 and n is an integer of 0 to 10, satisfying m + n ≤ 11; and chemically amplified positive and negative radiation-sensitive resin compositions using the compound are provided. The N-sulfonyloxyimide compound is a good radiation-sensitive acid-generating agent, has no problem of volatilization or side reaction, can keep dark reaction from taking place during the storage. The compound is useful as a component of radiation-sensitive chemically amplified resists.

公开(公告)号：DE60105523D1

公开(公告)日：2004-10-21

申请号：DE60105523

申请日：2001-11-13

Applicant: JSR CORP

Inventor： KAWAGUCHI KAZUO ,  TANAKA MASATO ,  SHIMOKAWA TSUTOMU

IPC: G03F7/004 ,  G03F7/09

Abstract: An anti-reflection coating-forming composition is provided. This composition includes a polymer and a solvent. The polymer has a structural unit represented by the formula (1): wherein R1 is a monovalent atom other than a hydrogen atom or a monovalent group, and n is an integer of 0-4, provided that when n is an integer of 2-4, a plural number of R1's are the same or different; R2 and R3 are each a monovalent atom or group; and X is a bivalent group. The anti-reflection coating formed from this composition has a high antireflective effect, does not generate intermixing with a resist film, and enables a good resist pattern profile excellent in resolution and precision in cooperation with a positive or negative resist.

公开(公告)号：CA2431358A1

公开(公告)日：2002-06-20

申请号：CA2431358

申请日：2001-12-06

Applicant: JSR CORP

Inventor： SHIMOKAWA TSUTOMU ,  NISHIMURA ISAO ,  YAMADA KENJI ,  BESSHO NOBUO ,  KUMANO ATSUSHI

IPC: G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  C08L101/00 ,  G03F7/36 ,  G03F7/38

Abstract: A radiation-sensitive composition changing in refractive index which compris es (A) a decomposable compound, (B) a nondecomposable compound having a higher refractive index than the decomposable compound (A), (C) a radiation-sensiti ve decomposer, and (D) a stabilizer. When the composition is irradiated with a radiation through a pattern mask, the ingredients (C) and (A) in the irradiated areas decompose to cause a difference in refractive index between the irradiated areas and the unirradiated areas. Thus, a pattern having different refractive indexes is formed.