公开(公告)号：JP2002162746A

公开(公告)日：2002-06-07

申请号：JP2001280035

申请日：2001-09-14

Applicant: JSR CORP

Inventor： MIYAJI MASAAKI ,  NAGAI TOMOKI ,  YADA YUJI ,  NUMATA ATSUSHI

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/56 ,  G03F7/038 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a chemically amplifying positive or negative radiation sensitive composition capable of stably forming a fine pattern excellent in machining performance in a small space, critical dimension uniformity, maintainability and stability as a resist, having small density dependence in high accuracy. SOLUTION: The positive type radiation sensitive component contains (A1) a copolymer including a hydroxy(methyl) styrene unit and/or an alkoxy(methyl) styrene unit and a repeating unit expressed in formula (3) and (B) a radiation sensitive acid generator. The negative type radiation sensitive component contains (A2) a copolymer including a hydroxy(methyl) styrene unit and a repeating unit expressed in the formula (3), (B) the radiation sensitive acid generator and (C) a compound capable of bridging the component of (A2) under the existence of an acid.

公开(公告)号：JP2002072477A

公开(公告)日：2002-03-12

申请号：JP2000177487

申请日：2000-06-13

Applicant: JSR CORP

Inventor： KOBAYASHI HIDEKAZU ,  NUMATA ATSUSHI ,  YAMACHIKA MIKIO ,  YAMAMOTO MASASHI

IPC: G03F7/039 ,  C08K5/00 ,  C08K5/17 ,  C08L101/10 ,  G03F7/004 ,  G03F7/075 ,  G03F7/26 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive composition being effectively responsive to various types of radiations, having excellent sensitivity and resolution, and also having excellent long-term shelf stability and useful as a positive type chemical amplification type multilayer resist. SOLUTION: The positive type radiation sensitive resin composition for the upper layer resist of a multilayer resist contains (A) a low molecular compound obtained by preparing a compound having at least one amino group with one or two hydrogen atoms combining with a nitrogen atom and substituting a t-butoxycarbonyl group for one or more of the hydrogen atoms of the amino group, (B) a radiation sensitive acid generating agent and (C) an alkali- insoluble or slightly alkali-soluble silicon-containing resin protected with an acid dissociable group and convertible to an alkali-soluble resin when the acid dissociable group is dissociated.

公开(公告)号：JP2001013687A

公开(公告)日：2001-01-19

申请号：JP2000122919

申请日：2000-04-24

Applicant: JSR CORP

Inventor： CHIBA TAKASHI ,  NUMATA ATSUSHI

IPC: G03F7/039 ,  C08K5/00 ,  C08K5/17 ,  C08L25/18 ,  C08L33/04 ,  G03F7/004

Abstract: PROBLEM TO BE SOLVED: To obtain a radiation sensitive resin composition capable of forming a rectangular pattern free from a roundish head shape in micro-fabrication in a small film thickness by incorporating a copolymer containing specified repeating units, a radiation sensitive acid generating agent and a specified compound. SOLUTION: The radiation sensitive resin composition contains a copolymer containing repeating units of formulae I and II and/or a copolymer containing repeating units of formulae I and III, a radiation sensitive acid generating agent and a compound of formula IV. In the formulae I-III, R1, R2 and R8 are each H or methyl, R3 is t-butyl or the like and R9 is a 4-10C tertiary alkyl. In the formula IV, R10-R13 are each a 1-16C linear, branched or cyclic alky, 2-16C linear, branched or cyclic alkenyl or the like and R14 is a 5-16C monovalent hydrocarbon, 2-16C acyl or the like.

公开(公告)号：JP2014041322A

公开(公告)日：2014-03-06

申请号：JP2013026629

申请日：2013-02-14

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KOMATSU HIROYUKI ,  RYU KYOICHIRO ,  NUMATA ATSUSHI ,  ITANO TAKAFUMI

IPC: G02B5/20 ,  C08F220/10 ,  G03F7/004 ,  G03F7/027 ,  G03F7/033 ,  H01L51/50 ,  H05B33/12

Abstract: PROBLEM TO BE SOLVED: To provide an organic EL display element stable over a long period, a color filter used therefor, and a colored composition forming the color filter.SOLUTION: A color filter 3 has a plurality of colors of colored layers 5 formed of a colored composition. At least one of the plurality of colors of colored layers 5 of the color filter 3 contains a polyfunctional antioxidant, and has excellent stability. An organic EL display element 1 includes the color filter 3 and an organic EL layer 2. The organic EL layer 2 has a tandem structure, and can emit white light; and the organic EL display element 1 can display color images by using the color filter 3.

Abstract translation: 要解决的问题：为了提供长期稳定的有机EL显示元件，使用其的滤色器和形成滤色器的着色组合物。滤色器3具有多个彩色层5，由 彩色组合。 滤色器3的彩色层5的多种颜色中的至少一种含有多官能抗氧化剂，并且具有优异的稳定性。 有机EL显示元件1包括滤色器3和有机EL层2.有机EL层2具有串联结构，并且可以发出白光; 并且有机EL显示元件1可以通过使用滤色器3来显示彩色图像。

公开(公告)号：JP2008299349A

公开(公告)日：2008-12-11

申请号：JP2008211287

申请日：2008-08-20

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NUMATA ATSUSHI ,  SUZUKI AKI ,  HARA HIROMICHI ,  NATSUME NORIHIRO

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a positive radiation-sensitive resin composition that is superior in sensitivity and resolution, small in an optical proximity effect, and ensures a sufficient focus margin for an isolated line pattern.
SOLUTION: The radiation-sensitive resin composition contains (A) a low molecular weight compound obtained by substituting one hydrogen atom or more of a compound comprising an amino group where the hydrogen atom is combined with a nitrogen atom by a t-butoxy carbonyl group, (B) a radiation-sensitive acid generator, and (C) an acid dissociation group-containing resin. The compound having the amino group where the hydrogen atom is combined with the nitrogen atom is selected from among groups of a compound of formula (1), 1-adamanthylamine, nitrogen-containing heterocyclic compound, or the like. The (B) constituent is selected from among a bis(cyclohexane sulfonyl)diazomethane, N-(triflouromethanesulfonyloxy)bicyclo[2.2.1]hepto-5-ene-2, 3-dicarboximide, or the like. In the formula, R
1 and R
2 represent the hydrogen atom, alkyl group, or the like.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供灵敏度和分辨率优异的光敏感树脂组合物，光学邻近效应小，并且确保隔离线图案的足够的聚焦余量。 解决方案：辐射敏感性树脂组合物含有（A）通过将氢原子与氮原子结合的氨基的一个氢原子或更多个取代为叔丁氧基而获得的低分子量化合物 羰基，（B）辐射敏感性酸产生剂，和（C）含酸解离基团的树脂。 具有氢原子与氮原子结合的氨基的化合物选自式（1）化合物，1-金刚烷胺，含氮杂环化合物等的组。 （B）成分选自双（环己烷磺酰基）重氮甲烷，N-（三氟甲磺酰氧基）双环[2.2.1]庚-5-烯-2,3-二甲酰亚胺等。 在该式中，R“SP”1 和R 2 表示氢原子，烷基等。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2005338117A

公开(公告)日：2005-12-08

申请号：JP2004152781

申请日：2004-05-24

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KOYAMA TAKAYOSHI ,  NUMATA ATSUSHI ,  KOBAYASHI KAZUHIRO

IPC: G03F7/004 ,  G02B5/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a new radiation-sensitive composition for a color filter with high resolution even in an environment in oxygen shut-off, and to provide a color filter and a color liquid crystal display device. SOLUTION: The radiation-sensitive composition for a color filter contains (A) a pigment, (B) a dispersant, (C) an alkali-soluble resin, (D) a polyfunctional monomer and (E) a photopolymerization initiator. The content of the (E) photopolymerization initiator is 0.5 to 5 parts by weight with respect to 100 parts by weight of the (D) polyfunctional monomer. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：即使在氧气切断的环境中，也提供了具有高分辨率的滤色片的新的辐射敏感性组合物，并且提供了滤色器和彩色液晶显示装置。 ＆lt; P＆gt;解决方案：用于滤色器的辐射敏感组合物包含（A）颜料，（B）分散剂，（C）碱溶性树脂，（D）多官能单体和（E）光聚合引发剂。 相对于100重量份的（D）多官能单体，（E）光聚合引发剂的含量为0.5〜5重量份。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2001199955A

公开(公告)日：2001-07-24

申请号：JP2000336666

申请日：2000-11-02

Applicant: JSR CORP

Inventor： O ISAMU ,  KOBAYASHI HIDEKAZU ,  MIYAJI MASAAKI ,  NUMATA ATSUSHI ,  SHIMOKAWA TSUTOMU

IPC: G03F7/004 ,  C07D207/46 ,  C07D209/76 ,  C07D491/18 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an N-sulfonyloxyimide compound which can highly sensitively and efficiently generate an acid, is free from the problems of evaporation and side-reactions, can inhibit a dark reaction on the storage of resists, and is useful as the radiation-sensitive acid-generating agent component of a radiation-sensitive chemical amplification type resist, and to provide a positive type and negative type radiation-sensitive resin composition using the same. SOLUTION: The N-sulfonyloxyimide compound represented by formula (1) X is a single bond or a double bond; Y and Z are each independently H, or together form a cyclic structure; R is a group represented by the general formula (2) [X1 is an organic group having an ester bond; R1 is an alkyl or alkoxy; (m) is an integer of 1 to 11; (n) is an integer of 0 to 10; (m)+(n)

公开(公告)号：JP2008209948A

公开(公告)日：2008-09-11

申请号：JP2008118030

申请日：2008-04-30

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NUMATA ATSUSHI ,  SUZUKI AKI ,  HARA HIROMICHI ,  NATSUME NORIHIRO

IPC: G03F7/004 ,  G03F7/038 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a negative radiation-sensitive resin composition superior in sensitivity and resolution, showing small optical proximity effect, capable of accurately and stably forming a fine pattern, even in the case of an isolated line pattern, capable of ensuring sufficient focus margin for an isolated line pattern, and useful as a chemically amplified resist.
SOLUTION: The negative radiation-sensitive resin composition comprises (A) a low-molecular compound obtained by substituting at least one hydrogen atom of a compound, having an amino group in which the hydrogen atom bonds to a nitrogen atom by a t-butoxycarbonyl group; (B) a radiation-sensitive acid generator; (D) an alkali-soluble resin comprising a p-hydroxystyrene/styrene copolymer; and (E) a crosslinking agent.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 解决问题：为了提供灵敏度和分辨率优异的负辐射敏感性树脂组合物，显示出小的光学邻近效应，即使在隔离线图案的情况下也能够精确且稳定地形成精细图案，能够 确保隔离线图案的足够的聚焦余量，并且可用作化学放大抗蚀剂。 解决方案：负辐射敏感性树脂组合物包含（A）通过将具有其中氢原子与氮原子键合的氨基的化合物的至少一个氢原子替换为t而获得的低分子化合物 丁氧羰基 （B）辐射敏感酸产生剂; （D）包含对羟基苯乙烯/苯乙烯共聚物的碱溶性树脂; 和（E）交联剂。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2001215689A

公开(公告)日：2001-08-10

申请号：JP2000028456

申请日：2000-02-04

Applicant: JSR CORP

Inventor： NUMATA ATSUSHI ,  SUZUKI AKI ,  HARA HIROMICHI ,  NATSUME NORIHIRO

IPC: H01L21/027 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition excellent in sensitivity and resolution, having a small light proximity effect, capable of accurately and stably forming a fine pattern even in an isolated line pattern, capable of ensuring a sufficient focus margin for the isolated line pattern and useful as a positive type or negative type chemical amplification type resist. SOLUTION: The positive type radiation-sensitive resin composition contains (A) a low molecular compound obtained by preparing a compound having an amino group in which at least one hydrogen atom bonds to a nitrogen atom and substituting the hydrogen atom by a t-butoxycarbonyl group, (B) a radiation- sensitive acid generating agent and (C) (a) an acid dissociable group-containing resin which is made alkali-soluble when the acid dissociable group is dissociated or (b) an alkali-soluble resin and an alkali solubility controlling agent. The negative type radiation-sensitive resin composition contains the component A, the component B, (D) an alkali-soluble resin and (E) a crosslinking agent.

公开(公告)号：JP2010256509A

公开(公告)日：2010-11-11

申请号：JP2009104719

申请日：2009-04-23

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： TAKAMI TOMOHIRO ,  NUMATA ATSUSHI

IPC: G03F7/004 ,  C09B45/14 ,  C09B45/22 ,  C09B67/02 ,  C09B67/20 ,  G02B5/20 ,  G02B5/22 ,  G02F1/1335

Abstract: PROBLEM TO BE SOLVED: To provide a coloring composition which allows formation of a pixel having higher brightness and contrast ratio than a pixel formed using C.I. pigment yellow 150 and is superior in storage stability. SOLUTION: The coloring composition contains (A) a colorant, (B) a dispersant, (C) a binder resin, and (D) a polyfunctional monomer. The colorant (A) contains a clathrate compound having a metal complex of an azo barbituric acid as the host and having a melamine or the like as the guest, and the dispersant (B) contains a block copolymer having an A block having a quaternary ammonium salt and an amino group at the side chain and a B block having neither quaternary ammonium salt nor amino group at the side chain. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种着色组合物，其允许形成比使用C.I.形成的像素更高的亮度和对比度的像素。 颜料黄150，储存稳定性优异。 着色组合物含有（A）着色剂，（B）分散剂，（C）粘合剂树脂和（D）多官能单体。 着色剂（A）含有具有作为主体的偶氮巴比妥酸的金属络合物和作为客体的三聚氰胺等的包合物，分散剂（B）含有具有季铵盐的A嵌段的嵌段共聚物 盐和侧链上的氨基，侧链上既没有季铵盐也没有氨基的B嵌段。 版权所有（C）2011，JPO＆INPIT