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公开(公告)号：GB2412920B
公开(公告)日：2009-03-04
申请号：GB0505981
申请日：2005-03-23
Applicant: KAO CORP
Inventor： HONMA YUICHI , TAIRA KOUJI , TAKASHINA SHIGEAKI
Abstract: The present invention relates to a polishing composition containing an abrasive having an average particle size of from 1 to 30 nm and water, wherein the abrasive has a packing ratio of from 79 to 90% by weight; a method for manufacturing a substrate, including the steps of introducing the above polishing composition between a substrate and a polishing pad, and polishing the substrate, while contacting the substrate with the polishing composition; and a method for reducing scratches of a substrate to be polished, including the step of polishing the substrate to be polished with the above polishing composition. The polishing composition is suitable for polishing substrates for precision parts including, for example, substrates for magnetic recording media, such as magnetic disks, and opto-magnetic disks, photomask substrates, optical disks, optical lenses, optical mirrors, optical prisms and semiconductor substrates, and the like.
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公开(公告)号：ES2294016T3
公开(公告)日：2008-04-01
申请号：ES01955634
申请日：2001-08-09
Applicant: KAO CORP
Inventor： HONMA YUICHI , TAMAKI RYOICHI , SASAKI HIROTAKA
IPC: C08K5/06 , C08G65/329 , C10L1/32 , C08J3/03 , C08K5/101 , C08L71/02 , C08L95/00 , C09K23/00 , C09K23/42 , C10L10/18
Abstract: Una composición de emulsionante asfáltico que comprende un estabilizante (I) y un emulsionante no iónico (II), en la que el estabilizante (I) es uno seleccionado del grupo consistente en un compuesto aducto de polioxietileno (1) representado por la fórmula (1): R1-O-[(EO)W.(PO)X]-R2 (1) en la que R1 es un grupo alquilo o alquenilo C8-22 de cadena lineal o ramificada, R2 es un átomo de hidrógeno, un grupo alquilo C1-4 de cadena lineal o ramificada o un grupo acilo C1-22 de cadena lineal o ramificada, EO es un grupo oxietileno, PO es un grupo oxipropileno, (EO)W y (PO)X pueden estar en bloques o aleatorios, y su orden de adición no se especifica; cada uno de W y X es el número medio de moléculas añadidas, y W = 130 a 500 y X = 0 a 10, el emulsionante no iónico (II) comprende un compuesto aducto de polioxietileno representado por la fórmula (A): R3-O-[(EO)a.(PO)b]-R4 (A) en la que R3 es un grupo alquilo o alquenilo C8-22, de cadena lineal o ramificada, R4 es un átomo de hidrógeno, un grupo alquilo C1-4 de cadena lineal o ramificada o un grupo acilo C1-22 de cadena lineal o ramificada, EO es un grupo oxietileno, PO es un grupo oxipropileno, y la forma de adición de EO y PO puede ser en bloques o aleatoria, y no se especifica por tanto su orden de adición; cada uno de a y b es el número medio de moléculas añadidas, y a = 75 a 100, y b = 0 a 10.
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公开(公告)号：GB2417034A
公开(公告)日：2006-02-15
申请号：GB0514473
申请日：2005-07-14
Applicant: KAO CORP
Inventor： NISHIMOTO KAZUHIKO , TAIRA KOUJI , SUENAGA KENICHI , HONMA YUICHI
Abstract: A polishing composition containing an abrasive and water, wherein the polishing composition has a pH of from 0.1 to 7, and satisfies the following conditions: (1) that the number of polishing particles having sizes of 0.56 žm or more and less than 1 žm is 500,000 or less per 1 cm of the polishing composition; and (2) that the ratio of polishing particles having sizes of 1 žm or more is 0.001% by weight or less to the entire polishing particles in the polishing composition. The polishing composition is suitable for polishing substrates for precision parts including, for example, recording disk substrates, such as magnetic disks, optical disks, and opto-magnetic disks, photomask substrates, optical lenses, optical mirrors, optical prisms and semiconductor substrates, and the like.
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公开(公告)号：GB2412920A
公开(公告)日：2005-10-12
申请号：GB0505981
申请日：2005-03-23
Applicant: KAO CORP
Inventor： HONMA YUICHI , TAIRA KOUJI , TAKASHINA SHIGEAKI
Abstract: The composition contains an abrasive having an average particle size of from 1 to 30 nm and water, wherein the abrasive has a packing ratio of from 79 to 90% by weight. A method for manufacturing a substrate includes the steps of introducing the above polishing composition between a substrate and a polishing pad, and polishing the substrate, while contacting the substrate with the polishing composition; and a method for reducing scratches of a substrate to be polished includes the step of polishing the substrate with the above composition. The composition is suitable for polishing substrates for precision parts including substrates for magnetic recording media, such as magnetic disks, and opto-magnetic disks, photomask substrates, optical disks, optical lenses, optical mirrors, optical prisms and semiconductor substrates.
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公开(公告)号：JP2009035701A
公开(公告)日：2009-02-19
申请号：JP2007230532
申请日：2007-09-05
Inventor： SUZUKI MASAHIKO , HONMA YUICHI , YAMAWAKI YUKIKO
Abstract: PROBLEM TO BE SOLVED: To provide a polishing liquid composition restraining roll-off. SOLUTION: The polishing liquid composition includes a copolymer having a constitutional unit expressed as the following formula (I) and a constitutional unit derived from a hydrophobic monomer having solubility not more than 2 g to 100 g of water at 20°C, and a polishing material. Methoxypolyethylene glycol methacrylate etc., are used as monomers for forming the constitutional unit of the formula (I), and alkyl methacrylate etc., are used as the hydrophobic monomers. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 要解决的问题：提供抑制滚降的抛光液组合物。 ＆lt; P＆gt;解决方案：抛光液组合物包括具有下式（I）表示的结构单元的共聚物和衍生自在20℃下溶解度不超过2g至100g的疏水性单体的结构单元， 和抛光材料。 甲氧基聚乙二醇甲基丙烯酸酯等用作形成式（I）的结构单元的单体和甲基丙烯酸烷基酯等作为疏水性单体。 版权所有（C）2009，JPO＆INPIT
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Patent Agency Ranking
公开(公告)号：JPH09278505A
公开(公告)日：1997-10-28
申请号：JP9647696
申请日：1996-04-18
Applicant: KAO CORP
Inventor： HONMA YUICHI , YAMATO FUJIO
IPC: C04B24/26
Abstract: PROBLEM TO BE SOLVED: To obtain an admixture for concrete, excellent in improving effect on fluidity, reducing effect on viscosity and retaining effect on fluidity of a hydraulic composition such as cement paste, comprising a copolymer having a specific composition as a main component. SOLUTION: This admixture for concrete consists essentially of a copolymer of a monomer of formula I (R1 and R2 are each H or methyl; AO is a 2-3C oxyalkylene; (n) is 2-300; R3 is a 3-4C alkenyl; m1 is 0-2) and a monomer copolymerizable with the monomer. For example, a monomer obtained by adding a polyalkylene glycol to allyl alcohol or 2-buten-1-ol and esterifying the resultant material with (meth)acrylic acid may be cited as the monomer of formula I. A compound of formula II (R4 to R6 are each H, methyl, etc.; Y is H, an alkali metal, etc.) (e.g. acrylic acid) or a compound of formula III (R7 is H or methyl; Z is H, an alkali metal, etc.) (e.g. allylsulfonic acid) is suitable as the copolymerizable monomer.
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公开(公告)号：JP2007301721A
公开(公告)日：2007-11-22
申请号：JP2007222603
申请日：2007-08-29
Inventor： YOSHIDA HIROYUKI , HONMA YUICHI
IPC: B24B37/00
Abstract: PROBLEM TO BE SOLVED: To provide a polishing liquid composition capable of providing small surface roughness of an object to be polished after polishing and remarkably reducing nanoscratches, and a manufacturing method of a substrate having small surface roughness and remarkably reduced nanoscratches.
SOLUTION: This polishing liquid composition contains a polishing material having an average particle diameter ≥1 nm andAbstract translation: 解决问题的方案：提供一种能够在抛光后提供待研磨物体的较小表面粗糙度并显着减少纳米尺度的抛光液组合物，以及具有较小表面粗糙度和显着降低的纳米尺度的基材的制造方法。 该抛光液组合物含有一次粒子的平均粒径≥1nm，<40nm的研磨材料。 研磨液组合物中的研磨材料的ζ电位为-15〜30mV。 在该基板的制造方法中，提供使用研磨材料的ζ电位调整为-15〜30mV的研磨液组合物的研磨工序。 版权所有（C）2008，JPO＆INPIT
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公开(公告)号：JP2002167377A
公开(公告)日：2002-06-11
申请号：JP2000367081
申请日：2000-12-01
Applicant: KAO CORP
Inventor： MASUDA HIROYUKI , NISHIMOTO UICHIRO , FUKUSHIMA TETSURO , TAMAOKI RYOICHI , HONMA YUICHI
IPC: C07D233/16 , C07D239/06
Abstract: PROBLEM TO BE SOLVED: To provide a method for preparing a nitrogen-containig alicyclic compound, having a terminal amino group, with high purity is obtained easily, and economically advantageously from industrial stand point. SOLUTION: In preparing the nitrogen-containing compound represented by the general formula (III), (wherein, R1 is a hydrocarbon group of 5-23 carbon atoms; R2 is a hydrogen atom or a hydrocarbon group of 1-6 carbon atoms; n is a number of 2-3; m is a number of 1-4), by dehydrocondensing a fatty acid or an ester thereof with a polyamine, and the charging molar ratio of the fatty acid or ester thereof/polyamine is taken within the range of 1/1.5-1/5.0, by without using a solvent, or reaction is conducted by using 15 or less parts by weight of the solvent against 100 parts by weight of the fatty acid or ester thereof.
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公开(公告)号：JPH09142905A
公开(公告)日：1997-06-03
申请号：JP30902395
申请日：1995-11-28
Applicant: KAO CORP
Inventor： YAMATO FUJIO , KITAGAWA KAZUE , HONMA YUICHI
IPC: C04B24/26 , C08F290/00 , C08F290/06
Abstract: PROBLEM TO BE SOLVED: To obtain a concrete admixture excellent in dispersibility, the fluidity holding property of concrete or the like by incorporating a water soluble copolymer of a specific monomer and a copolymerizable monomer or its water soluble salt as essential components. SOLUTION: The water soluble copolymer or its water soluble salt is produced by copolymerizing a monomer expressed by the formula (AO is a 2-3C oxyalkylene and (n) is 50-300 in average) and a monomer copolymerizable with the monomer. And the concrete admixture is obtained by incorporating the water soluble copolymer (salt) as an essential component and as necessary, blending additives such as a high performance water reducing agent, a fluidizing agent and a foaming agent. Further, the monomer expressed by the formula is a polyalkylene glycol monoallyl ether and is obtained by addition-reacting ethylene oxide or propylene oxide to an allyl alcohol. And as the copolymerizable monomer, maleic acid, citraconic acid or a monomer obtained by introducing a 2-3C oxyalkylene group to these acids is suitably used.
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公开(公告)号：JP2004323695A
公开(公告)日：2004-11-18
申请号：JP2003120959
申请日：2003-04-25
Applicant: Kao Corp , Nichireki Co Ltd , ニチレキ株式会社 , 花王株式会社
Inventor： HONMA YUICHI , TAMAOKI RYOICHI , SASAKI HIROTAKA , OKUDA KOJI , UENO SADAJI , HAIRI SHOKICHI
IPC: C08L95/00 , C08K5/134 , C08K5/17 , C08K5/20 , C08K5/3445
Abstract: PROBLEM TO BE SOLVED: To provide an additive for heated asphalt which is liquid and excellent in operating efficiency and further enhances preventive effects on separation of asphalt from aggregates.
SOLUTION: The additive for heated asphalt comprises asphalt and, incorporated therewith, a specific gallic acid amide and the like in a specific ratio to asphalt.
COPYRIGHT: (C)2005,JPO&NCIPI
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