公开(公告)号：WO2016141237A1

公开(公告)日：2016-09-09

申请号：PCT/US2016/020772

申请日：2016-03-03

Applicant: KLA-TENCOR CORPORATION

Inventor： LIANG, Ardis ,  PLIHAL, Martin ,  BABULNATH, Raghav ,  VENKATARAMAN, Sankar

IPC: G01N21/956 ,  G01R31/26 ,  G06T7/00

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N23/20008 ,  G01N2021/8809 ,  G01N2201/061 ,  G01N2201/0683

Abstract: Methods and systems for generating inspection results for a specimen with an adaptive nuisance filter are provided. One method includes selecting a portion of events detected during inspection of a specimen having values for at least one feature of the events that are closer to at least one value of at least one parameter of the nuisance filter than the values for at least one feature of another portion of the events. The method also includes acquiring output of an output acquisition subsystem for the sample of events, classifying the events in the sample based on the acquired output, and determining if one or more parameters of the nuisance filter should be modified based on results of the classifying. The nuisance filter or the modified nuisance filter can then be applied to results of the inspection of the specimen to generate final inspection results for the specimen.

Abstract translation: 提供了用于生成具有自适应干扰过滤器的样本的检查结果的方法和系统。 一种方法包括选择在检查样本期间检测到的事件的一部分，所述事件具有与所述事件的至少一个特征相比更接近于所述烦扰滤波器的至少一个参数的至少一个值的至少一个特征的值 另一部分事件。 该方法还包括获取事件样本的输出采集子系统的输出，基于获取的输出对样本中的事件进行分类，并且基于分类的结果确定是否应当修改干扰过滤器的一个或多个参数。 然后可以将干扰过滤器或修改过的干扰过滤器应用于样本检查结果以生成样本的最终检查结果。

公开(公告)号：WO2015148851A1

公开(公告)日：2015-10-01

申请号：PCT/US2015/022833

申请日：2015-03-26

Applicant: KLA-TENCOR CORPORATION

Inventor： PLIHAL, Martin ,  JAIN, Ankit ,  LENNEK, Michael

IPC: H01L21/66

CPC classification number: G01N21/93 ,  G01N21/9501 ,  G01N2201/063 ,  G01N2201/12 ,  H01L22/12 ,  H01L22/20

Abstract: Methods and systems for generating defect samples are provided. One method includes identifying a set of defects detected on a wafer having the most diversity in values of at least one defect attribute and generating different tiles for different defects in the set. The tiles define a portion of all values for the at least one attribute of all defects detected on the wafer that are closer to the values for the at least one attribute of their corresponding defects than the values for the at least one attribute of other defects. In addition, the method includes separating the defects on the wafer into sample bins corresponding to the different tiles based on their values of the at least one attribute, randomly selecting defect(s) from each of two or more of the sample bins, and creating a defect sample for the wafer that includes the randomly selected defects.

Abstract translation: 提供了生成缺陷样本的方法和系统。 一种方法包括识别在具有至少一个缺陷属性的值中具有最多分集的晶片上检测到的一组缺陷，并为该组中的不同缺陷生成不同的瓦片。 瓦片定义了在晶片上检测到的所有缺陷的至少一个属性的所有值的一部分，其比其他缺陷的至少一个属性的值更接近于其相应缺陷的至少一个属性的值。 另外，该方法包括基于其至少一个属性的值，将两个或多个样品仓中的每一个随机选择缺陷，将晶片上的缺陷分离成对应于不同瓦片的样品箱，并创建 包括随机选择的缺陷的晶片的缺陷样品。

公开(公告)号：WO2015142747A1

公开(公告)日：2015-09-24

申请号：PCT/US2015/020790

申请日：2015-03-16

Applicant: KLA-TENCOR CORPORATION

Inventor： KONURU, Raghavan ,  BHATTI, Naema ,  LENNEK, Michael ,  PLIHAL, Martin

IPC: H01L21/66

CPC classification number: G06T7/0004 ,  G06K9/6254 ,  G06K9/6282 ,  G06K2209/19

Abstract: Methods and systems for setting up a classifier for defects detected on a wafer are provided. One method includes generating a template for a defect classifier for defects detected on a wafer and applying the template to a training data set. The training data set includes information for defects detected on the wafer or another wafer. The method also includes determining one or more parameters for the defect classifier based on results of the applying step.

Abstract translation: 提供了用于设置在晶片上检测到的缺陷的分类器的方法和系统。 一种方法包括为在晶片上检测到的缺陷生成用于缺陷分类器的模板并将模板应用于训练数据集。 训练数据集包括在晶片或另一晶片上检测到的缺陷的信息。 该方法还包括基于应用步骤的结果确定缺陷分类器的一个或多个参数。

公开(公告)号：WO2019046665A1

公开(公告)日：2019-03-07

申请号：PCT/US2018/048992

申请日：2018-08-31

Applicant: KLA-TENCOR CORPORATION

Inventor： SARASWATULA, Jagdish Chandra ,  PLIHAL, Martin

IPC: H01L21/66

Abstract: Defect location accuracy can be increased using shape based grouping with pattern-based defect centering. Design based grouping of defects on a wafer can be performed. A spatial distribution of the defects around at least one structure on the wafer, such as a predicted hot spot, can be determined. At least one design based defect property for a location around the structure can be determined. The defects within an x-direction threshold and a y-direction threshold of the structure may be prioritized.

公开(公告)号：WO2018132321A1

公开(公告)日：2018-07-19

申请号：PCT/US2018/012684

申请日：2018-01-05

Applicant: KLA-TENCOR CORPORATION

Inventor： PLIHAL, Martin ,  SOLTANMOHAMMADI, Erfan ,  PARAMASIVAM, Saravanan ,  RAVU, Sairam ,  JAIN, Ankit ,  UPPALURI, Prasanti ,  RAMACHANDRAN, Vijay

IPC: H01L21/66 ,  H01L21/67

Abstract: Wafer inspection with stable nuisance rates and defect of interest capture rates are disclosed. This technique can be used for discovery of newly appearing defects that occur during the manufacturing process. Based on a first wafer, defects of interest are identified based on the classified filtered inspection results. For each remaining wafer, the defect classifier is updated and defects of interest in the next wafer are identified based on the classified filtered inspection results.

公开(公告)号：WO2018075547A1

公开(公告)日：2018-04-26

申请号：PCT/US2017/057029

申请日：2017-10-17

Applicant: KLA-TENCOR CORPORATION

Inventor： PLIHAL, Martin ,  SOLTANMOHAMMADI, Erfan ,  PARAMASIVAM, Saravanan ,  RAVU, Sairam ,  JAIN, Ankit ,  SHEKKIZHAR, Sarath ,  UPPALURI, Prasanti

IPC: H01L21/66

CPC classification number: G01N21/9501 ,  G01N21/55 ,  G01N21/8803 ,  G01N21/8851 ,  G01N2021/8854 ,  G01N2021/95676 ,  G06N5/003 ,  G06N20/00 ,  H01L22/12 ,  H01L22/20

Abstract: Methods and systems for training an inspection-related algorithm are provided. One system includes one or more computer subsystems configured for performing an initial training of an inspection-related algorithm with a labeled set of defects thereby generating an initial version of the inspection-related algorithm and applying the initial version of the inspection-related algorithm to an unlabeled set of defects. The computer subsystem(s) are also configured for altering the labeled set of defects based on results of the applying. The computer subsystem(s) may then iteratively re-train the inspection-related algorithm and alter the labeled set of defects until one or more differences between results produced by a most recent version and a previous version of the algorithm meet one or more criteria. When the one or more differences meet the one or more criteria, the most recent version of the inspection-related algorithm is outputted as the trained algorithm.

Abstract translation: 提供了用于训练检验相关算法的方法和系统。 一个系统包括一个或多个计算机子系统，其被配置用于利用标记的一组缺陷执行与检查相关的算法的初始训练，从而生成检查相关算法的初始版本并将初始版本的检查相关算法应用于 未标记的一组缺陷。 计算机子系统还被配置用于基于应用的结果来改变标记的缺陷组。 计算机子系统然后可以迭代地重新训练检查相关算法并且改变标记的缺陷集合，直到最新版本和先前版本的算法产生的结果之间的一个或多个差异满足一个或多个标准。 当一个或多个差异符合一个或多个标准时，检验相关算法的最新版本作为训练算法输出。

公开(公告)号：WO2017192908A1

公开(公告)日：2017-11-09

申请号：PCT/US2017/031147

申请日：2017-05-04

Applicant: KLA-TENCOR CORPORATION

Inventor： PARK, Allen ,  PLIHAL, Martin

IPC: H01L21/66

CPC classification number: G06T7/001 ,  G06T2207/30148

Abstract: A fabricated device having consistent modulation between target and reference components is provided. The fabricated device includes a target component having a first modulation. The fabricated device further includes at least two reference components for the target component including a first reference component and a second reference component, where the first reference component and the second reference component each have the first modulation. Further, a system, method, and computer program product are provided for detecting defects in a fabricated target component using consistent modulation for the target and reference components.

Abstract translation: 提供了在目标和参考组件之间具有一致调制的制造设备。 制造的器件包括具有第一调制的目标组件。 所制造的装置还包括用于目标部件的至少两个参考部件，其包括第一参考部件和第二参考部件，其中第一参考部件和第二参考部件各自具有第一调制。 此外，提供了一种系统，方法和计算机程序产品，用于使用针对目标和参考部件的一致调制来检测制造的目标部件中的缺陷。

公开(公告)号：WO2017185058A1

公开(公告)日：2017-10-26

申请号：PCT/US2017/028985

申请日：2017-04-21

Applicant: KLA-TENCOR CORPORATION

Inventor： PLIHAL, Martin

IPC: G01N21/95 ,  G01N21/88 ,  G06T7/00

Abstract: A system, method, and computer program product are provided for correcting a difference image generated from a comparison of target and reference dies. In use, an intra-die inspection of a target die image is performed to generate, for each pattern of interest, a first representative image. An intra-die inspection of a reference die image is performed to generate, for each of the patterns of interest, a second representative image. Further, the target die image and the reference die image are compared to generate at least one difference image, and the at least one difference image is corrected using each of the generated first representative images and each of the generated second representative images. Detection is then performed using the corrected difference image.

Abstract translation: 提供了一种系统，方法和计算机程序产品，用于校正由目标和参考裸片的比较产生的差异图像。 在使用中，执行目标裸片图像的裸片内检查以针对每个感兴趣的图案生成第一代表图像。 执行参考裸片图像的晶粒内检查以针对每个感兴趣图案产生第二代表性图像。 此外，比较目标裸片图像和参考裸片图像以生成至少一个差值图像，并且使用生成的第一代表图像和生成的第二代表图像中的每一个来校正至少一个差值图像。 然后使用校正的差异图像进行检测。

公开(公告)号：WO2017049219A1

公开(公告)日：2017-03-23

申请号：PCT/US2016/052323

申请日：2016-09-16

Applicant: KLA-TENCOR CORPORATION

Inventor： HE, Li ,  PLIHAL, Martin ,  YING, Huajun ,  BHATIA, Anadi ,  DANDIANA, Amitoz S. ,  RAMINI, Ramakanth

IPC: H01L21/66

CPC classification number: G01N21/9501 ,  G01N2201/06113 ,  G01N2201/12 ,  G06N99/005

Abstract: Methods and systems for classifying defects detected on a specimen with an adaptive automatic defect classifier are provided. One method includes creating a defect classifier based on classifications received from a user for different groups of defects in first lot results and a training set of defects that includes all the defects in the first lot results. The first and additional lot results are combined to create cumulative lot results. Defects in the cumulative lot results are classified with the created defect classifier. If any of the defects are classified with a confidence below a threshold, the defect classifier is modified based on a modified training set that includes the low confidence classified defects and classifications for these defects received from a user. The modified defect classifier is then used to classify defects in additional cumulative lot results.

Abstract translation: 提供了使用自适应自动缺陷分类器对样本上检测到的缺陷进行分类的方法和系统。 一种方法包括基于从用户接收的针对第一批结果中的不同缺陷组的分类创建缺陷分类器，以及包括第一批次结果中的所有缺陷的训练缺陷集合。 第一个和另外的批次结果相结合以创建累积的批量结果。 累积批次结果中的缺陷根据创建的缺陷分类器进行分类。 如果任何缺陷以低于阈值的置信度分类，则基于修改的训练集修改缺陷分类器，所述修改训练集包括从用户接收的这些缺陷的低置信分类缺陷和分类。 然后使用修改后的缺陷分类器对附加累积批次结果中的缺陷进行分类。

公开(公告)号：WO2016141229A1

公开(公告)日：2016-09-09

申请号：PCT/US2016/020762

申请日：2016-03-03

Applicant: KLA-TENCOR CORPORATION

Inventor： LIANG, Ardis ,  PLIHAL, Martin ,  BABULNATH, Raghav ,  VENKATARAMAN, Sankar

IPC: G01R23/165 ,  G01R31/26 ,  G01R31/28 ,  G01N21/88 ,  G01N21/95

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N23/20008 ,  G01N2021/8809 ,  G01N2201/061 ,  G01N2201/0683

Abstract: Methods and systems for generating inspection results for a specimen with an adaptive nuisance filter are provided. One method includes selecting a portion of events detected during inspection of a specimen having values for at least one feature of the events that are closer to at least one value of at least one parameter of the nuisance filter than the values for at least one feature of another portion of the events. The method also includes acquiring output of an output acquisition subsystem for the sample of events, classifying the events in the sample based on the acquired output, and determining if one or more parameters of the nuisance filter should be modified based on results of the classifying. The nuisance filter or the modified nuisance filter can then be applied to results of the inspection of the specimen to generate final inspection results for the specimen.

Abstract translation: 提供了一种用于产生具有自适应扰动滤波器的样本检测结果的方法和系统。 一种方法包括选择在样本检查期间检测到的事件的一部分，该样本具有关于事件的至少一个特征的值，该值至少与有害滤波器的至少一个参数的值相比， 另一部分事件。 该方法还包括获取用于事件采样的输出采集子系统的输出，基于所获取的输出对样本中的事件进行分类，以及基于分类结果确定是否应修改妨扰滤波器的一个或多个参数。 然后可以将妨扰过滤器或修改后的滋扰过滤器应用于样品的检查结果，以产生样品的最终检验结果。