中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

26 records (took 0.037 seconds)

    Toroidal plasma Abatement Apparatus and Method
    11.
    发明申请
    Toroidal plasma Abatement Apparatus and Method 有权
    环形等离子体消除装置及方法

    公开(公告)号：US20140262746A1

    公开(公告)日：2014-09-18

    申请号：US14212398

    申请日：2014-03-14

    Applicant: MKS Instruments, Inc.

    Inventor： Xing Chen ,  IIya Pokidov ,  Arthur Tian ,  Ken Tran ,  David Lam ,  Kevin W. Wenzel

    IPC: B01D53/76

    CPC classification number: H01J37/32449 ,  B01D53/323 ,  B01D53/76 ,  B01D2257/2064 ,  H01J37/32339 ,  H01J37/32357 ,  H01J37/32458 ,  H01J37/32651 ,  H01J37/32669 ,  H01J37/32844 ,  H01J37/32935 ,  H01J2237/3321 ,  H01J2237/334 ,  H05H1/46 ,  H05H2001/4667 ,  H05H2245/121 ,  Y02C20/30

    Abstract: An apparatus for abatement of gases is provided. The apparatus includes a toroidal plasma chamber having a plurality of inlets and an outlet, and at least one chamber wall. One or more magnetic cores are disposed relative to the toroidal plasma chamber. The plasma chamber confines a toroidal plasma. A second gas inlet is positioned on the toroidal plasma chamber between a first gas inlet and the gas outlet at a distance d from the gas outlet, such that a toroidal plasma channel volume between the first gas inlet and the second gas inlet in the is substantially filled by the inert gas, the distance d based on a desired residence time of the gas to be abated.

    Abstract translation: 提供了一种用于减少气体的装置。 该装置包括具有多个入口和出口以及至少一个室壁的环形等离子体室。 一个或多个磁芯相对于环形等离子体室设置。 等离子体室限制环形等离子体。 第二气体入口位于第一气体入口和气体出口之间的距离气体出口距离d处的环形等离子体室上，使得第一气体入口和第二气体入口之间的环形等离子体通道体积基本上 由惰性气体填充，基于要减少的气体的期望停留时间的距离d。

    Multi-sensor gas sampling detection system for radical gases and short-lived molecules and method of use
    12.
    发明授权
    Multi-sensor gas sampling detection system for radical gases and short-lived molecules and method of use 有权

    公开(公告)号：US11733224B2

    公开(公告)日：2023-08-22

    申请号：US17583712

    申请日：2022-01-25

    Applicant: MKS Instruments, Inc.

    Inventor： Johannes Chiu ,  Xing Chen ,  Chiu-Ying Tai ,  Michael Harris ,  Atul Aupta

    IPC: G01N33/00 ,  G01K17/06 ,  G01N27/12 ,  G01N21/3504

    CPC classification number: G01N33/0031 ,  G01K17/06 ,  G01N21/3504 ,  G01N27/122 ,  G01N33/0016

    Abstract: The present application is directed to a method of measuring the concentration of radicals in a gas stream which includes the steps of flowing a radical gas stream emitted from at least one radical gas generator to at least one processing chamber, providing at least one sampling reaction module having at least one sampling tube therein, establishing a reference temperature of the sampling tube with at least one thermal control module, diverting a portion of the radical gas steam from the radical gas generator into the sampling tube, reacting at least one reagent with at least one radical gas within a defined volume of the radical gas stream thereby forming at least one chemical species within at least one compound stream, the compound stream flowing within the sampling tube, measuring a change of temperature of the sampling tube due to interaction of the chemical species within the compound stream and the sampling tube with sensor module, and calculating a concentration of the chemical species within the compound stream flowing within the sampling tube based on the measured temperature change of the sampling tube.

    Plasma Source Having a Dielectric Plasma Chamber with Improved Plasma Resistance
    15.
    发明申请
    Plasma Source Having a Dielectric Plasma Chamber with Improved Plasma Resistance 审中-公开

    公开(公告)号：US20200022246A1

    公开(公告)日：2020-01-16

    申请号：US16035551

    申请日：2018-07-13

    Applicant: MKS Instruments, Inc.

    Inventor： Xing Chen ,  Ilya Pokidov ,  Atul Gupta

    IPC: H05H1/46 ,  H05H1/24 ,  H01J37/32

    Abstract: A plasma chamber of a plasma processing system is provided. The plasma chamber defines a plasma channel having a first side and a second side oppositely disposed along a length of the plasma channel. The plasma chamber comprises a first section and a second section constructed from a dielectric material and an interface that bonds together the first and second sections at between a first flange of the first section and a third flange of the second section and between a second flange of the first section and a fourth flange of the second section.

    Method and Apparatus for Processing Dielectric Materials Using Microwave Energy
    18.
    发明申请
    Method and Apparatus for Processing Dielectric Materials Using Microwave Energy 审中-公开

    公开(公告)号：US20170173846A1

    公开(公告)日：2017-06-22

    申请号：US14978091

    申请日：2015-12-22

    Applicant: MKS Instruments, Inc.

    Inventor： Xing Chen ,  David Lam ,  Kevin W. Wenzel ,  Ilya Pokidov

    IPC: B29C49/64

    CPC classification number: B29C49/64 ,  B29B13/024 ,  B29C35/0805 ,  B29C49/6418 ,  B29C2035/0855 ,  B29K2067/003 ,  B29L2031/712 ,  H05B6/707

    Abstract: Methods and systems are provided for heating a dielectric preform material. An exemplary method includes inserting the preform material into a microwave cavity along a longitudinal axis of the microwave cavity and supplying the microwave cavity with microwave power having a frequency that corresponds to an axial wavelength along the longitudinal axis of the microwave cavity. The axial wavelength is greater than a length of the preform material along the longitudinal axis. The method includes heating the preform material within the microwave cavity by the microwave power and determining temperatures of the preform material at one or more locations on a surface of the preform material. The method further includes adjusting, based on the temperatures of the preform material, the microwave frequency to achieve substantially uniform heating at least on a sidewall of the preform material along the longitudinal axis.

    Microwave plasma applicator with improved power uniformity
    19.
    发明授权
    Microwave plasma applicator with improved power uniformity 有权

    公开(公告)号：US09653266B2

    公开(公告)日：2017-05-16

    申请号：US14645837

    申请日：2015-03-12

    Applicant: MKS Instruments, Inc.

    Inventor： Xing Chen ,  Chengxiang Ji ,  Erin Madden ,  Ilya Pokidov ,  Kevin W. Wenzel

    IPC: H01J37/32 ,  H05H1/46

    CPC classification number: H01J37/32229 ,  H01J37/32201 ,  H01J37/32311 ,  H01J37/32522 ,  H05H1/46 ,  H05H2001/4622

    Abstract: An apparatus for generating plasma includes a plasma discharge tube and a conductive coil helically wound around an outer surface of the plasma discharge tube. A waveguide is coupled to a microwave cavity surrounding the plasma discharge tube to guide the microwave energy into the plasma discharge tube such that the plasma is generated in the plasma discharge tube. The waveguide is positioned such that an electric field of the microwave energy is oriented at a predetermined angle with respect to the longitudinal axis of the plasma discharge tube. A resulting induced electric current in the conductive coil affects power absorption in the plasma discharge tube, the predetermined angle being selectable such that power absorption in the plasma discharge tube is according to a predetermined profile with respect to the longitudinal axis of the plasma discharge tube.

    Toroidal Plasma Channel with Varying Cross-Section Areas Along the Channel
    20.
    发明申请
    Toroidal Plasma Channel with Varying Cross-Section Areas Along the Channel 审中-公开
    环形等离子体通道与通道不同的横截面区域

    公开(公告)号：US20150287575A1

    公开(公告)日：2015-10-08

    申请号：US14742402

    申请日：2015-06-17

    Applicant: MKS Instruments, Inc.

    Inventor： Chaolin Hu ,  Xing Chen

    IPC: H01J37/32

    CPC classification number: H01J37/32449 ,  C23C16/45587 ,  C23C16/45591 ,  C23C16/50 ,  F17D1/04 ,  G21B1/17 ,  H01J37/32009 ,  H01J37/321 ,  H01J37/32357 ,  H01J37/32513 ,  H01J37/32807 ,  H01J2237/006 ,  H05H1/12 ,  Y02E30/122 ,  Y02E30/126 ,  Y10T137/0318 ,  Y10T137/8376

    Abstract: An assembly for adjusting gas flow patterns and gas-plasma interactions including a toroidal plasma chamber. The toroidal plasma chamber has an injection member, an output member, a first side member and a second side member that are all connected. The first side member has a first inner cross-sectional area in at least a portion of the first side member and a second inner cross-sectional area in at least another portion of the first side member, where the first inner cross-sectional area and the second inner-cross-sectional area being different. The second side member has a third inner cross-sectional area in at least a portion of the second side member and a fourth inner cross-sectional area in at least another portion of the second side member, where the third inner cross-sectional area and the fourth inner-cross-sectional area being different.

    Abstract translation: 用于调节气体流动模式和气体 - 等离子体相互作用的组件，包括环形等离子体室。 环形等离子体室具有全部连接的注入构件，输出构件，第一侧构件和第二侧构件。 第一侧构件在第一侧构件的至少一部分中具有第一内横截面面积，在第一侧构件的至少另一部分中具有第二内横截面积，其中第一内横截面积和 第二内截面积不同。 第二侧构件在第二侧构件的至少一部分中具有第三内截面面积，在第二侧构件的至少另一部分中具有第四内横截面积，其中第三内横截面积和 第四内截面面积不同。

Patent Agency Ranking