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公开(公告)号：JP2002059502A
公开(公告)日：2002-02-26
申请号：JP2000251797
申请日：2000-08-23
Applicant: NISSHA PRINTING
Inventor： SHIGEMURA KIYOTO , ISODA NORIMICHI
Abstract: PROBLEM TO BE SOLVED: To provide a partially luminescent molded product dispensing with a masking process, and a method for manufacturing the same. SOLUTION: At least, a partial ultraviolet shielding layer 5 is laminated to the surface of the molded product 9 containing a fluorescent substance or having a fluorescent layer formed to the whole surface thereof.
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公开(公告)号：JP2002040206A
公开(公告)日：2002-02-06
申请号：JP2000226161
申请日：2000-07-27
Applicant: NISSHA PRINTING
Inventor： ISODA NORIMICHI
Abstract: PROBLEM TO BE SOLVED: To provide an antireflection cover member having a superior antireflection effect and a method for producing the member. SOLUTION: At least a low reflection layer 6 is formed on one face or both faces of a transparent substrate 2.
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公开(公告)号：JP2002036793A
公开(公告)日：2002-02-06
申请号：JP2000221766
申请日：2000-07-24
Applicant: NISSHA PRINTING
Inventor： KEIMEN MASAYUKI , ISODA NORIMICHI
IPC: B44C1/165
Abstract: PROBLEM TO BE SOLVED: To obtain a transfer material having both a blocking resisting property and an antistatic property. SOLUTION: At least a decorative layer 3 and an adhesive layer 6 are formed on one surface of a base film 2, and on the other surface, a first back ink layer 7 having a blocking resisting property and a second back ink layer 12 having an antistatic property are formed sequentially.
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公开(公告)号：JPS6452156A
公开(公告)日：1989-02-28
申请号：JP20994387
申请日：1987-08-24
Applicant: NISSHA PRINTING
Inventor： HASHIMOTO TAKAO , ISODA NORIMICHI
IPC: C03C17/36 , G02F1/133 , G02F1/1335 , G03F1/00 , G03F1/54 , G03F1/58 , G09F9/00 , H01L21/027 , H01L21/30
Abstract: PURPOSE:To obtain a light shielding film on which a thin film having a high optical density without having pinholes is formed by providing an active layer consisting of an inorg. material contg. many fine pores having 100-700m /g specific surface area and a metallic film formed on said layer on a transparent substrate. CONSTITUTION:The inorg. active layer 2 is formed on the transparent substrate 1. The active layer 2 has the many fine pores having 100-700m /g specific surface area. A catalyst for chemical plating infiltrates the fine pores 5 of the active layer 2 and is adsorbed therein when this transparent substrate 1 is brought into contact with the catalyst liquid for plating by a means such as immersing. The metallized catalyst for chemical plating constitutes the plating nucleus in the next state when this catalyst for chemical plating is reduced and metallized. Namely, a metallic film 4 is formed on the active layer 2 by rinsing the transparent substrate 1, then immersing the substrate into an electroless plating liquid and executing electroless plating. This film 4 has the excellent smoothness and the adhesion to the active layer 2.
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公开(公告)号：JP2007320148A
公开(公告)日：2007-12-13
申请号：JP2006152128
申请日：2006-05-31
Applicant: Nissha Printing Co Ltd , 日本写真印刷株式会社
Inventor： WATASE TOMOYA , ISODA NORIMICHI , KASAHARA TAKUYA
Abstract: PROBLEM TO BE SOLVED: To provide a mold for simultaneous molding and painting for manufacturing a cover part of an optical member by simultaneous molding and painting without occurrence of glare or flare and constraints on designing.
SOLUTION: The first mold 1 to be arranged with a film 100 for transfer has a flat window-forming block 21 forming transparent window parts 91 and 93 of a cover part 90 composed of a resin molding and a cavity 28 which has a three-dimensional edge-forming recessed part 22 demarcating a molding space in a closed state of the mold and molding the edge of a cover part 90. The window-forming block 21 has a surface roughness smaller than the root-mean-square roughness Rq and the maximum height Rz, specified by the surface roughness ISO4287, of the release surface 35a of the film 100 for transfer to be used in simultaneous molding and painting.
COPYRIGHT: (C)2008,JPO&INPITAbstract translation: 要解决的问题：提供一种用于同时成型和喷涂的模具，用于通过同时成型和喷涂而制造光学部件的盖部分而不发生眩光或闪光以及设计的限制。 解决方案：用于传送的膜100布置的第一模具1具有平坦的窗口形成块21，其形成由树脂模制件和空腔28组成的盖部分90的透明窗部分91和93，空腔28具有 三维边缘形成凹部22在模具的闭合状态下划定成型空间，并成型盖部件90的边缘。窗口形成块21的表面粗糙度小于均方根粗糙度Rq 以及用于同时成型和喷漆的转印用膜100的剥离面35a的表面粗糙度ISO4287所规定的最大高度Rz。 版权所有（C）2008，JPO＆INPIT
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Patent Agency Ranking
公开(公告)号：JP2007320146A
公开(公告)日：2007-12-13
申请号：JP2006152126
申请日：2006-05-31
Applicant: Nissha Printing Co Ltd , 日本写真印刷株式会社
Inventor： ISODA NORIMICHI , NISHIDA MASAHIRO , WATASE TOMOYA , WATA YASUHARU , ETO AKIRA
Abstract: PROBLEM TO BE SOLVED: To provide an in-mold patterning transfer sheet capable of preventing the contamination of a mold at the time of in-mold patterning and capable of sufficiently preventing the precipitation of an oligomer.
SOLUTION: The in-mold patterning transfer sheet comprises a base material film 35 constituted of polyester resins different in the content of the oligomer in a thickness direction and a transfer layer 32 provided on one side of the base material film 35. The outside part 36b positioned on the outermost surface side of the other surface 35b, to which the transfer layer is not provided, of the base material film 35 is formed of a resin with a thickness of 0.1-5.0 μm and an oligomer content of below 0.5 wt.% and an intermediate part 37 is formed of a resin with an oligomer content of 1 wt.% or above. The outside part 36b and the intermediate part 37 are constituted of the same kind of a resin and integrally constituted so that a boundary is absent between both of them.
COPYRIGHT: (C)2008,JPO&INPITAbstract translation: 要解决的问题：提供一种能够防止在模内图案化时模具污染并能够充分防止低聚物沉淀的模内图案转印片材。 解决方案：模内图案转印片包括由厚度方向上的低聚物含量不同的聚酯树脂和设置在基材膜35一侧的转印层32构成的基材膜35。 基材膜35的位于未设置转印层的另一表面35b的最外表面侧的外侧部分36b由厚度为0.1-5.0μm，低聚物含量低于0.5的树脂形成 重量％，中间部分37由低聚物含量为1重量％以上的树脂形成。 外部部分36b和中间部分37由相同种类的树脂构成，并且整体构成，使得它们之间不存在边界。 版权所有（C）2008，JPO＆INPIT
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17.发明专利
公开(公告)号：JP2002207104A
公开(公告)日：2002-07-26
申请号：JP2001319897
申请日：2001-10-17
Applicant: NISSHA PRINTING
Inventor： MORI FUJIO , ISODA NORIMICHI
IPC: G02B5/02 , B32B7/02 , G02B1/10 , G02B1/11 , G02B1/111 , G02B1/14 , G02B1/18 , G02F1/1333 , G02F1/1335 , G09F9/00
Abstract: PROBLEM TO BE SOLVED: To provide an antireflection member having a significant antireflection effect, a method for producing the member and an antireflection transfer material. SOLUTION: The antireflection member has a significant antireflection effect because two antireflection constitutive layers having a rugged shape at the interface between those are stacked on a part of a transparent substrate forming a transparent window. The antireflection member having a significant antireflection effect is easily obtained because a transfer material obtained by forming at least two antireflection constitutive layers having a rugged shape at the interface between those on a base sheet is set in a metallic mold in such a way that the base sheet comes in contact with the cavity surface, a transparent molten resin is injected into the mold to obtain an integrated combination of a transparent substrate comprising the resin and the transfer material and then the base sheet is peeled.
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18.发明专利
公开(公告)号：JP2002036796A
公开(公告)日：2002-02-06
申请号：JP2000226641
申请日：2000-07-27
Applicant: NISSHA PRINTING
Inventor： ISODA NORIMICHI , MORI FUJIO
Abstract: PROBLEM TO BE SOLVED: To provide an in-mold decorative molding sheet which has a mechanical characteristic that it extends according to a mold shape and does not break, and maintains this mechanical characteristic with time, and a manufacturing method for an in-mold decorative molded article, using the sheet. SOLUTION: The in-mold decorative molding sheet uses as a substrate sheet a resin film oriented beforehand so as to have an index of surface orientation (NS) of 0.16 to 0.18. When a tensile test is carried out in a test environment of 25 deg.C and under the measuring condition of JIS C-2318 method, an elongation percentage of the substrate sheet or the in-mold decorative molding sheet is 70% or more, and a tensile strength is 180 MPa or more.
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公开(公告)号：JPH0259869B2
公开(公告)日：1990-12-13
申请号：JP7500487
申请日：1987-03-27
Applicant: NISSHA PRINTING
Inventor： SUMI TAKAO , ISODA NORIMICHI , ISHIBASHI TATSUO
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公开(公告)号：JPH01296251A
公开(公告)日：1989-11-29
申请号：JP12634788
申请日：1988-05-24
Applicant: NISSHA PRINTING
Inventor： HASHIMOTO TAKAO , ISODA NORIMICHI , OHASHI MASAKIYO , KISHI KEIJI , AKAI TAKAHIRO
Abstract: PURPOSE:To improve the adhesive property of the metal mask and material to be printed by patterning the photoresist films on both faces of a metallic plate and etching the same, then removing the resist film on the surface which does not come into contact with the material to be printed. CONSTITUTION:The photoresist films 2, 3 are respectively formed on both faces of the metallic plate 1 such as stainless steel plate. Photomasks 4 are then respectively imposed on the films 2, 3 in such a manner that the ink transmission holes thereof are registered. The resist films are then exposed and developed from both faces and thereafter, the plate 1 is etched in the part where the films 2, 3 are removed. The film 2 of the surface which does not come into contact with the material to be printed is then removed. The film 2 is preferably formed of a positive type resist and the film 3 of a negative type resist. The remaining films function as soft layers according to this method and, therefore, the adhesive property to the material to be printed is improved and the precise patterns free from ink blurring are obtd.
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