公开(公告)号：EP1464061A4

公开(公告)日：2008-02-20

申请号：EP02784361

申请日：2002-10-31

Applicant: OSMIC INC

Inventor： VERMAN BORIS ,  JOENSEN KARSTEN ,  PLATONOV YURIY ,  SESHADRI SRIVATSAN

IPC: G21K1/06

CPC classification number: B82Y10/00 ,  G21K1/062

Abstract: An optical element for diffracting x-rays that includes a substrate (4), a diffraction structure (6) applied to the substrate, the diffraction structure including an exterior surface facing away from the substrate and the diffraction structure capable of diffracting x-rays and a protective layer (14) applied to the exterior surface.

公开(公告)号：EP1399927A4

公开(公告)日：2005-01-26

申请号：EP02746779

申请日：2002-06-27

Applicant: OSMIC INC

Inventor： MARTYNOV VLADIMIR V ,  PLATONOV YURIY

IPC: G02B5/18 ,  G21K1/06

CPC classification number: B82Y10/00 ,  G02B5/1809 ,  G02B5/1838 ,  G21K1/06 ,  G21K1/062

Abstract: An analyzing system (10) comprised of a radiation source (12) that provides a beam (14) of radiation of various wavelengths in the range of 0.3 to 1.0 nm, a sample (16) receives and reflects the incident beam through a slit (19) to a grating (20), a grating (20) that reflects only the zero order of the beam (22), and a detector (24) that detects only the zero order. The grating (20) includes a multi-layer structure (26) that has alternating layers of materials, a plurality of grooves (30) formed between a plurality of lands (32), wherein at least one structural parameter of the plurality of grooves and plurality of lands is formed randomly in the multi-layer structure.