公开(公告)号：WO02071028A2

公开(公告)日：2002-09-12

申请号：PCT/US0206723

申请日：2002-03-01

Applicant: OSMIC INC

Inventor： MARTYNOV VLADIMIR V ,  PLATONOV YURIY

IPC: G21K1/06 ,  G01N

CPC classification number: B82Y10/00 ,  G21K1/06 ,  G21K1/062 ,  G21K2207/005

Abstract: An analyzer that includes a first multilayer structure and a second multilayer structure deposited on the spacer material.

Abstract translation: 一种分析仪，其包括沉积在间隔物材料上的第一多层结构和第二多层结构。

公开(公告)号：DE60221394T2

公开(公告)日：2008-04-17

申请号：DE60221394

申请日：2002-06-27

Applicant: OSMIC INC

Inventor： MARTYNOV VLADIMIR V ,  PLATONOV YURIY

IPC: G21K1/06 ,  G02B5/18

Abstract: The invention relates to a grating (20) comprising: a multi-layer structure (26) comprising: alternating layers of materials; a plurality of grooves (30) formed between a plurality of lands (32), wherein at least one structural parameter of said plurality of grooves and plurality of lands is formed randomly in said multi-layer structure.

公开(公告)号：DE60305044T2

公开(公告)日：2006-11-30

申请号：DE60305044

申请日：2003-09-03

Applicant: OSMIC INC

Inventor： PLATONOV YURIY

IPC: G21K1/06 ,  G01N23/223

Abstract: The present invention consists of a multilayer structure having at least one triad of layers where each of the three layers is a predetermined material. One of the materials is from a group including lanthanum, lanthanum oxide, or lanthanum-based alloys. A second material is disposed between the first material and a third material. The second material is from a group including carbon, silicon, boron, boron carbide or silicon carbide. The third material is from a group including boron or boron carbide. Alternatively, a fourth material is added to further strengthen and increase the water resistance of the multilayer structure. The fourth material is selected from a group including silicon, boron, boron carbide or silicon carbide. The fourth material is disposed between the third layer of multilayer period n and the first layer of multilayer period n-1.

公开(公告)号：AU2002258469A1

公开(公告)日：2002-09-19

申请号：AU2002258469

申请日：2002-03-01

Applicant: OSMIC INC

Inventor： MARTYNOV VLADIMIR V ,  PLATONOV YURIY

IPC: G21K1/06 ,  G03H5/00

Abstract: An analyzer that includes a first multilayer structure, a spacer material deposited on the first multilayer structure and a second multilayer structure deposited on the spacer material.

公开(公告)号：DE60232556D1

公开(公告)日：2009-07-16

申请号：DE60232556

申请日：2002-06-27

Applicant: OSMIC INC

Inventor： MARTYNOV VLADIMIR V ,  PLATONOV YURIY

IPC: G02B5/18 ,  G21K1/06

Abstract: The invention relates to a grating (20) comprising: a multi-layer structure (26) comprising: alternating layers of materials; a plurality of grooves (30) formed between a plurality of lands (32), wherein at least one structural parameter of said plurality of grooves and plurality of lands is formed randomly in said multi-layer structure.

公开(公告)号：DE60221394D1

公开(公告)日：2007-09-06

申请号：DE60221394

申请日：2002-06-27

Applicant: OSMIC INC

Inventor： MARTYNOV VLADIMIR V ,  PLATONOV YURIY

IPC: G21K1/06 ,  G02B5/18

Abstract: The invention relates to a grating (20) comprising: a multi-layer structure (26) comprising: alternating layers of materials; a plurality of grooves (30) formed between a plurality of lands (32), wherein at least one structural parameter of said plurality of grooves and plurality of lands is formed randomly in said multi-layer structure.

公开(公告)号：DE60305044D1

公开(公告)日：2006-06-08

申请号：DE60305044

申请日：2003-09-03

Applicant: OSMIC INC

Inventor： PLATONOV YURIY

IPC: G21K1/06 ,  G01N23/223

Abstract: The present invention consists of a multilayer structure having at least one triad of layers where each of the three layers is a predetermined material. One of the materials is from a group including lanthanum, lanthanum oxide, or lanthanum-based alloys. A second material is disposed between the first material and a third material. The second material is from a group including carbon, silicon, boron, boron carbide or silicon carbide. The third material is from a group including boron or boron carbide. Alternatively, a fourth material is added to further strengthen and increase the water resistance of the multilayer structure. The fourth material is selected from a group including silicon, boron, boron carbide or silicon carbide. The fourth material is disposed between the third layer of multilayer period n and the first layer of multilayer period n-1.

公开(公告)号：AU2003270076A1

公开(公告)日：2004-03-29

申请号：AU2003270076

申请日：2003-09-03

Applicant: OSMIC INC

Inventor： PLATONOV YURIY

IPC: G01N23/223 ,  G21K1/06

Abstract: The present invention consists of a multilayer structure having at least one triad of layers where each of the three layers is a predetermined material. One of the materials is from a group including lanthanum, lanthanum oxide, or lanthanum-based alloys. A second material is disposed between the first material and a third material. The second material is from a group including carbon, silicon, boron, boron carbide or silicon carbide. The third material is from a group including boron or boron carbide. Alternatively, a fourth material is added to further strengthen and increase the water resistance of the multilayer structure. The fourth material is selected from a group including silicon, boron, boron carbide or silicon carbide. The fourth material is disposed between the third layer of multilayer period n and the first layer of multilayer period n-1.

公开(公告)号：AU2002348141A1

公开(公告)日：2003-07-30

申请号：AU2002348141

申请日：2002-10-31

Applicant: OSMIC INC

Inventor： VERMAN BORIS ,  JOENSEN KARSTEN ,  PLATONOV YURIY ,  SESHADRI SRIVATSAN

IPC: G21K1/06

Abstract: An optical element for diffracting x-rays that includes a substrate, a diffraction structure applied to the substrate, the diffraction structure including an exterior surface facing away from the substrate and the diffraction structure capable of diffracting x-rays and a protective layer applied to the exterior surface.

公开(公告)号：EP1449037A4

公开(公告)日：2007-12-26

申请号：EP02728415

申请日：2002-03-01

Applicant: OSMIC INC

Inventor： MARTYNOV VLADIMIR V ,  PLATONOV YURIY

IPC: G21K1/06 ,  G03H5/00

CPC classification number: B82Y10/00 ,  G21K1/06 ,  G21K1/062 ,  G21K2207/005

Abstract: An analyzer that includes a first multilayer structure (350), a spacer material (354) deposited on the first multilayer structure and a second multilayer structure (356) deposited on the spacer material.