公开(公告)号：US20160289824A1

公开(公告)日：2016-10-06

申请号：US14675795

申请日：2015-04-01

Applicant: SILCOTEK CORP.

Inventor： James B. MATTZELA ,  Min YUAN ,  David A. SMITH ,  Paul H. SILVIS

IPC: C23C16/44 ,  C22C21/08 ,  C23C16/02

CPC classification number: C23C16/44 ,  C22C21/08 ,  C23C16/0209

Abstract: An article including a coating and a process including an article with a coating are disclosed. The article includes an aluminum-containing substrate including, by weight, at least 95% aluminum, and a coated and stabilized surface on the aluminum-containing substrate, the coated and stabilized surface being applied by thermal chemical vapor deposition at a temperature of less than 600° C. The process includes transporting fluid along a coated and stabilized surface positioned on an aluminum-containing substrate.

Abstract translation: 公开了一种包括涂层和包括具有涂层的制品的工艺的制品。 该制品包括含铝基材，其包含至少95重量％的铝，以及在含铝基材上的涂层和稳定化表面，涂覆和稳定的表面通过热化学气相沉积在小于 600℃。该方法包括沿着位于含铝基底上的涂覆和稳定的表面输送流体。

公开(公告)号：US20160289124A1

公开(公告)日：2016-10-06

申请号：US14675806

申请日：2015-04-01

Applicant: SILCOTEK CORP.

Inventor： James B. MATTZELA ,  Min YUAN ,  David A. SMITH ,  Paul H. SILVIS

IPC: C04B35/622 ,  C23C16/44 ,  C04B35/14 ,  C23C16/50

CPC classification number: C23C16/56 ,  C04B41/009 ,  C04B41/5035 ,  C04B41/52 ,  C04B41/87 ,  C04B41/89 ,  C23C16/401 ,  C04B35/00 ,  C04B38/00 ,  C04B41/4531 ,  C04B41/4922

Abstract: Thermal chemical vapor deposition products and processes are disclosed. The products include a ceramic substrate and a non-porous surface on the ceramic substrate, the non-porous surface including a ceramic material. The process includes transporting fluid along a non-porous surface, the non-porous surface being positioned on a ceramic substrate and being a thermal chemical vapor deposition coating.

Abstract translation: 公开了热化学气相沉积产物和方法。 所述产品包括陶瓷基板和陶瓷基板上的无孔表面，所述无孔表面包括陶瓷材料。 该方法包括沿无孔表面输送流体，无孔表面位于陶瓷基底上并且是热化学气相沉积涂层。

公开(公告)号：US20160168697A1

公开(公告)日：2016-06-16

申请号：US14946115

申请日：2015-11-19

Applicant: SILCOTEK CORP.

Inventor： David A. SMITH ,  Min YUAN ,  James B. MATTZELA

IPC: C23C16/44 ,  C23C16/24

CPC classification number: C23C16/44 ,  C23C16/24 ,  C23C16/4402 ,  C23C16/4404

Abstract: A delivery device, manufacturing system, and process of manufacturing are disclosed. The delivery device includes a feed tube and a chemical vapor deposition coating applied over an inner surface of the feed tube, the chemical vapor deposition coating being formed from decomposition of dimethylsilane. The manufacturing system includes the delivery device and a chamber in selective fluid communication with the delivery device. The process of manufacturing uses the manufacturing system to produce an article.

Abstract translation: 公开了一种输送装置，制造系统和制造方法。 输送装置包括施加在进料管的内表面上的进料管和化学气相沉积涂层，化学气相沉积涂层由二甲基硅烷的分解形成。 制造系统包括输送装置和与输送装置选择性流体连通的室。 制造过程使用制造系统来生产制品。

公开(公告)号：US20220136110A1

公开(公告)日：2022-05-05

申请号：US17511953

申请日：2021-10-27

Applicant: SILCOTEK CORP.

Inventor： David A. SMITH ,  Gary A. BARONE ,  Geoffrey K. WHITE

IPC: C23C16/56 ,  B64D15/16 ,  C23C16/34

Abstract: De-icing processes and products with coatings enabling de-icing are disclosed. The de-icing process includes mechanically removing ice from a coated article having a chemical vapor deposition coating. The chemical vapor deposition coating includes silicon, carbon, and fluorine. The chemical vapor deposition coating is hydrophobic and oleophobic. The chemical vapor deposition coating remains hydrophobic and oleophobic after the mechanically removing of the ice. The product is a coated article having a chemical vapor deposition coating and ice on the chemical vapor deposition coating. The chemical vapor deposition coating includes silicon, carbon, and fluorine. The chemical vapor deposition coating is hydrophobic and oleophobic. The chemical vapor deposition coating remains hydrophobic and oleophobic in response to mechanically removing of the ice on the chemical vapor deposition coating.

公开(公告)号：US20210170305A1

公开(公告)日：2021-06-10

申请号：US17177770

申请日：2021-02-17

Applicant: SILCOTEK CORP.

Inventor： Jesse BISCHOF ,  Lucas D. PATTERSON ,  Gary BARONE ,  Min YUAN ,  David A. SMITH

IPC: B01D15/22 ,  B01D15/20 ,  B01D15/16 ,  G01N30/36 ,  G01N30/56 ,  G01N30/30 ,  G01N30/02

Abstract: Liquid chromatography techniques are disclosed. Specifically, the liquid chromatography technique includes providing a liquid chromatography system having a coated metallic fluid-contacting element, and transporting a fluid to contact the coated metallic fluid-contacting element. Conditions for the transporting of the fluid are selected from the group consisting of the temperature of the fluid being greater than 150° C., pressure urging the fluid being greater than 60 MPa, the fluid having a protein-containing analyte incompatible with one or both of titanium and polyether ether ketone, the fluid having a chelating agent incompatible with the one or both of the titanium or the polyether ether ketone, and combinations thereof

公开(公告)号：US20210101092A1

公开(公告)日：2021-04-08

申请号：US16971216

申请日：2019-02-22

Applicant: SILCOTEK CORP.

Inventor： Jesse BISCHOF ,  Lucas D. PATTERSON ,  Gary BARONE ,  Min YUAN ,  David A. SMITH

IPC: B01D15/22 ,  G01N30/30 ,  G01N30/36 ,  G01N30/56 ,  B01D15/20 ,  B01D15/16

Abstract: LC techniques are disclosed. The LC technique includes providing a liquid chromatography system having a coated metallic fluid-contacting element, and transporting a fluid to contact the coated metallic fluid contacting element. Conditions for the transporting of the fluid are selected from the group consisting of the temperature of the fluid being greater than 150 degree Celsius, pressure urging the fluid being greater than 60 MPa, the fluid having a protein-containing analyte incompatible with one of titanium and polyether ether ketone, the fluid having a chelating agent incompatible with the one or both of the titanium or the polyether ether ketone.

公开(公告)号：US20190003044A1

公开(公告)日：2019-01-03

申请号：US16121994

申请日：2018-09-05

Applicant: SILCOTEK CORP.

Inventor： Min YUAN ,  James B. MATTZELA ,  David A. SMITH

IPC: C23C16/34 ,  C23C16/455 ,  C23C16/04 ,  C23C16/30 ,  C23C16/56

Abstract: Surfaces, articles, and processes having silicon-nitride-containing thermal chemical vapor deposition coating are disclosed. A process includes producing a silicon-nitride-containing thermal chemical vapor deposition coating on a surface within a chamber. Flow into and from the chamber is restricted or halted during the producing of the silicon-nitride-containing thermal chemical vapor deposition coating on the surface. A surface includes a silicon-nitride-containing thermal chemical vapor deposition coating. The surface has at least a concealed portion that is obstructed from view. An article includes a silicon-nitride-containing thermal chemical vapor deposition coating on a surface within a chamber. The surface has at least a concealed portion that is obstructed from view.

公开(公告)号：US20170283943A1

公开(公告)日：2017-10-05

申请号：US15467564

申请日：2017-03-23

Applicant: SILCOTEK CORP.

Inventor： David A. SMITH

IPC: C23C16/30 ,  B32B15/18 ,  B32B15/20 ,  C22C38/58 ,  C22C38/44 ,  C22C38/00 ,  C22C38/42 ,  C22C38/02 ,  C22C38/06 ,  C22C38/50 ,  C22C38/04 ,  C22C38/46 ,  C22C21/08 ,  C22C19/05 ,  B32B15/04

CPC classification number: C23C16/30 ,  B05D1/60 ,  B05D3/044 ,  B05D5/083 ,  B05D7/146 ,  B05D2202/00 ,  B05D2506/10 ,  B05D2518/10 ,  B32B15/04 ,  B32B15/18 ,  B32B15/20 ,  C22C19/056 ,  C22C21/08 ,  C22C38/001 ,  C22C38/002 ,  C22C38/02 ,  C22C38/04 ,  C22C38/06 ,  C22C38/42 ,  C22C38/44 ,  C22C38/46 ,  C22C38/50 ,  C22C38/58 ,  C23C12/00 ,  C23C12/02

Abstract: Treated articles and a process of producing the treated articles, systems having treated articles, and processes incorporating treated articles are disclosed. The treated articles include a metal or metallic substrate, and a surface treatment of the metal or metallic substrate, the surface treatment having fluorine, silicon, and carbon. The systems include a flow path, with the surface treatment being within the flow path. The processes include flowing a fluid through the flow path.

公开(公告)号：US20160289585A1

公开(公告)日：2016-10-06

申请号：US14675823

申请日：2015-04-01

Applicant: SILCOTEK CORP.

Inventor： James B. MATTZELA ,  Min YUAN ,  David A. SMITH ,  Paul H. SILVIS

IPC: C10M105/76 ,  C23C16/44 ,  C23C16/30

CPC classification number: C10M105/76 ,  C10M2227/045 ,  C10N2230/06 ,  C10N2250/14 ,  C10N2260/04 ,  C23C16/325 ,  C23C16/56

Abstract: Thermal chemical vapor deposition coated product and uses of such products are disclosed. A thermal chemical vapor deposition coated product includes a threaded substrate and a lubricious coating on the threaded substrate, the lubricious coating having a coefficient of friction of between 0.05 and 0.58 and being a thermal chemical vapor deposition. A process includes engaging the thermal chemical vapor deposition coated product with a material having mating threads, and applying pressure to the thermal chemical vapor deposition coated product while engaged with the material.

Abstract translation: 公开了热化学气相沉积涂覆产品和这些产品的用途。 热化学气相沉积涂覆产品包括螺纹基底和在螺纹基底上的润滑涂层，该润滑涂层的摩擦系数在0.05和0.58之间，并且是热化学气相沉积。 一种方法包括使热化学气相沉积涂覆的产品与具有配合螺纹的材料接合，并在与材料接合的同时向热化学气相沉积涂覆的产品施加压力。

公开(公告)号：US20160060763A1

公开(公告)日：2016-03-03

申请号：US14821949

申请日：2015-08-10

Applicant: SILCOTEK CORP.

Inventor： Min YUAN ,  David A. SMITH ,  Paul H. SILVIS ,  James B. MATTZELA

IPC: C23C16/52 ,  C23C16/22

CPC classification number: C23C16/52 ,  C23C16/22 ,  C23C16/30 ,  C23C16/46 ,  C23C16/56

Abstract: A chemical vapor deposition process and coated article are disclosed. The chemical vapor deposition process includes positioning an article in a chemical vapor deposition chamber, then introducing a deposition gas to the chemical vapor deposition chamber at a sub-decomposition temperature that is below the thermal decomposition temperature of the deposition gas, and then heating the chamber to a super-decomposition temperature that is equal to or above the thermal decomposition temperature of the deposition gas resulting in a deposited coating on at least a surface of the article from the introducing of the deposition gas. The chemical vapor deposition process remains within a pressure range of 0.01 psia and 200 psia and/or the deposition gas is dimethylsilane. The coated article includes a substrate subject to corrosion and a deposited coating on the substrate, the deposited coating having silicon, and corrosion resistance.

Abstract translation: 公开了一种化学气相沉积工艺和涂覆制品。 化学气相沉积工艺包括将物品定位在化学气相沉积室中，然后将沉积气体以低于沉积气体的热分解温度的分解温度引入化学气相沉积室，然后加热室 达到等于或高于沉积气体的热分解温度的超分解温度，从沉积气体的引入导致在制品的至少一个表面上沉积的涂层。 化学气相沉积工艺保持在0.01psia和200psia的压力范围内和/或沉积气体是二甲基硅烷。 涂覆制品包括经受腐蚀的基材和在基材上沉积的涂层，沉积的涂层具有硅，并具有耐腐蚀性。