-
公开(公告)号：JP2001054865A
公开(公告)日：2001-02-27
申请号：JP23185699
申请日：1999-08-18
Applicant: SONY CORP
Inventor： SATO SHUZO , OTORII SUGURU
IPC: B24B53/00 , B24B37/00 , B24B53/017 , H01L21/304
Abstract: PROBLEM TO BE SOLVED: To provide the correcting and forming method of a polishing tool, and its polishing method, which can improve the evenness of the polishing removal amount of a wafer. SOLUTION: The pressing amount of a polishing tool to a wafer in the actual processing is detected beforehand, a correcting and forming tool in order to correct and form the polishing surface of the polishing tool is loaded to a wafer table instead of the wafer (Step S11), it is pressed on the polishing surface of the polishing tool at the detected prossing amount (Step S17), and it is moved in the X-axial direction (Step S18), so as to correct and form the polishing surface of the polishing tool.
-
公开(公告)号：JPH10296614A
公开(公告)日：1998-11-10
申请号：JP11564397
申请日：1997-05-06
Applicant: SONY CORP
Inventor： SATO SHUZO , OTORII SUGURU
IPC: B24B53/017 , B24B37/00
Abstract: PROBLEM TO BE SOLVED: To simplify and miniaturize a polishing device and simplify and shorten a polishing process by automating the maintenance work such as replacing a dresser itself with a new one. SOLUTION: This dressing method is used to dress the polishing pad with a dresser, which is provided in a polishing device for polishing wafers through a series of polishing processes including the movement of wafers by a carrying means. In this case, dressing is conducted with a wafer-shaped dresser 20 contacted with the polishing pad by making the wafer-shaped dresser 20 instead of wafers, which has a polishing face to which diamond abrasive grains 31 are deposited, pass the same path as that in the polishing process for wafers.
-
公开(公告)号：JPH10296610A
公开(公告)日：1998-11-10
申请号：JP11078997
申请日：1997-04-28
Applicant: SONY CORP
Inventor： SATO SHUZO , OTORII SUGURU
Abstract: PROBLEM TO BE SOLVED: To improve the flatness and surface of a grinding wheel, by joining a fixed abrasive grain by a soft binder, a pore agent, and an abrasive grain dispersant. SOLUTION: A grinding wheel 11; retained by fixing a fixed abrasive grain 13 by a soft binder 12, a pore agent, and an abrasive grain dispersant; is rotated and concurrently is moved in an arrow A direction to be pressed to the surface of a ground material 10 to be ground. In this condition, a free abrasive grain 15 is supplied to the surface of the material 10 to be polished, and the surface of the material 10 is rotated concurrently with the rotation of the wheel 11 to fall a worn-out abrasive grain 13' by a collision with the free abrasive grain 15, and so on. After that, a free abrasive grain 15' to be newly supplied is retained in an abrasive grain retaining portion turned into a cavity, or in a pore 14 to contribute grinding work. Consequently causing a scratch on a grinding surface can be restrained to improve a surface.
-
公开(公告)号：JPH09193008A
公开(公告)日：1997-07-29
申请号：JP611796
申请日：1996-01-17
Applicant: SONY CORP
Inventor： SATO SHUZO , SUZUKI TAKASHI
IPC: B24B37/07 , B24B37/10 , H01L21/304 , B24B37/04
Abstract: PROBLEM TO BE SOLVED: To provide a flattening and polishing device with which an object to be polished such as a wafer can be polished and flattened to the high accuracy and at a high speed. SOLUTION: A polishing plate 2 with a vacuum groove is rotated by a spindle motor 3 at a high speed, e.g. 1500rpm. A wafer 9 held by a wafer sucking film 12 is rotated at a speed of 50rpm for example. While a slider 6 makes traverse movement along a rail 26 at a prescribed amplitude and a speed, the surface of the wafer 9 is polished by a polishing pad 1.
-
公开(公告)号：JPH08281550A
公开(公告)日：1996-10-29
申请号：JP8928595
申请日：1995-04-14
Applicant: SONY CORP
Inventor： HAYAKAWA HIDEAKI , SAITOU TAKATOSHI , KOMURO YOSHIAKI , SATO SHUZO
IPC: B24B37/005 , B24B37/30 , B24B37/34 , B24B41/06 , B24B49/16 , B24B49/18 , B24B53/00 , B24B53/007 , B24B53/017 , H01L21/304 , B24B37/00
Abstract: PURPOSE: To provide a polishing device with high throughput by which a wafer to be treated is polished so that its surface may have improved uniformity and flat level. CONSTITUTION: When a wafer to be treated 6 holded by a polishing heads 4 is pressed onto a pad surface placed on a polishing plate with a polishing work pressure from a pressing element, interfacial contact pressure between the surface of the wafer to be treated 6 and the pad surface is controlled at every areas using the following parts comprising a guide member 12 mounted on an upper surface of a head, a weight loading bodies 13 which are slidably fixed to the guide member 12 and a clamping means by which the weight loading bodies 13 are fixed to the guide members.
-
Patent Agency Ranking
公开(公告)号：JPH06143130A
公开(公告)日：1994-05-24
申请号：JP31150092
申请日：1992-10-27
Applicant: SONY CORP
Inventor： SATO SHUZO
Abstract: PURPOSE:To prolong the life of a machine by preventing the generation of the erosion and rust of the work chuck and the table of a grinding machine using the electrolysis in-process dressing. CONSTITUTION:A chuck part 11 is electrically insulated from a machine body by installing an insulating plate 12 between a table 1 and the magnet chuck 11 for attracting a work 2, and the flow of electric current in the table 1 and the chuck 11 is prevented in dressing.
-
公开(公告)号：JPH05309536A
公开(公告)日：1993-11-22
申请号：JP12016792
申请日：1992-04-14
Applicant: SONY CORP
Inventor： SATO SHUZO
Abstract: PURPOSE:To enhance machining accuracy by filling a column with synthetic granite, sealing pipelines through which cooling water for the synthetic granite flows, and thereby keeping the column at a stable attitude with thermal displacement lessened in the column. CONSTITUTION:Synthetic granite 4 filled in a column 2 (from now on it is called SG) is lower in the coefficient of thermal conductivity than cast iron. This is a reason why the column 2 filled with SG4 is great in thermal capacity. Cooling water flowing within pipelines 5 sealed in the SG4 allows the column 2 to be thermally stable. As a result, the column is hardly affected by heat caused by fluctuation in ambient temperature and the rotational suspension of spindles, and it can maintain a stable column attitude at all times, so that machining accuracy can thereby be enhanced.
-
公开(公告)号：JPH04294974A
公开(公告)日：1992-10-19
申请号：JP8042991
申请日：1991-03-20
Applicant: SONY CORP
Inventor： SATO SHUZO
IPC: B24B53/00
Abstract: PURPOSE:To obtain a grinding method capable of a ginding process stably over a long time without generating blinding on the grinding wheel surface. CONSTITUTION:Voltage is impressed between a grinding wheel 13 and an electrode plate 20 for executing an electrolytic in process dressing grind method, but it is made the voltage that a positive pulse voltage and positive DC voltage are superposed with the impressing voltage being arranged with the grinding wheel side as a straight polarity, it is arranged to flow the current that the grinding wheel side becomes positive at all times via the electrolyte existing between the ginding wheel and electrode plate, and no reverse bias voltage is impressed between the both.
-
公开(公告)号：JP2013106189A
公开(公告)日：2013-05-30
申请号：JP2011248694
申请日：2011-11-14
Inventor： KOSUGI HIROSHI , SATO SHUZO , OTANI EIJI , SATO MITSURU
CPC classification number: G02B23/2415 , A61B1/00193 , A61B1/04 , G02B5/201 , G02B23/2453 , G02B23/2484 , G02B27/286 , G06T3/4015 , H04N5/2256 , H04N13/0207 , H04N13/0257 , H04N2005/2255 , H04N2213/001
Abstract: PROBLEM TO BE SOLVED: To provide an imaging apparatus for acquiring a stereoscopic image of a subject with a simple structure without enlarging the apparatus.SOLUTION: The imaging apparatus includes: a lens barrel which includes an eyepiece section and transmits subject luminous flux; a polarization filter which includes a first filter section for transmitting a first polarization component vibrating in a first direction and shading a second polarization component vibrating in a second direction orthogonal to the first direction in the subject luminous flux, and a second filter section for shading the first polarization component and transmitting the second polarization component in the subject luminous flux and which is arranged on an optical path of the subject luminous flux; and an imaging unit which is connected to the eyepiece and includes an imaging element receiving the first polarization component and the second polarization component.
Abstract translation: 要解决的问题：提供一种用于以简单结构获取被摄体的立体图像而不扩大装置的成像装置。 解决方案：成像设备包括：镜筒，其包括目镜部分并透射被摄体光通量; 偏振滤波器，其包括：第一滤波器部分，用于传输在第一方向上振动的第一偏振分量，并在与所述对象光通量中的与所述第一方向正交的第二方向上振动的第二偏振分量遮蔽;以及第二滤光器部分， 第一偏振分量并且传送目标光通量中的第二偏振分量并且被布置在目标光通量的光路上; 以及连接到目镜并包括接收第一偏振分量和第二偏振分量的成像元件的成像单元。 版权所有（C）2013，JPO＆INPIT
-
公开(公告)号：JP2012054856A
公开(公告)日：2012-03-15
申请号：JP2010197484
申请日：2010-09-03
Inventor： SATO SHUZO , OTANI EIJI , OZAWA KEN , KOBAYASHI SEIJI
CPC classification number: G02B5/3058 , G03B35/08 , G03B35/26 , H04N13/0217 , H04N13/0257
Abstract: PROBLEM TO BE SOLVED: To provide an imaging method capable of suppressing occurrence of binocular rivalry and preventing significant deterioration of the amount of light reaching an imaging element.SOLUTION: An imaging method using an imaging device comprises an optical system and an imaging element array for converting light passing through the optical system to electric signals. When a pixel group composed of unit pixel rows selected for every two or more rows is set to a first pixel group PG, imaging elements composing the first pixel group are set to a first imaging element group 41, and a pixel group composed of a second imaging element group 42 composed of imaging elements not included in the first imaging element group 41 is set to a second pixel group PG, parallax information for obtaining a stereoscopic image is acquired in the first imaging element group 41, image information for obtaining an image is acquired in the second imaging element group 42, image information is acquired at pixels where the parallax information in the first imaging element group 41 is acquired based on the acquired image information, and thereafter the stereoscopic image is obtained from the parallax information and the image information at all pixels.
Abstract translation: 要解决的问题：提供一种能够抑制双目对抗的发生并防止到达成像元件的光量的显着劣化的成像方法。 解决方案：使用成像装置的成像方法包括光学系统和用于将通过光学系统的光转换成电信号的成像元件阵列。 当为每两行或更多行选择的由单位像素行组成的像素组被设置为第一像素组PG
1 时，将构成第一像素组的成像元件设置为第一像素组 成像元件组41和由不包括在第一成像元件组41中的成像元件组成的第二成像元件组42的像素组被设置为第二像素组PG 2 ，在第一摄像元件组41中取得用于获得立体图像的视差信息，在第二摄像元件组42中取得图像获取图像信息，在第一成像元件组中的视差信息的像素处获取图像信息 基于所获取的图像信息获取组41，然后从所有像素的视差信息和图像信息获得立体图像。 版权所有（C）2012，JPO＆INPIT
-
-
-
-
-
-
-
-
-
Search Results
116
records
(took 0.027 seconds)
