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公开(公告)号:AU2021203662B2
公开(公告)日:2022-12-01
申请号:AU2021203662
申请日:2021-06-04
Applicant: STAMICARBON
Inventor: HIGGINS BRIAN SAYRE , TATE III JOHN MARSHALL , YATES ROBERT ARTHUR , POMERLEAU MARCEL JULIEN , HEON JON MICHAEL , DIRKX WILFRIED MARC RENAAT , COLOMA GONZÁLEZ JUAN
IPC: B01D47/06 , B01D47/10 , B01D53/58 , C05C9/00 , C07C273/16
Abstract: Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m/h) / (m/h). The disclosure also pertains to a prilling tower having a gas stream treatment system comprising a Venturi ejector at the top of the prilling tower, and to a method of modifying an existing prilling tower.
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公开(公告)号:AU2017262812A1
公开(公告)日:2018-12-06
申请号:AU2017262812
申请日:2017-05-09
Applicant: STAMICARBON
Inventor: HIGGINS BRIAN SAYRE , TATE III JOHN MARSHALL , YATES ROBERT ARTHUR , POMERLEAU MARCEL JULIEN , HEON JON MICHAEL , DIRKX WILFRIED MARC RENAAT , COLOMA GONZÁLEZ JUAN
IPC: B01D47/06 , B01D47/10 , B01D53/58 , C05C9/00 , C07C273/16
Abstract: Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 2 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m³/h) / (m³/h). The disclosure also pertains to a prilling tower having a gas stream treatment system comprising a Venturi ejector at the top of the prilling tower, and to a method of modifying an existing prilling tower.
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公开(公告)号:PL3016731T3
公开(公告)日:2018-07-31
申请号:PL14739266
申请日:2014-07-04
Applicant: STAMICARBON
IPC: B01D47/06 , B01D47/10 , C07C273/02
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公开(公告)号:CA3023284A1
公开(公告)日:2017-11-16
申请号:CA3023284
申请日:2017-05-09
Applicant: STAMICARBON
Inventor: HIGGINS BRIAN SAYRE , TATE JOHN MARSHALL , YATES ROBERT ARTHUR , POMERLEAU MARCEL JULIEN , HEON JON MICHAEL , DIRKX WILFRIED MARC RENAAT , COLOMA GONZALEZ JUAN
IPC: B01D47/06 , B01D47/10 , B01D53/58 , C05C9/00 , C07C273/16
Abstract: Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 2 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m³/h) / (m³/h). The disclosure also pertains to a prilling tower having a gas stream treatment system comprising a Venturi ejector at the top of the prilling tower, and to a method of modifying an existing prilling tower.
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公开(公告)号:MX2016000137A
公开(公告)日:2016-03-01
申请号:MX2016000137
申请日:2014-07-04
Applicant: STAMICARBON
IPC: B01D47/06 , B01D47/10 , C07C273/02
Abstract: Se describe un método para la eliminación de polvo de urea del gas residual de una sección de acabado (1) de una planta de producción de urea, el método comprende someter el gas residual a enfriamiento con agua (06) para producir gas residual enfriado, y someter el gas residual enfriado a depuración mediante el uso de al menos un depurador tipo Venturi (11); como resultado, se alcanza una menor caída de presión sobre el depurador, y un crecimiento más eficiente de las partículas de urea, que facilita la eliminación de éstas.
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公开(公告)号:AU2014284776A1
公开(公告)日:2016-02-04
申请号:AU2014284776
申请日:2014-07-04
Applicant: STAMICARBON
IPC: B01D47/06 , B01D47/10 , C07C273/02
Abstract: Disclosed is a method for the removal of urea dust from the off- gas of a finishing section (1) of a urea production plant, the method comprises subjecting the off-gas to quenching with water (06) so as to produce quenched off-gas, and subjecting the quenched off-gas to scrubbing using at least one venturi scrubber (11). As a result, a lower pressure drop over the scrubber is attained, and a more efficient growth of urea particles, facilitating the removal thereof.
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公开(公告)号:AU2020278868A1
公开(公告)日:2021-12-23
申请号:AU2020278868
申请日:2020-05-22
Applicant: STAMICARBON
Inventor: PUCI GIUSY ELISA , DIRKX WILFRIED MARC RENAAT
IPC: B01D47/05 , B01D47/06 , B01D47/10 , B01D47/12 , C07C273/16
Abstract: Disclosed is a urea finishing method including an off-gas treatment, the method comprising urea finishing and supplying the off-gas to a quenching zone and to a scrub column comprising a sump and a venturi stage, wherein the sump has a split sump configuration with two compartments.
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公开(公告)号:AU2021203662A1
公开(公告)日:2021-07-01
申请号:AU2021203662
申请日:2021-06-04
Applicant: STAMICARBON
Inventor: HIGGINS BRIAN SAYRE , TATE III JOHN MARSHALL , YATES ROBERT ARTHUR , POMERLEAU MARCEL JULIEN , HEON JON MICHAEL , DIRKX WILFRIED MARC RENAAT , COLOMA GONZÁLEZ JUAN
IPC: B01D47/06 , B01D47/10 , B01D53/58 , C05C9/00 , C07C273/16
Abstract: Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m/h) / (m/h). The disclosure also pertains to a prilling tower having a gas stream treatment system comprising a Venturi ejector at the top of the prilling tower, and to a method of modifying an existing prilling tower.
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公开(公告)号:PL3454971T3
公开(公告)日:2020-11-30
申请号:PL17727414
申请日:2017-05-09
Applicant: STAMICARBON
Inventor: HIGGINS BRIAN SAYRE , TATE III JOHN MARSHALL , YATES ROBERT ARTHUR , POMERLEAU MARCEL JULIEN , HEON JON MICHAEL , DIRKX WILFRIED MARC RENAAT , COLOMA GONZÁLEZ JUAN
IPC: B01D47/06 , B01D47/10 , B01D53/58 , C05C9/00 , C07C273/16
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公开(公告)号:CA3141500A1
公开(公告)日:2020-11-26
申请号:CA3141500
申请日:2020-05-22
Applicant: STAMICARBON
Inventor: PUCI GIUSY ELISA , DIRKX WILFRIED MARC RENAAT
Abstract: Disclosed is a urea finishing method including an off-gas treatment, the method comprising urea finishing and supplying the off-gas to a quenching zone and to a scrub column comprising a sump and a venturi stage, wherein the sump has a split sump configuration with two compartments.
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