公开(公告)号：EA036749B1

公开(公告)日：2020-12-16

申请号：EA201892569

申请日：2017-05-09

Applicant: STAMICARBON

Inventor： HIGGINS BRIAN SAYRE ,  TATE JOHN MARSHALL III ,  YATES ROBERT ARTHUR ,  POMERLEAU MARCEL JULIEN ,  HEON JON MICHAEL ,  DIRKX WILFRIED MARC RENAAT ,  COLOMA GONZALEZ JUAN

IPC: B01D47/06 ,  B01D47/10 ,  B01D53/58 ,  C05C9/00 ,  C07C273/16

Abstract: Изобретениеотноситсяк системеочисткипотокагаза, содержащейдвепоследовательныеступениВентури, причемкаждаяизуказанныхступенейВентурисодержитгоризонтальнорасположенныйэжекторВентури, содержащийсужающуюсячасть, горловину, расширяющуюсячастьтрубкии форсункудляраспыленияв указаннуюгорловину, причемуказанныеступениВентурирасположеныоднанаддругой, иприэтомкаждаяступеньВентурисодержитконтуррециркуляцииочищающейжидкости, содержащийнасосдляподачиподдавлениеми рециркуляцииочищающейжидкостик указаннойфорсунке, причемуказанныеступениВентуриимеютотдельныеконтурырециркуляции, причемуказаннаясистемасодержитраспылительмеждупервойи расположеннойнижепопотокувторойступеньюВентуридляраспыленияводногораствора, имеющегоболеевысокуюконцентрациюводы, чемочищающаяжидкостьпервойступениВентури. Изобретениетакжеотноситсяк различнымвариантамбашниприллирования, имеющейсистемуочисткипотокагаза, содержащуюэжекторВентури, вверхнейчастибашниприллирования, ик различнымвариантамспособамодификациисуществующейбашниприллирования.

公开(公告)号：AU2017262812B2

公开(公告)日：2020-02-06

申请号：AU2017262812

申请日：2017-05-09

Applicant: STAMICARBON

Inventor： HIGGINS BRIAN SAYRE ,  TATE III JOHN MARSHALL ,  YATES ROBERT ARTHUR ,  POMERLEAU MARCEL JULIEN ,  HEON JON MICHAEL ,  DIRKX WILFRIED MARC RENAAT ,  COLOMA GONZÁLEZ JUAN

IPC: B01D47/06 ,  B01D47/10 ,  B01D53/58 ,  C05C9/00 ,  C07C273/16

Abstract: Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 2 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m³/h) / (m³/h). The disclosure also pertains to a prilling tower having a gas stream treatment system comprising a Venturi ejector at the top of the prilling tower, and to a method of modifying an existing prilling tower.

公开(公告)号：AU2021203662B2

公开(公告)日：2022-12-01

申请号：AU2021203662

申请日：2021-06-04

Applicant: STAMICARBON

Inventor： HIGGINS BRIAN SAYRE ,  TATE III JOHN MARSHALL ,  YATES ROBERT ARTHUR ,  POMERLEAU MARCEL JULIEN ,  HEON JON MICHAEL ,  DIRKX WILFRIED MARC RENAAT ,  COLOMA GONZÁLEZ JUAN

IPC: B01D47/06 ,  B01D47/10 ,  B01D53/58 ,  C05C9/00 ,  C07C273/16

Abstract: Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m/h) / (m/h). The disclosure also pertains to a prilling tower having a gas stream treatment system comprising a Venturi ejector at the top of the prilling tower, and to a method of modifying an existing prilling tower.

公开(公告)号：AU2017262812A1

公开(公告)日：2018-12-06

申请号：AU2017262812

申请日：2017-05-09

Applicant: STAMICARBON

Inventor： HIGGINS BRIAN SAYRE ,  TATE III JOHN MARSHALL ,  YATES ROBERT ARTHUR ,  POMERLEAU MARCEL JULIEN ,  HEON JON MICHAEL ,  DIRKX WILFRIED MARC RENAAT ,  COLOMA GONZÁLEZ JUAN

IPC: B01D47/06 ,  B01D47/10 ,  B01D53/58 ,  C05C9/00 ,  C07C273/16

Abstract: Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 2 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m³/h) / (m³/h). The disclosure also pertains to a prilling tower having a gas stream treatment system comprising a Venturi ejector at the top of the prilling tower, and to a method of modifying an existing prilling tower.

公开(公告)号：CA3023284A1

公开(公告)日：2017-11-16

申请号：CA3023284

申请日：2017-05-09

Applicant: STAMICARBON

Inventor： HIGGINS BRIAN SAYRE ,  TATE JOHN MARSHALL ,  YATES ROBERT ARTHUR ,  POMERLEAU MARCEL JULIEN ,  HEON JON MICHAEL ,  DIRKX WILFRIED MARC RENAAT ,  COLOMA GONZALEZ JUAN

IPC: B01D47/06 ,  B01D47/10 ,  B01D53/58 ,  C05C9/00 ,  C07C273/16

Abstract: Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 2 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m³/h) / (m³/h). The disclosure also pertains to a prilling tower having a gas stream treatment system comprising a Venturi ejector at the top of the prilling tower, and to a method of modifying an existing prilling tower.

公开(公告)号：AU2021203662A1

公开(公告)日：2021-07-01

申请号：AU2021203662

申请日：2021-06-04

Applicant: STAMICARBON

Inventor： HIGGINS BRIAN SAYRE ,  TATE III JOHN MARSHALL ,  YATES ROBERT ARTHUR ,  POMERLEAU MARCEL JULIEN ,  HEON JON MICHAEL ,  DIRKX WILFRIED MARC RENAAT ,  COLOMA GONZÁLEZ JUAN

IPC: B01D47/06 ,  B01D47/10 ,  B01D53/58 ,  C05C9/00 ,  C07C273/16

Abstract: Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m/h) / (m/h). The disclosure also pertains to a prilling tower having a gas stream treatment system comprising a Venturi ejector at the top of the prilling tower, and to a method of modifying an existing prilling tower.

公开(公告)号：PL3454971T3

公开(公告)日：2020-11-30

申请号：PL17727414

申请日：2017-05-09

Applicant: STAMICARBON

Inventor： HIGGINS BRIAN SAYRE ,  TATE III JOHN MARSHALL ,  YATES ROBERT ARTHUR ,  POMERLEAU MARCEL JULIEN ,  HEON JON MICHAEL ,  DIRKX WILFRIED MARC RENAAT ,  COLOMA GONZÁLEZ JUAN

IPC: B01D47/06 ,  B01D47/10 ,  B01D53/58 ,  C05C9/00 ,  C07C273/16

公开(公告)号：AU2019210517B2

公开(公告)日：2021-07-29

申请号：AU2019210517

申请日：2019-07-30

Applicant: STAMICARBON

Inventor： HIGGINS BRIAN SAYRE ,  TATE III JOHN MARSHALL ,  YATES ROBERT ARTHUR ,  POMERLEAU MARCEL JULIEN ,  HEON JON MICHAEL ,  DIRKX WILFRIED MARC RENAAT ,  COLOMA GONZÁLEZ JUAN

IPC: B01D47/06 ,  B01D47/10 ,  B01D53/58 ,  C05C9/00 ,  C07C273/16

Abstract: SUBMICRON PARTICLE REMOVAL FROM GAS STREAMS Abstract Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m3 /h) / (m/h). The disclosure also pertains to a prilling tower having a gas stream treatment system comprising a Venturi ejector at the top of the prilling tower, and to a method of modifying an existing prilling tower.

公开(公告)号：HRP20201312T1

公开(公告)日：2020-12-11

申请号：HRP20201312

申请日：2020-08-21

Applicant: STAMICARBON

Inventor： HIGGINS BRIAN SAYRE ,  TATEIII JOHN MARSHALL ,  YATES ROBERT ARTHUR ,  POMERLEAU MARCEL JULIEN ,  HEON JON MICHAEL ,  DIRKX WILFRIED MARC RENAAT ,  COLOMA GONZÁLEZ JUAN

IPC: B01D47/06 ,  B01D47/10 ,  B01D53/58 ,  C05C9/00 ,  C07C273/16

公开(公告)号：CA3023284C

公开(公告)日：2020-01-14

申请号：CA3023284

申请日：2017-05-09

Applicant: STAMICARBON

Inventor： HIGGINS BRIAN SAYRE ,  TATE JOHN MARSHALL ,  YATES ROBERT ARTHUR ,  POMERLEAU MARCEL JULIEN ,  HEON JON MICHAEL ,  DIRKX WILFRIED MARC RENAAT ,  COLOMA GONZALEZ JUAN

IPC: B01D47/06 ,  B01D47/10 ,  B01D53/58 ,  C05C9/00 ,  C07C273/16

Abstract: Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m3/h) / (m3/h). The disclosure also pertains to a prilling tower having a gas stream treatment system comprising a Venturi ejector at the top of the prilling tower, and to a method of modifying an existing prilling tower.