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公开(公告)号：AU2020278868B2
公开(公告)日：2022-12-01
申请号：AU2020278868
申请日：2020-05-22
Applicant: STAMICARBON
Inventor： PUCI GIUSY ELISA , DIRKX WILFRIED MARC RENAAT
IPC: B01D47/05 , B01D47/06 , B01D47/10 , B01D47/12 , C07C273/16
Abstract: Disclosed is a urea finishing method including an off-gas treatment, the method comprising urea finishing and supplying the off-gas to a quenching zone and to a scrub column comprising a sump and a venturi stage, wherein the sump has a split sump configuration with two compartments.
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公开(公告)号：EA036749B1
公开(公告)日：2020-12-16
申请号：EA201892569
申请日：2017-05-09
Applicant: STAMICARBON
Inventor： HIGGINS BRIAN SAYRE , TATE JOHN MARSHALL III , YATES ROBERT ARTHUR , POMERLEAU MARCEL JULIEN , HEON JON MICHAEL , DIRKX WILFRIED MARC RENAAT , COLOMA GONZALEZ JUAN
IPC: B01D47/06 , B01D47/10 , B01D53/58 , C05C9/00 , C07C273/16
Abstract: Изобретениеотноситсяк системеочисткипотокагаза, содержащейдвепоследовательныеступениВентури, причемкаждаяизуказанныхступенейВентурисодержитгоризонтальнорасположенныйэжекторВентури, содержащийсужающуюсячасть, горловину, расширяющуюсячастьтрубкии форсункудляраспыленияв указаннуюгорловину, причемуказанныеступениВентурирасположеныоднанаддругой, иприэтомкаждаяступеньВентурисодержитконтуррециркуляцииочищающейжидкости, содержащийнасосдляподачиподдавлениеми рециркуляцииочищающейжидкостик указаннойфорсунке, причемуказанныеступениВентуриимеютотдельныеконтурырециркуляции, причемуказаннаясистемасодержитраспылительмеждупервойи расположеннойнижепопотокувторойступеньюВентуридляраспыленияводногораствора, имеющегоболеевысокуюконцентрациюводы, чемочищающаяжидкостьпервойступениВентури. Изобретениетакжеотноситсяк различнымвариантамбашниприллирования, имеющейсистемуочисткипотокагаза, содержащуюэжекторВентури, вверхнейчастибашниприллирования, ик различнымвариантамспособамодификациисуществующейбашниприллирования.
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公开(公告)号：AU2017262812B2
公开(公告)日：2020-02-06
申请号：AU2017262812
申请日：2017-05-09
Applicant: STAMICARBON
Inventor： HIGGINS BRIAN SAYRE , TATE III JOHN MARSHALL , YATES ROBERT ARTHUR , POMERLEAU MARCEL JULIEN , HEON JON MICHAEL , DIRKX WILFRIED MARC RENAAT , COLOMA GONZÁLEZ JUAN
IPC: B01D47/06 , B01D47/10 , B01D53/58 , C05C9/00 , C07C273/16
Abstract: Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 2 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m³/h) / (m³/h). The disclosure also pertains to a prilling tower having a gas stream treatment system comprising a Venturi ejector at the top of the prilling tower, and to a method of modifying an existing prilling tower.
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公开(公告)号：HRP20180430T1
公开(公告)日：2018-05-04
申请号：HRP20180430
申请日：2018-03-13
Applicant: STAMICARBON
IPC: B01D47/06 , B01D47/10 , C07C273/02
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公开(公告)号：CA2917304A1
公开(公告)日：2015-01-08
申请号：CA2917304
申请日：2014-07-04
Applicant: STAMICARBON
IPC: B01D47/06 , B01D47/10 , C07C273/02
Abstract: Disclosed is a method for the removal of urea dust from the off- gas of a finishing section (1) of a urea production plant, the method comprises subjecting the off-gas to quenching with water (06) so as to produce quenched off-gas, and subjecting the quenched off-gas to scrubbing using at least one venturi scrubber (11). As a result, a lower pressure drop over the scrubber is attained, and a more efficient growth of urea particles, facilitating the removal thereof.
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Patent Agency Ranking
公开(公告)号：AU2019210517B2
公开(公告)日：2021-07-29
申请号：AU2019210517
申请日：2019-07-30
Applicant: STAMICARBON
Inventor： HIGGINS BRIAN SAYRE , TATE III JOHN MARSHALL , YATES ROBERT ARTHUR , POMERLEAU MARCEL JULIEN , HEON JON MICHAEL , DIRKX WILFRIED MARC RENAAT , COLOMA GONZÁLEZ JUAN
IPC: B01D47/06 , B01D47/10 , B01D53/58 , C05C9/00 , C07C273/16
Abstract: SUBMICRON PARTICLE REMOVAL FROM GAS STREAMS Abstract Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m3 /h) / (m/h). The disclosure also pertains to a prilling tower having a gas stream treatment system comprising a Venturi ejector at the top of the prilling tower, and to a method of modifying an existing prilling tower.
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公开(公告)号：HRP20201312T1
公开(公告)日：2020-12-11
申请号：HRP20201312
申请日：2020-08-21
Applicant: STAMICARBON
Inventor： HIGGINS BRIAN SAYRE , TATEIII JOHN MARSHALL , YATES ROBERT ARTHUR , POMERLEAU MARCEL JULIEN , HEON JON MICHAEL , DIRKX WILFRIED MARC RENAAT , COLOMA GONZÁLEZ JUAN
IPC: B01D47/06 , B01D47/10 , B01D53/58 , C05C9/00 , C07C273/16
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公开(公告)号：CA3023284C
公开(公告)日：2020-01-14
申请号：CA3023284
申请日：2017-05-09
Applicant: STAMICARBON
Inventor： HIGGINS BRIAN SAYRE , TATE JOHN MARSHALL , YATES ROBERT ARTHUR , POMERLEAU MARCEL JULIEN , HEON JON MICHAEL , DIRKX WILFRIED MARC RENAAT , COLOMA GONZALEZ JUAN
IPC: B01D47/06 , B01D47/10 , B01D53/58 , C05C9/00 , C07C273/16
Abstract: Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m3/h) / (m3/h). The disclosure also pertains to a prilling tower having a gas stream treatment system comprising a Venturi ejector at the top of the prilling tower, and to a method of modifying an existing prilling tower.
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公开(公告)号：AU2019210517A1
公开(公告)日：2019-08-15
申请号：AU2019210517
申请日：2019-07-30
Applicant: STAMICARBON
Inventor： HIGGINS BRIAN SAYRE , TATE III JOHN MARSHALL , YATES ROBERT ARTHUR , POMERLEAU MARCEL JULIEN , HEON JON MICHAEL , DIRKX WILFRIED MARC RENAAT , COLOMA GONZÁLEZ JUAN
IPC: B01D47/06 , B01D47/10 , B01D53/58 , C05C9/00 , C07C273/16
Abstract: SUBMICRON PARTICLE REMOVAL FROM GAS STREAMS Abstract Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m3 /h) / (m/h). The disclosure also pertains to a prilling tower having a gas stream treatment system comprising a Venturi ejector at the top of the prilling tower, and to a method of modifying an existing prilling tower.
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公开(公告)号：AU2014284776B2
公开(公告)日：2018-01-18
申请号：AU2014284776
申请日：2014-07-04
Applicant: STAMICARBON
IPC: B01D47/06 , B01D47/10 , C07C273/02
Abstract: Disclosed is a method for the removal of urea dust from the off- gas of a finishing section (1) of a urea production plant, the method comprises subjecting the off-gas to quenching with water (06) so as to produce quenched off-gas, and subjecting the quenched off-gas to scrubbing using at least one venturi scrubber (11). As a result, a lower pressure drop over the scrubber is attained, and a more efficient growth of urea particles, facilitating the removal thereof.
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