STABILIZED POLYPHENYLENE SULFIDE
    11.
    发明专利

    公开(公告)号:JPS57205425A

    公开(公告)日:1982-12-16

    申请号:JP8966281

    申请日:1981-06-12

    Abstract: PURPOSE:A polyphenylene sulfide low in content of acetone-soluble oligomer and content of nitrogen in oligomer and excellent in heat stability, prepared by reacting an alkali sulfide with a dihalobenzene in a polar organic solvent under a specified reaction condition. CONSTITUTION:An alkali sulfide (e.g., sodium sulfide) and a dihalobenzene (e.g., p-dichlorobenzene) are subjected to a polymerization reaction in a polar organic solvent (e.g., N-methylpyrrolidone). In this reaction, the following measure are taken: the heat hystereis in the polymerization and recovery processes is decreased, the polymer concentration during the polymerization is about 14- 29%, a polymerization aid such as lithium acetate is used, and a filter is used when the polymerization system is introduced into water to reprecipitate the polymer or to wash off inorganic salts. In this way, there is produced a stabilized polyphenylene sulfide consisting mainly of a structure unit of the formula and having an acetone-soluble oligomer content of below 2% and a content of nitrogen in oligomer of below 1.5%.

    SMOOTHHSURFACE FILM
    12.
    发明专利

    公开(公告)号:JPS5534968A

    公开(公告)日:1980-03-11

    申请号:JP10888778

    申请日:1978-09-05

    Abstract: PURPOSE:To provide two-axis-oriented poly-p-phenylene sulfide film, in which the surface coarseness is made within a specified range and the coefficient of friction is reduced, and which can be used for photographic film base, magnetic recording base, and electric insulator base. CONSTITUTION:Poly-p-phenylene sulfide, more than 90mol% in the structural units, is mixed with fine particles, average particle diameter less than 20mu, of silica, alumina, etc. By this, two-axis-oriented smooth-surface film is obtained as desired, with coefficient of friction between films less than 0.75 (at 20 deg.C, and relative humidity 70%), average surface coarseness 0.90mu/5mm or less.

    PRODUCTION OF POLYPHENYLENE SULFIDE

    公开(公告)号:JPH1087831A

    公开(公告)日:1998-04-07

    申请号:JP13902097

    申请日:1997-05-28

    Abstract: PROBLEM TO BE SOLVED: To provide a process for producing PPS, whereby granular PPS can be produced in a shortened cycle and the recovery of unreacted monomers can be facilitated. SOLUTION: This invention provides a process for producing a granular polyphenylene sulfide by polymerizing at least one sulfur source and a polyhaloaromatic compound in an organic polar solvent in a hermetically sealed container and slowly cooling the reaction mixture in the latter stage of the polymerization reaction, which comprises releasing the pressure in the container while keeping the reaction product in the state in which at least 50% of the polymer is in the form of solid granules as a result of the slow cooling in the latter stage of the polymerization and the pressure in the sealed container is 0.39×10 Pa or above, whereupon the polymerization mixture comprising a gaseous phase and a liquid phase is degassed to decrease the pressure in the container to 0.20×10 Pa or above.

    PRODUCTION OF POLYARYLENE SULFIDE
    14.
    发明专利

    公开(公告)号:JPH07233256A

    公开(公告)日:1995-09-05

    申请号:JP2344891

    申请日:1991-02-18

    Abstract: PURPOSE:To economically produce a polyarylene sulfide which has a smaller amount of oligomers and can give a composition excellent in mechanical strengths when combined with an inorganic filler or another resin. CONSTITUTION:This production process is one comprising heat-treating a polyarylene sulfide obtained by reacting a polyhaloaromatic compound with an alkali metal sulfide in a polar organic solvent at a temperature from 180 deg.C to below the melting point in an atmosphere of an inert gas. The above heat treatment is performed under such condition that the melt flow rates before and after treatment satisfy the relationship, 0.5

    MAGNETIC RECORDING MEDIUM
    16.
    发明专利

    公开(公告)号:JPS6080126A

    公开(公告)日:1985-05-08

    申请号:JP18865083

    申请日:1983-10-07

    Abstract: PURPOSE:To obtain a floppy disk having excellent positional stability to environmental changes by providing an undercoating layer having specified surface roughness and thickness on the surface of a specified biaxially oriented poly-p- phenylene sulfide film. CONSTITUTION:An undercoating layer having =70mol% repeating unit shown by the formula and having deg.C thermal expansion coefficient at 25 deg.C in the direction of the main orientation axis. A polyurethane resin, an epoxy resin, etc. or a mixed resin of >=2 kinds can be used as the undercoating layer. An additive such as inorganic fine particles can be added to the undercoating layer to obtain smoothness and to shade the light. A magnetic layer is formed on the undercoating layer, and the floppy disk with less dropouts having excellent dimensional stability for the change of temp. and humidity and high track density is obtained.

    MAGNETIC RECORDING MEDIUM
    17.
    发明专利

    公开(公告)号:JPS58168655A

    公开(公告)日:1983-10-05

    申请号:JP5189582

    申请日:1982-03-30

    Abstract: PURPOSE:To provide a magnetic recording material which has a high practical adhesion between a ferromagnetic layer and a substrate, and high overall endurance for use under severe conditions, by providing a ferromagnetic layer composed of metal (compd.) on a specified high-molecular material molding. CONSTITUTION:A polymer having an intrinsic viscosity of 0.5 or above and contg. at least 50mol% of a (chlorine-substd.) arom. polyamide of the formula (wherein m, n are each 0-3) is molded to obtain a high-molecular material molding in the form of film or sheet which has a thickness of 1mu-1mm. and tensile modulus is 400-10,000kg/mm. and in which 10% heat shrinkage factor at 200 deg.C is 0-10% under no load conditions. Metal (compd.) such as Ni, Co, Cr or Fe is deposited in a thickness of 0.01-1mu on one side of the molding to form a ferromagnetic layer. EFFECT:A magnetic recording material which has excellent high strength, elongation and tensile modulus and good dimensional stability to changes in temperature and environment can be obtd.

    MANUFACTURE OF POLY-P-PHENYLENESULFIDE

    公开(公告)号:JPS57205118A

    公开(公告)日:1982-12-16

    申请号:JP8966381

    申请日:1981-06-12

    Abstract: PURPOSE:To manufacture a film having an excellent dimensional stability, by heat-treating a biaxially stretched poly-p-phenylenesulfide film at a specified temperature under tension, then fixing again and heat treating it at a specified high temperature. CONSTITUTION:A film composed of a biaxially stretched poly-p-phenylenesulfide is at first heat treated at 150-280 deg.C under tension. After that, it is heated at a temperature higher than 150-280 deg.C and below a melting point of the film at a relaxed state or at a constant length or under a slight stretch. An obtained film has a good dimensional stability and is useful for a printed circuit material and an optical image recording material.

    POLYYPPPHENYLENE SULFIDE FILM
    19.
    发明专利

    公开(公告)号:JPS5662121A

    公开(公告)日:1981-05-27

    申请号:JP13755479

    申请日:1979-10-26

    Abstract: PURPOSE:To obtain a ply-p-phenylene sulfide film excellent in the thermal, mechanical and dimensional stability including phenylene sulfide as a main structural unit and having specified melt viscosity, relative crystallization, degree dimension of microcrystal and orientation. CONSTITUTION:Sodium sulfide and the like and p-dihalobenzene such as p-dichlorobenzene are polymerized under pressure in a high-boiling polar solvent to obtain a polymer containing more than 90mol% of a structural unit indicated by the molecular formula. This polymer is melt-extruded and then cooled at a speed higher than 10 deg.C/sec. to form an amorphous film. The amorphous film thus obtained is subjected to a biaxial stretching preferably at a temperature of 85 deg.C-110 deg.C so as to have an enlarged area 8.5-21 times as large as the original one, and further to a heat setting in a stretched state at a temperature of 200 deg.C-275 deg.C for 1-300sec. Thus a desired quality of film can be obtained having a melt viscosity of 100- 60,000cgs. at shear rate of 200(sec) , a relative crystalization degree of 5-35, a dimension of microcrystal of 40-150Angstrom and an orientation in the edge and end directions of 0.1-0.6.

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