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公开(公告)号：CA2386220A1
公开(公告)日：2001-04-12
申请号：CA2386220
申请日：2000-10-02
Applicant: TROJAN TECHN INC
Inventor： SASGES MICHAEL , VERDUN ALEX , FANG GANG , HOUGHTON JOHN , LEM JOSEPH , LAWRYSHYN YURI
Abstract: There is disclosed an optical radiation sensor system. The system includes a sensor device (140) and a cleaning device (115). The sensor device detects a nd responds to radiation from a radiation field (170) and includes a surface (155) that is movable with respect to the radiation field between a first position in which the surface is in the radiation field and a second positio n in which at least a portion of the surface is out of the radiation field. Th e cleaning device operates to remove fouling materials from at least a portion of the surface in the second position. The cleaning device may be a chemical cleaning device, a mechanical cleaning device or a combined chemical/mechanical device.
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公开(公告)号：DE60016789D1
公开(公告)日：2005-01-20
申请号：DE60016789
申请日：2000-10-02
Applicant: TROJAN TECHN INC
Inventor： FANG GANG , HOUGHTON JOHN , LAWRYSHYN YURI , LEM JOSEPH , VERDUN ALEX , SASGES MICHAEL
Abstract: There is disclosed an optical radiation sensor system. The system includes a sensor device and a cleaning device. The sensor device detects and responds to radiation from a radiation field and includes a surface that is movable with respect to the radiation field between a first position in which the surface is in the radiation field and a second position in which at least a portion of the surface is out of the radiation field. The cleaning device operates to remove fouling materials from at least a portion of the surface in the second position. The cleaning device may be a chemical cleaning device, a mechanical cleaning device or a combined chemical/mechanical device.
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公开(公告)号：AU775441B2
公开(公告)日：2004-07-29
申请号：AU6551500
申请日：2000-08-11
Applicant: TROJAN TECHN INC
Inventor： FANG GANG , LAWRYSHYN YURI , MAARSCHALKERWEERD JAN M , PENHALE DOUGLAS
Abstract: A cleaning apparatus for use in a fluid treatment system comprising a radiation source assembly, the cleaning apparatus comprising: at least one cleaning sleeve (300) in sliding engagement with the exterior of the radiation source assembly (150); a cleaning chamber (310) disposed in the at least one cleaning sleeve in contact with a portion of the exterior of the radiation source assembly (150) and for being supplied with a cleaning solution, the cleaning chamber comprising an opening (370) to an exterior of the cleaning sleeve; a pressure equalization member (355) disposed in the opening to provide a seal between the opening and the exterior of the cleaning sleeve, the pressure equalization member being movable in response to a pressure gradient thereacross; and drive means to translate the at least one cleaning sleeve along the exterior of the radiation source assembly. A fluid treatment device comprise the cleaning apparatus is also described.
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公开(公告)号：NO20022639L
公开(公告)日：2002-06-04
申请号：NO20022639
申请日：2002-06-04
Applicant: TROJAN TECHN INC
Inventor： OLSON DAVID A , LAWRYSHYN YURI , WRIGHT HAROLD
Abstract: An online device and method for predicting at least one fluid flow parameter in a process (which comprises a bounded flow domain having disposed therein a pre-determined matrix) includes a computer and/or process steps whereby: (i) a memory receives a database, the database comprising location information for a plurality of nodes or particle pathways in the matrix; (ii) input data is received from the process, and (iii) the at least one fluid flow parameter is calculated from the database and the input data. Preferably, structure and/or process steps are provided to adjust the database in the event that the input data does not correspond with at least one pre-determined flow state.
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公开(公告)号：NO20022639D0
公开(公告)日：2002-06-04
申请号：NO20022639
申请日：2002-06-04
Applicant: TROJAN TECHN INC
Inventor： OLSON DAVID A , LAWRYSHYN YURI , WRIGHT HAROLD
Abstract: An online device and method for predicting at least one fluid flow parameter in a process (which comprises a bounded flow domain having disposed therein a pre-determined matrix) includes a computer and/or process steps whereby: (i) a memory receives a database, the database comprising location information for a plurality of nodes or particle pathways in the matrix; (ii) input data is received from the process, and (iii) the at least one fluid flow parameter is calculated from the database and the input data. Preferably, structure and/or process steps are provided to adjust the database in the event that the input data does not correspond with at least one pre-determined flow state.
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Patent Agency Ranking
公开(公告)号：NO20022639A
公开(公告)日：2002-06-04
申请号：NO20022639
申请日：2002-06-04
Applicant: TROJAN TECHN INC
Inventor： OLSON DAVID A , LAWRYSHYN YURI , WRIGHT HAROLD
CPC classification number: C02F1/325 , C02F1/008 , C02F1/32 , C02F2201/326 , G01F1/00
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公开(公告)号：CA2338879A1
公开(公告)日：2000-12-07
申请号：CA2338879
申请日：2000-05-26
Applicant: TROJAN TECHN INC
Inventor： PENHALE DOUGLAS , LEM JOSEPH , DALL ARMI VIVIAN , FANG GANG , LAWRYSHYN YURI
Abstract: A cleaning apparatus (10) for a radiation source assembly (35) in a fluid treatment system is described. The cleaning apparatus comprises cleaning chamber (20) and a second chamber (25, 30) independent of the cleaning chamb er which defines a fluid (typically water) buffer layer to obviate or mitigate cleaning fluid from the cleaning chamber leaking into the fluid being treate d. The fluid treatment system is particularly useful for us in clean water applications in which ultraviolet radiation is used to treat the water while having the advantages of in situ cleaning of the radiation source whe n it becomes fouled.
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公开(公告)号：CA2386220C
公开(公告)日：2007-05-08
申请号：CA2386220
申请日：2000-10-02
Applicant: TROJAN TECHN INC
Inventor： FANG GANG , HOUGHTON JOHN , VERDUN ALEX , LAWRYSHYN YURI , LEM JOSEPH , SASGES MICHAEL
Abstract: There is disclosed an optical radiation sensor system. The system includes a sensor device (140) and a cleaning device (115). The sensor device detects a nd responds to radiation from a radiation field (170) and includes a surface (155) that is movable with respect to the radiation field between a first position in which the surface is in the radiation field and a second positio n in which at least a portion of the surface is out of the radiation field. Th e cleaning device operates to remove fouling materials from at least a portion of the surface in the second position. The cleaning device may be a chemical cleaning device, a mechanical cleaning device or a combined chemical/mechanical device.
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公开(公告)号：DE60016789T2
公开(公告)日：2006-02-23
申请号：DE60016789
申请日：2000-10-02
Applicant: TROJAN TECHN INC
Inventor： FANG GANG , HOUGHTON JOHN , LAWRYSHYN YURI , LEM JOSEPH , VERDUN ALEX , SASGES MICHAEL
Abstract: There is disclosed an optical radiation sensor system. The system includes a sensor device and a cleaning device. The sensor device detects and responds to radiation from a radiation field and includes a surface that is movable with respect to the radiation field between a first position in which the surface is in the radiation field and a second position in which at least a portion of the surface is out of the radiation field. The cleaning device operates to remove fouling materials from at least a portion of the surface in the second position. The cleaning device may be a chemical cleaning device, a mechanical cleaning device or a combined chemical/mechanical device.
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公开(公告)号：AU782998B2
公开(公告)日：2005-09-15
申请号：AU7501000
申请日：2000-10-02
Applicant: TROJAN TECHN INC
Inventor： TAGHIPOUR FARIBORZ , LAWRYSHYN YURI , OLSON DAVID A , TAN ZHENG
Abstract: A fluid treatment device, particularly useful for ultraviolet radiation treatment of fluids such as water. The device comprises a housing for receiving a flow of fluid. The housing has a fluid inlet, a fluid outlet, a fluid treatment zone disposed between the fluid inlet and the fluid outlet and at least one radiation source having a longitudinal axis disposed in the fluid treatment zone substantially transverse to a direction of the flow of fluid through the housing. The fluid inlet, the fluid outlet and the fluid treatment zone are arranged substantially collinearly with respect to one another. The fluid inlet has a first opening having: (i) a cross-sectional area less than a cross-sectional area of the fluid treatment zone, and (ii) a largest diameter substantially parallel to the longitudinal axis of the at least one radiation source assembly.
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