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公开(公告)号：US11426979B2
公开(公告)日：2022-08-30
申请号：US17456165
申请日：2021-11-23
Applicant: View, Inc.
Inventor： Fabian Strong , Yashraj Bhatnagar , Abhishek Anant Dixit , Todd Martin , Robert T. Rozbicki
Abstract: Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.
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公开(公告)号：US11333948B2
公开(公告)日：2022-05-17
申请号：US16579778
申请日：2019-09-23
Applicant: View, Inc.
Inventor： Abhishek Anant Dixit , Todd Martin , Anshu A. Pradhan , Gordon Jack , Yashraj Bhatnagar
Abstract: Bus bar configurations and fabrication methods for non-rectangular shaped (e.g., triangular, trapezoidal, circular, pentagonal, hexagonal, arched, etc.) optical devices.
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公开(公告)号：US20210103195A1
公开(公告)日：2021-04-08
申请号：US17247541
申请日：2020-12-15
Applicant: View, Inc.
Inventor： Sridhar K. Kailasam , Dhairya Shrivastava , Zhiwei Cai , Robert T. Rozbicki , Dane Gillaspie , Todd Martin , Anshu A. Pradhan , Ronald M. Parker
IPC: G02F1/153
Abstract: Methods are provided for fabricating electrochromic devices that mitigate formation of short circuits under a top bus bar without predetermining where top bus bars will be applied on the device. Devices fabricated using such methods may be deactivated under the top bus bar, or may include active material under the top bus bar. Methods of fabricating devices with active material under a top bus bar include depositing a modified top bus bar, fabricating self-healing layers in the electrochromic device, and modifying a top transparent conductive layer of the device prior to applying bus bars.
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公开(公告)号：US20200041860A1
公开(公告)日：2020-02-06
申请号：US16579778
申请日：2019-09-23
Applicant: View, Inc.
Inventor： Abhishek Anant Dixit , Todd Martin , Anshu A. Pradhan , Gordon Jack , Yashraj Bhatnagar
Abstract: Bus bar configurations and fabrication methods for non-rectangular shaped (e.g., triangular, trapezoidal, circular, pentagonal, hexagonal, arched, etc.) optical devices.
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公开(公告)号：US10114265B2
公开(公告)日：2018-10-30
申请号：US14822732
申请日：2015-08-10
Applicant: View, Inc.
Inventor： Fabian Strong , Yashraj Bhatnagar , Abhishek Anant Dixit , Todd Martin , Robert T. Rozbicki
Abstract: Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.
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Patent Agency Ranking
公开(公告)号：US20170327940A1
公开(公告)日：2017-11-16
申请号：US15668631
申请日：2017-08-03
Applicant: View, Inc.
Inventor： Martin John Neumann , Que Anh Song Nguyen , Disha Mehtani , Anshu A. Pradhan , Robert T. Rozbicki , Dhairya Shrivastava , Sridhar Kailasam , Trevor Frank , Jason Satern , Todd Martin
IPC: C23C14/34 , C01G19/02 , C01G9/02 , C08L23/06 , C01B33/113
CPC classification number: C23C14/3407 , C01B33/113 , C01G9/02 , C01G19/02 , C08L23/06 , C23C14/3414 , H01J37/3414 , H01J37/3426 , H01J37/3435
Abstract: Described are methods of fabricating lithium sputter targets, lithium sputter targets, associated handling apparatus, and sputter methods including lithium targets. Various embodiments address adhesion of the lithium metal target to a support structure, avoiding and/or removing passivating coatings formed on the lithium target, uniformity of the lithium target as well as efficient cooling of lithium during sputtering. Target configurations used to compensate for non-uniformities in sputter plasma are described. Modular format lithium tiles and methods of fabrication are described. Rotary lithium sputter targets are also described.
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17.发明申请PRETREATMENT OF TRANSPARENT CONDUCTIVE OXIDE (TCO) THIN FILMS FOR IMPROVED ELECTRICAL CONTACT 审中-公开透明导电氧化物（TCO）改进电气接触薄膜的预处理公开(公告)号：US20160109777A1
公开(公告)日：2016-04-21
申请号：US14893504
申请日：2014-06-12
Applicant: VIEW, INC.
Inventor： Todd Martin , Abhishek Anant Dixit , Fabian Strong , Anshu A. Pradhan
CPC classification number: G02F1/1533 , G02F1/1523 , G02F1/155 , G02F2001/1536 , G02F2001/1555 , G02F2201/08
Abstract: Certain embodiments relate to optical devices and methods of fabricating optical devices that pre-treat a sub-layer to enable selective removal of the pre-treated sub-layer and overlying layers. Other embodiments pertain to methods of fabricating an optical device that apply a sacrificial material layer.
Abstract translation: 某些实施例涉及光学器件和制造预先处理子层以使得能够选择性地去除预处理的子层和覆盖层的光学器件的方法。 其它实施例涉及制造施加牺牲材料层的光学装置的方法。
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公开(公告)号：US20220080706A1
公开(公告)日：2022-03-17
申请号：US17456165
申请日：2021-11-23
Applicant: View, Inc.
Inventor： Fabian Strong , Yashraj Bhatnagar , Abhishek Anant Dixit , Todd Martin , Robert T. Rozbicki
Abstract: Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.
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公开(公告)号：US20200230739A1
公开(公告)日：2020-07-23
申请号：US16748638
申请日：2020-01-21
Applicant: View, Inc.
Inventor： Todd Martin
IPC: B23K26/046 , B23K26/361 , B23K26/40 , B23K26/08 , B23K26/06
Abstract: Methods of circumscribing defects in optical devices are described. A perimeter is formed about a defect by laser ablation, where the perimeter electrically isolates the defect. The perimeter does not have damage due to excess energy from the laser and thus does not create new electrical shorts.
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20.发明授权公开(公告)号：US10656492B2
公开(公告)日：2020-05-19
申请号：US14893504
申请日：2014-06-12
Applicant: VIEW, INC.
Inventor： Todd Martin , Abhishek Anant Dixit , Fabian Strong , Anshu A. Pradhan
IPC: G02F1/153 , G02F1/155 , G02F1/1523
Abstract: Certain embodiments relate to optical devices and methods of fabricating optical devices that pre-treat a sub-layer to enable selective removal of the pre-treated sub-layer and overlying layers. Other embodiments pertain to methods of fabricating an optical device that apply a sacrificial material layer.
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