CALIBRATION OF ELECTRICAL PARAMETERS IN OPTICALLY SWITCHABLE WINDOWS

    公开(公告)号:US20230019843A1

    公开(公告)日:2023-01-19

    申请号:US17946692

    申请日:2022-09-16

    Applicant: View, Inc.

    Abstract: The embodiments herein relate to methods for controlling an optical transition and the ending tint state of an optically switchable device, and optically switchable devices configured to perform such methods. In various embodiments, non-optical (e.g., electrical) feedback is used to help control an optical transition. The feedback may be used for a number of different purposes. In many implementations, the feedback is used to control an ongoing optical transition. In some embodiments a transfer function is used calibrate optical drive parameters to control the tinting state of optically switching devices.

    ELECTROCHROMIC WINDOW FABRICATION METHODS

    公开(公告)号:US20220032584A1

    公开(公告)日:2022-02-03

    申请号:US17304012

    申请日:2021-06-11

    Applicant: View, Inc.

    Abstract: Methods of manufacturing electrochromic windows are described. Insulated glass units (IGU's) are protected, e.g. during handling and shipping, by a protective bumper. The bumper can be custom made using IGU dimension data received from the IGU fabrication tool. The bumper may be made of environmentally friendly materials. Laser isolation configurations and related methods of patterning and/or configuring an electrochromic device on a substrate are described. Edge deletion is used to ensure a good seal between spacer and glass in an IGU and thus better protection of an electrochromic device sealed in the IGU. Configurations for protecting the electrochromic device edge in the primary seal and maximizing viewable area in an electrochromic pane of an IGU are also described.

    THIN-FILM DEVICES AND FABRICATION
    7.
    发明申请

    公开(公告)号:US20170219903A1

    公开(公告)日:2017-08-03

    申请号:US15491869

    申请日:2017-04-19

    Applicant: View, Inc.

    Abstract: Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.

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