公开(公告)号：DE69133388T2

公开(公告)日：2004-09-16

申请号：DE69133388

申请日：1991-06-25

Applicant: XEROX CORP

Inventor： PAOLI THOMAS I ,  EPLER JOHN E

IPC: H01L21/20 ,  H01L21/205 ,  H01L21/268 ,  H01L29/06 ,  H01L29/201 ,  H01L29/80 ,  H01S5/00 ,  H01S5/34

Abstract: In situ removal of selected or patterned portions of quantum well layers (22) is accomplished by photo-induced evaporation to form quantum wires (38), which may be in non-linear shapes, at the bases of at least one groove (14) in a semiconductor structure (10).

公开(公告)号：DE69218802D1

公开(公告)日：1997-05-15

申请号：DE69218802

申请日：1992-01-08

Applicant: XEROX CORP

Inventor： PAOLI THOMAS L ,  EPLER JOHN E

IPC: H01L21/203 ,  H01L33/00 ,  H01S5/00 ,  H01S5/34 ,  H01S5/40 ,  H01S3/19

公开(公告)号：DE3750076D1

公开(公告)日：1994-07-21

申请号：DE3750076

申请日：1987-11-18

Applicant: XEROX CORP

Inventor： EPLER JOHN E ,  BURNHAM ROBERT D

IPC: H01S5/00 ,  H01L21/18 ,  H01L21/20 ,  H01L21/24 ,  H01L21/263 ,  H01L21/268 ,  H01S5/20 ,  H01S5/34 ,  H01S5/40 ,  H01S3/19

Abstract: An energy beam induced layer disordering (EBILD) process is used to (a) locally melt in a scanned pattern regions of a solid state semiconductor heterostructure to produce an alloy of intermediate composition having different optical properties and/or (b) incorporating significantly large amounts of an impurity, present in an encapsulation surface layer of a solid state semiconductor heterostructure, into regions of the heterostructure via absorption of the impurity into liquid alloy melt to form regions having different optical and/or electrical properties and (c) thereafter optionally applying IID to enlarge or extend the disordered/as-grown boundaries of the initially melted region. As a direct write analogue to surface initiated impurity-induced disordering (IID), EBILD is a flexible and viable process with high importance for continuous reproducibility and high yield in the fabrication of optoelectronic devices and thin film electronic and optoelectronic circuitry. The invention provides impurity incorporation from a solid phase impurity source using an energy beam liquid phase technique to bring about absorption of the impurity with underlying constituents in a desired pattern to produce regions that may be disordered and possess different electrical properties or optical properties or both compared to regions not part of the scanned pattern.

公开(公告)号：CA2041942A1

公开(公告)日：1991-12-26

申请号：CA2041942

申请日：1991-05-07

Applicant: XEROX CORP

Inventor： PAOLI THOMAS L ,  EPLER JOHN E

IPC: H01L21/20 ,  H01L21/205 ,  H01L21/268 ,  H01L29/06 ,  H01L29/201 ,  H01L29/80 ,  H01S5/00 ,  H01S5/34

Abstract: In situ removal of selected or patterned portions of quantum well layers is accomplished by photo induced evaporation enhancement to form quantum wire, patterned quantum wire and multiple quantum wires in a semiconductor structure.