公开(公告)号：US20050206881A1

公开(公告)日：2005-09-22

申请号：US11123139

申请日：2005-05-06

Applicant: Yoshihiro Shiode

Inventor： Yoshihiro Shiode

IPC: G01M11/02 ,  G03F1/42 ,  G03F1/44 ,  G03F7/20 ,  G01B9/00

CPC classification number: G01M11/0264 ,  G03F1/44 ,  G03F7/70591 ,  G03F7/706

Abstract: A reticle having a test pattern for measurement of an optical characteristic of a projection optical system has a pattern adapted so that a high frequency component of a spectrum at a pupil plane of the projection optical system is reduced or suppressed. Illumination light is projected to the test pattern of the reticle in one direction or plural directions, and positions of images of the test pattern, formed by the projections in the plural directions, are detected and, based on it thereon, the optical characteristic of the projection optical system is measured.

Abstract translation: 具有用于测量投影光学系统的光学特性的测试图案的掩模版具有适于降低或抑制投影光学系统的光瞳面处的光谱的高频分量的图案。 照明光在一个方向或多个方向上投射到标线的测试图案，并且检测由多个方向上的突起形成的测试图案的图像的位置，并且基于该光学特性， 投影光学系统被测量。

公开(公告)号：US20130056904A1

公开(公告)日：2013-03-07

申请号：US13603523

申请日：2012-09-05

Applicant: Zenichi Hamaya ,  Noriyasu Hasegawa ,  Setsuo Yoshida ,  Yoshihiro Shiode

Inventor： Zenichi Hamaya ,  Noriyasu Hasegawa ,  Setsuo Yoshida ,  Yoshihiro Shiode

IPC: B29C59/02

CPC classification number: G03F7/0002 ,  B29C59/022 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00

Abstract: An imprint apparatus includes a deforming unit configured to deform the mold held by the mold holding unit into a convex shape toward the substrate; a driving unit configured to change an attitude of the mold or the substrate during a pressing in which the mold deformed is pressed against the uncured resin to thereby make a position of a contact region at which the mold is brought into contact with the uncured resin movable; a control unit configured to calculate a plane coordinates of a centroid of the contact region based on an image information of the contact region acquired by a measuring unit and to control an operation of the driving unit such that the plane coordinates position of the centroid is directed toward the plane coordinates position of the centroid of a pattern-forming region on the substrate, which has been calculated or has been acquired in advance.

Abstract translation: 压印装置包括变形单元，其被构造成将由模具保持单元保持的模具变形成朝向基板的凸形状; 驱动单元，其构造成在压模中改变模具或基板的姿态，其中模具变形压在未固化树脂上，从而形成与未固化树脂可移动接触的接触区域的位置 ; 控制单元，被配置为基于由测量单元获取的接触区域的图像信息来计算接触区域的质心的平面坐标，并且控制驱动单元的操作，使得质心的平面坐标位置被定向 朝向已经计算或已经被预先获取的基板上的图案形成区域的质心的平面坐标位置。

公开(公告)号：US20090086183A1

公开(公告)日：2009-04-02

申请号：US12236026

申请日：2008-09-23

Applicant: Yoshihiro Shiode

Inventor： Yoshihiro Shiode

IPC: G03B27/54

CPC classification number: G03B27/54 ,  G03F7/70591

Abstract: An exposure apparatus includes a calculating unit which calculates information representing the optical characteristic of the projection optical system, based on the relationship between the amount of defocus from the image plane of the projection optical system and the position of an image formed by the projection optical system.

Abstract translation: 曝光装置包括：计算单元，其基于投影光学系统的像面的散焦量与由投影光学系统形成的图像的位置之间的关系来计算表示投影光学系统的光学特性的信息 。

公开(公告)号：US20070229803A1

公开(公告)日：2007-10-04

申请号：US11694402

申请日：2007-03-30

Applicant: Yoshihiro Shiode

Inventor： Yoshihiro Shiode

IPC: G01B9/00

CPC classification number: G03F7/70258 ,  G03F7/70133 ,  G03F7/7025 ,  G03F7/70591

Abstract: A measurement method for measuring a position of an aperture stop in an optical system includes the steps of measuring a light intensity distribution of light that passes the aperture stop, at a position that is optically conjugate with a pupil position in the optical system, and determining a position of the aperture stop in the optical system based on a diffraction fringe of the light intensity distribution measured by the measuring step.

Abstract translation: 用于测量光学系统中的孔径光阑的位置的测量方法包括以下步骤：在与光学系统中的光瞳位置光学共轭的位置处测量通过孔径光阑的光的光强分布，以及确定 基于由测量步骤测量的光强度分布的衍射条纹，孔径光阑在光学系统中的位置。

公开(公告)号：US20070171427A1

公开(公告)日：2007-07-26

申请号：US11627153

申请日：2007-01-25

Applicant: Yoshihiro Shiode

Inventor： Yoshihiro Shiode

IPC: G01B9/02 ,  G01B11/02

CPC classification number: G03F7/706 ,  G01J4/00 ,  G01J2009/0261 ,  G03F7/70566

Abstract: A method for irradiating onto a target optical system plural linearly polarized rays having different polarization directions, and for measuring a polarization characteristic of the target optical system including a birefringence amount R and a fast axis Φ includes the steps of irradiating linearly polarized ray having a polarization direction θ onto the target optical system and obtaining a centroid amount P of the ray that has transmitted through the target optical system, and obtaining the birefringence amount R and the fast axis Φ from P=−R·cos(2θ−Φ) or P=R·cos(2θ−Φ).

Abstract translation: 一种用于向目标光学系统照射多个具有不同偏振方向的线性偏振光，并且用于测量包括双折射量R和快轴Phi的目标光学系统的偏振特性的方法包括以下步骤：照射具有极化的线偏振光 方向θ到目标光学系统上，并获得透过目标光学系统的光线的重心量P，并从P = -R.cos（2theta-Phi）或P中获得双折射量R和快轴Phi = R.cos（2ta-Phi）。

公开(公告)号：US06960415B2

公开(公告)日：2005-11-01

申请号：US10260278

申请日：2002-10-01

Applicant: Yoshihiro Shiode

Inventor： Yoshihiro Shiode

IPC: G03F7/20 ,  G03F9/00 ,  G03B27/42 ,  G03B27/68 ,  G03C5/00

CPC classification number: G03F7/706

Abstract: A method of measuring aberration of a projection optical system. The method includes the steps of imaging a test pattern through the projection optical system, and measuring a potential deviation amount of the image of the test pattern and measuring aberration of the project optical system on the basis of the positional deviation amount. The measuring step includes a process of determining a coefficient of a particular Zernike term and a process of changing a position or a shape of a region on a pupil plane of the projection optical system before light from the test pattern passes therethrough, in accordance with the particular Zernike term.

Abstract translation: 一种测量投影光学系统的像差的方法。 该方法包括以下步骤：通过投影光学系统成像测试图案，并且基于位置偏差量测量测试图案的图像的潜在偏差量并测量投影光学系统的像差。 测量步骤包括确定特定泽尔尼克项的系数的过程，以及在来自测试图案的光通过其之前改变投影光学系统的光瞳平面上的区域的位置或形状的处理，根据 特别的泽尔尼克术语。

公开(公告)号：US06633390B2

公开(公告)日：2003-10-14

申请号：US09811420

申请日：2001-03-20

Applicant: Yoshihiro Shiode ,  Izumi Tsukamoto ,  Hiroshi Morohoshi ,  Yoshio Kawanobe

Inventor： Yoshihiro Shiode ,  Izumi Tsukamoto ,  Hiroshi Morohoshi ,  Yoshio Kawanobe

IPC: G01B1100

CPC classification number: G03F9/7026

Abstract: A method of detecting focus information about an image projecting optical system includes performing mark projection through the optical system, and, based on illumination lights having different chief ray incidence directions, the mark projection is carried out so that mark images formed by the illumination lights, respectively, are superposed one upon another approximately upon an imaging plane, and detecting focus information about the optical system on the basis of information related to a deviation between the mark images superposed.

Abstract translation: 检测关于图像投影光学系统的焦点信息的方法包括通过光学系统执行标记投影，并且基于具有不同的主光线入射方向的照明光，执行标记投影，使得由照明光， 分别叠加在成像平面上，并且基于与叠加的标记图像之间的偏差相关的信息来检测关于光学系统的聚焦信息。

公开(公告)号：US08842294B2

公开(公告)日：2014-09-23

申请号：US13523717

申请日：2012-06-14

Applicant: Ken Minoda ,  Yoshihiro Shiode ,  Kazuhiko Mishima ,  Hironori Maeda

Inventor： Ken Minoda ,  Yoshihiro Shiode ,  Kazuhiko Mishima ,  Hironori Maeda

IPC: G01B11/14 ,  G03F7/00 ,  G03F9/00 ,  G01D5/38

CPC classification number: B29D11/00769 ,  B29L2011/00 ,  B82Y10/00 ,  B82Y40/00 ,  G01D5/38 ,  G02B5/18 ,  G03F7/0002 ,  G03F9/7038 ,  G03F9/7049 ,  G03F9/7069 ,  G03F9/7076 ,  Y10T29/49769

Abstract: A position detection apparatus includes an illumination optical system for illuminating a first diffraction grating having periods in each of a first direction and a second direction different from the first direction, and a second diffraction grating having a period different from the period in the second direction of the first diffraction grating in the second direction, at an oblique incidence, and a detection optical system for detecting diffracted light from the first diffraction grating and the second diffraction grating, wherein a relative position of the first diffraction grating and the second diffraction grating is detected based on the detected diffracted light, and wherein the illumination optical system includes a plurality of light intensity distributions in the first direction except for on an optical axis of the detection optical system, in a pupil plane thereof.

Abstract translation: 位置检测装置包括照明光学系统，用于照亮具有与第一方向不同的第一方向和第二方向的周期的第一衍射光栅，以及第二衍射光栅，其周期与第二方向的周期不同 第一衍射光栅在第二方向上以倾斜入射，以及检测光学系统，用于检测来自第一衍射光栅和第二衍射光栅的衍射光，其中检测第一衍射光栅和第二衍射光栅的相对位置 基于所检测的衍射光，并且其中所述照明光学系统在其瞳面中包括除了所述检测光学系统的光轴之外的第一方向上的多个光强度分布。

公开(公告)号：US08678808B2

公开(公告)日：2014-03-25

申请号：US13268351

申请日：2011-10-07

Applicant: Setsuo Yoshida ,  Noriyasu Hasegawa ,  Yoshihiro Shiode ,  Tatsuya Hayashi

Inventor： Setsuo Yoshida ,  Noriyasu Hasegawa ,  Yoshihiro Shiode ,  Tatsuya Hayashi

IPC: B29C59/02

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

Abstract: The imprint apparatus of the present invention molds an imprint material on a substrate using a mold and cures the imprint material to form a pattern on the substrate. The apparatus includes a holder configured to attract the mold to hold the mold; and a pressure reduction device configured to reduce a back pressure of the mold held by the holder, wherein the apparatus is configured to reduce the back pressure by the pressure reduction device in parallel with release of the mold from the imprint material.

Abstract translation: 本发明的压印装置使用模具将压印材料模制在基板上，并固化压印材料以在基板上形成图案。 该装置包括：支架，其构造成吸引模具以保持模具; 以及减压装置，其构造成减小由所述保持器保持的模具的背压，其中所述装置构造成与所述压模材料的模具释放平行地减小所述减压装置的背压。

公开(公告)号：US20120328725A1

公开(公告)日：2012-12-27

申请号：US13523717

申请日：2012-06-14

Applicant: Ken Minoda ,  Yoshihiro Shiode ,  Kazuhiko Mishima ,  Hironori Maeda

Inventor： Ken Minoda ,  Yoshihiro Shiode ,  Kazuhiko Mishima ,  Hironori Maeda

IPC: B29C59/02 ,  B23Q17/00 ,  G01B11/14

CPC classification number: B29D11/00769 ,  B29L2011/00 ,  B82Y10/00 ,  B82Y40/00 ,  G01D5/38 ,  G02B5/18 ,  G03F7/0002 ,  G03F9/7038 ,  G03F9/7049 ,  G03F9/7069 ,  G03F9/7076 ,  Y10T29/49769

Abstract: A position detection apparatus includes an illumination optical system for illuminating a first diffraction grating having periods in each of a first direction and a second direction different from the first direction, and a second diffraction grating having a period different from the period in the second direction of the first diffraction grating in the second direction, at an oblique incidence, and a detection optical system for detecting diffracted light from the first diffraction grating and the second diffraction grating, wherein a relative position of the first diffraction grating and the second diffraction grating is detected based on the detected diffracted light, and wherein the illumination optical system includes a plurality of light intensity distributions in the first direction except for on an optical axis of the detection optical system, in a pupil plane thereof.

Abstract translation: 位置检测装置包括照明光学系统，用于照亮具有与第一方向不同的第一方向和第二方向的周期的第一衍射光栅，以及第二衍射光栅，其周期与第二方向的周期不同 第一衍射光栅在第二方向上以倾斜入射，以及检测光学系统，用于检测来自第一衍射光栅和第二衍射光栅的衍射光，其中检测第一衍射光栅和第二衍射光栅的相对位置 基于所检测的衍射光，并且其中所述照明光学系统在其瞳面中包括除了所述检测光学系统的光轴之外的第一方向上的多个光强度分布。