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    ENSEMBLE OPTIQUE ET PROCEDE ASSOCIE
    14.
    发明申请
    ENSEMBLE OPTIQUE ET PROCEDE ASSOCIE 审中-公开
    光学单元及相关方法

    公开(公告)号：WO2004001770A1

    公开(公告)日：2003-12-31

    申请号：PCT/FR2003/001896

    申请日：2003-06-19

    Applicant: XENOCS ,  HOGHOJ, Peter ,  DARIEL, Aurélien ,  RODRIGUES, Sergio

    Inventor： HOGHOJ, Peter ,  DARIEL, Aurélien ,  RODRIGUES, Sergio

    IPC: G21K1/06

    CPC classification number: B82Y10/00 ,  G21K1/06 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064

    Abstract: La présente invention concerne un ensemble optique réflectif multicouche (10) à gradient latéral dont la surface réfléchissante est destinée à réfléchir des rayons X incidents sous faible angle d'incidence en produisant un effet optique bidimensionnel, caractérisé par le fait que ladite surface réfléchissante est constituée d'une surface unique, ladite surface réfléchissante étant conformée selon deux courbures correspondant à deux directions différentes. La présente invention concerne également un procédé de fabrication d'un tel ensemble optique, caractérisé en ce que le procédé comprend le revêtement d'un substrat présentant déjà une courbure, et la courbure de ce substrat selon une deuxième direction différente. L'invention concerne enfin un dispositif de génération et de conditionnement de rayons X pour des applications de réflectométrie RX dispersive en angle comprenant un ensemble optique tel que mentionné ci-dessus couplé à une source rayons X de telle sorte que les rayons X émis par la source sont conditionnés en deux dimensions afin d'adapter le faisceau émis par la source à destination d'un échantillon, les rayons X ayant des angles d'incidences différents sur l'échantillon considéré.

    Abstract translation: 本发明涉及具有横向梯度的多层反射光学单元（10），其反射表面用于反射以锐角入射的X射线并产生二维光学效应，其特征在于所述 反射表面由单个表面组成，并且所述反射表面在两个不同方向上成形为两条曲线。 本发明还涉及一种用于生产这种光学单元的方法，其特征在于该方法包括在第二不同方向涂覆已经具有曲线的基板和基板的弯曲。 还公开了一种用于生成和处理用于RX角色散反射测量的X射线的装置，包括如上所述的光学单元，其耦合到X射线源，使得由源发射的X射线在二维处理 为了使源发射的光束适应于样品，X射线具有在考虑的样品上不同的入射角。

    METHOD FOR CONTROLLED MODIFICATION OF THE REFLECTIVE QUALITIES OF A MULTI-LAYER
    15.
    发明申请
    METHOD FOR CONTROLLED MODIFICATION OF THE REFLECTIVE QUALITIES OF A MULTI-LAYER 审中-公开
    多层反射质量的控制方法

    公开(公告)号：WO02097485A3

    公开(公告)日：2003-03-20

    申请号：PCT/FR0201830

    申请日：2002-05-31

    Applicant: XENOCS ,  HOGHOJ PETER

    Inventor： HOGHOJ PETER

    IPC: G02B5/08 ,  G02B5/10 ,  G02B5/18 ,  G02B5/26 ,  G02B5/28 ,  G03F1/00 ,  G03F7/20 ,  G21K1/06 ,  C23C14/22 ,  G03F1/14

    CPC classification number: G02B5/0883 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/1838 ,  G02B5/26 ,  G02B5/283 ,  G03F1/24 ,  G03F1/26 ,  G03F7/70058 ,  G03F7/70958 ,  G21K1/06

    Abstract: One of the aspects of the invention relates to a method for altering the reflective qualities of desired regions of a multi-layered structure (30) which is exposed to radiation of a given wavelength value and for modifying said radiation in a desired manner by means of reflection, said alteration method involving the exposure of desired regions of the multi-layered structure to a beam (20) of energy, characterized in that the inventive method includes control of the exposure of the desired regions of the multi-layered structure to the beam of particles, whereby the reflectivity peak of each region of the structure can be shifted in a desired manner within the wavelength spectrum. A second aspect of the invention relates to a reflective lithographic mask and a mirror for X-rays carried out according to said method, in addition to the use of said method for rectifying the optical properties of a multi-layered structure.

    Abstract translation: 本发明的一个方面涉及一种用于改变暴露于给定波长值的辐射的多层结构（30）的期望区域的反射性质的方法，并且以期望的方式通过以下方式改变所述辐射： 反射，所述改变方法包括将多层结构的期望区域暴露于能量束（20），其特征在于，本发明的方法包括控制多层结构的期望区域对梁的曝光 的颗粒，由此可以在波长谱内以期望的方式移动结构的每个区域的反射率峰值。 本发明的第二方面涉及除了使用用于整流多层结构的光学特性的方法之外，根据所述方法执行的用于X射线的反射光刻掩模和反射镜。

    PROCEDE DE MODIFICATION CONTROLEE DE PROPRIETES REFLECTIVES D'UN MULTICOUCHE
    16.
    发明申请
    PROCEDE DE MODIFICATION CONTROLEE DE PROPRIETES REFLECTIVES D'UN MULTICOUCHE 审中-公开
    多层反射质量的控制方法

    公开(公告)号：WO2002097485A2

    公开(公告)日：2002-12-05

    申请号：PCT/FR2002/001830

    申请日：2002-05-31

    Applicant: XENOCS ,  HOGHOJ, Peter

    Inventor： HOGHOJ, Peter

    IPC: G02B5/26

    CPC classification number: G02B5/0883 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/1838 ,  G02B5/26 ,  G02B5/283 ,  G03F1/24 ,  G03F1/26 ,  G03F7/70058 ,  G03F7/70958 ,  G21K1/06

    Abstract: L'invention concerne selon un premier aspect un procédé d'altération des propriétés réflectives de régions désirées d'une structure multicouche (30) destinée à être exposée à un rayonnement de longueur d'onde donnée et à modifier de manière désirée ledit rayonnement par réflexion, ledit procédé d'altération mettant en oeuvre l'exposition de la structure à un faisceau (20) énergétique, caractérisé en ce que le procédé comprend le contrôle de l'exposition des régions désirées de la structure multicouche audit faisceau de particules, de manière à déplacer de manière désirée dans le spectre de longueur d'onde la valeur du pic de réflectivité de chaque région de la structure. L'invention concerne selon un second aspect un masque réflectif de lithographie, un miroir pour rayons X, réalisés par un tel procédé, et l'utilisation de ce procédé pour rectifier les propriétés optiques d'une structure multicouche.

    Abstract translation: 本发明的一个方面涉及一种用于改变暴露于给定波长值的辐射的多层结构（30）的期望区域的反射性质的方法，并且以期望的方式通过以下方式改变所述辐射： 反射，所述改变方法包括将多层结构的期望区域暴露于能量束（20），其特征在于，本发明的方法包括控制多层结构的期望区域对梁的曝光 的颗粒，由此可以在波长谱内以期望的方式移动结构的每个区域的反射率峰值。 本发明的第二方面涉及除了使用用于整流多层结构的光学特性的方法之外，根据所述方法执行的用于X射线的反射光刻掩模和反射镜。

    X-RAY SCATTERING APPARATUS AND X-RAY SCATTERING METHOD
    17.
    发明申请
    X-RAY SCATTERING APPARATUS AND X-RAY SCATTERING METHOD 审中-公开

    公开(公告)号：WO2022248471A1

    公开(公告)日：2022-12-01

    申请号：PCT/EP2022/064053

    申请日：2022-05-24

    Applicant: XENOCS SAS

    Inventor： HOGHOJ, Peter ,  JOENSEN, Karsten ,  PANINE, Pierre

    IPC: G01N23/20008 ,  G01N23/201 ,  G21K5/10

    Abstract: The invention refers to an X-ray scattering apparatus (10), comprising: - a sample vacuum chamber (26); - a sample holder (20) placed inside the sample vacuum chamber (26) for aligning and/or orienting a sample (18) to be analyzed by X-ray scattering; - an X-ray beam delivery system (11) comprising a 2D X-ray source and a 2D monochromator and being arranged upstream of the sample holder (20) for generating and directing an X-ray beam along a beam path in a propagation direction (Y) towards the sample holder (20); - an X-ray detector (22), placed inside a diffraction chamber connected to the sample vacuum chamber (26), wherein the X-ray detector (22) is arranged downstream of the sample holder (20) and is movable, in particular in a motorized way, along the propagation direction such as to detect the X-ray beam and X-rays scattered at different scattering angles from the sample (18); - wherein the X-ray beam delivery system (11) is configured to focus the X-ray beam onto a focal spot on or near the X-ray detector (22) when placed at its distal position having the largest distance from the sample holder (20) or to produce a parallel beam, - a Bonse Hart monochromator module (12) positioned upstream of the sample holder (20) and being equipped with a motorized monochromator holder; - a Bonse Hart analyzer module (14) positioned downstream of the sample holder (20) and being equipped with a motorized analyzer holder (14a); wherein both the motorized monochromator holder and the motorized analyzer holder (14a) are configured such as to simultaneously position their respective modules (12, 14) in an active position in the X-ray beam for USAXS measurements and in an inactive position out of the X-ray beam for SAXS measurements, characterized in that the X-ray scattering apparatus (10) furthermore comprises a storage chamber (32) integral with or connected to the sample vacuum chamber (26) and/or the diffraction chamber, and that the motorized analyzer holder (14a) is furthermore configured to position the Bonse Hart analyzer module (14) in a storage position in the storage chamber (32). The invention furthermore refers to an X-ray scattering method carried out using the X-ray scattering apparatus.

    METHOD AND APPARATUS FOR X-RAY SCATTERING MATERIAL ANALYSIS
    18.
    发明申请
    METHOD AND APPARATUS FOR X-RAY SCATTERING MATERIAL ANALYSIS 审中-公开

    公开(公告)号：WO2019219737A1

    公开(公告)日：2019-11-21

    申请号：PCT/EP2019/062453

    申请日：2019-05-15

    Applicant: XENOCS SAS

    Inventor： HØGHØJ, Peter ,  LANTZ, Blandine ,  JOENSEN, Karsten ,  NIELSEN, Søren

    IPC: G01N23/201

    Abstract: The invention relates to a method for X-Ray Scattering material analysis, in particular Small Angle X-ray Scattering material analysis, comprising: - generating and directing an incident X-ray beam along a propagation direction (X) to a sample held in a sample environment; - executing a sample measurement process comprising the following steps: o determining a distribution of X rays scattered from said sample by means of a area detector (10) arranged downstream of said sample environment; and o determining an intensity (It) of a beam of X rays transmitted through said sample by means of said detector (10); - executing a sample data treatment process comprising the following step: o determining a corrected scattered X-ray distribution by applying to said scattered X-ray distribution a correction which depends on said transmitted intensity; and - executing a data analysis process comprising the following step: o determining at least one structural characteristic of said sample on the basis of said corrected scattered X-ray distribution; characterized in that - acquisition of said scattered and said transmitted X-rays is divided into a plurality of acquisition periods, wherein each acquisition period (T acq ) is shorter than or equal to a previously determined maximum acquisition time (T max ) in such a way that said detector (10) operates in a linear range; - said detector (10) measures individual detector image frames containing signals of said scattered and said transmitted X-rays, wherein each individual detector image frame is measured during one among said plurality of acquisition periods; - said individual detector image frames are added up to a total detector image frame in a computer connected to said detector (10); and - said determination of said at least one structural characteristic of said sample is realized based on an absolute scattered X-ray distribution obtained on the basis of said total detector image frame. The invention furthermore relates to an apparatus adapted to cany out such a method.

    ENERGY-DISPERSIVE X-RAY REFLECTOMETRY SYSTEM
    19.
    发明申请
    ENERGY-DISPERSIVE X-RAY REFLECTOMETRY SYSTEM 审中-公开
    能量色散X射线反射测量系统

    公开(公告)号：WO2010004122A3

    公开(公告)日：2010-03-04

    申请号：PCT/FR2009000794

    申请日：2009-06-26

    Applicant: XENOCS SA ,  HOGHOJ PETER

    Inventor： HOGHOJ PETER

    IPC: G01N23/20 ,  G01N23/223

    CPC classification number: G01N23/2076

    Abstract: The invention relates to an energy-dispersive X-ray reflectometry system for analyzing a specimen, comprising: a source (1) for emitting an X-ray beam, said source (1) being coupled to an optical collection device (2) comprising means for focusing the beam emitted by the source (1) with a spot size measured in two directions of less than 100 µm and at a given angle of incidence to the specimen; a detection device (3) for measuring the intensity of the X-ray beam reflected by the specimen as a function of the energy of the X-rays over a predetermined measurement energy range, characterized in that the source (1) includes means for emitting an X-ray beam with a polychromatic spectrum of energies below 3 keV and in that the optical collection device (2) is placed relative to the specimen so as to focus the beam at a fixed angle of incidence in order for the projection of the spot on the specimen to have an elongation factor of less than 10.

    Abstract translation: 本发明涉及用于分析样本的能量色散X射线反射测量系统，包括：用于发射X射线束的源（1），所述源（1）耦合到光学收集装置（2） 用于将由源（1）发射的光束聚焦成在小于100μm的两个方向上测量的光斑尺寸并且以给定的入射角对样本进行测量; 检测装置（3），用于根据在预定测量能量范围内的X射线的能量来测量由样本反射的X射线束的强度，其特征在于，源（1）包括用于发射 具有低于3keV能量的多色谱的X射线束，并且所述光学收集装置（2）相对于所述样本放置，以便以固定入射角聚焦所述束以便投射所述点 在样品上具有小于10的延伸系数。

    SYSTÈME DE DÉLIVRANCE DE FAISCEAU DE RAYONS X STABILISÉ
    20.
    发明申请
    SYSTÈME DE DÉLIVRANCE DE FAISCEAU DE RAYONS X STABILISÉ 审中-公开

    公开(公告)号：WO2008012419A3

    公开(公告)日：2008-01-31

    申请号：PCT/FR2007/001252

    申请日：2007-07-20

    Applicant: XENOCS ,  BOULEE, Pascal ,  CENDA, Dan Mihai ,  HOGHOJ, Peter

    Inventor： BOULEE, Pascal ,  CENDA, Dan Mihai ,  HOGHOJ, Peter

    IPC: G21K1/04 ,  H05G1/02 ,  G01N23/223

    Abstract: L'invention concerne un système (1) de délivrance de faisceau de rayons X comprenant un bloc source (100) émettant un faisceau source de rayons X, des moyens de conditionnement (500) permettant de conditionner le faisceau source en direction d'un échantillon. Le système (1) comporte des moyens de stabilisation (800) agencés de manière à stabiliser thermiquement une zone du système (1) située en aval du bloc source (100), pour limiter des transferts thermiques vers les moyens de conditionnement en vue de prévenir des perturbations thermiques au niveau des moyens de conditionnement (500).

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