Apparatus and method for inspecting pattern
    11.
    发明申请
    Apparatus and method for inspecting pattern 失效
    用于检查图案的装置和方法

    公开(公告)号:US20030020904A1

    公开(公告)日:2003-01-30

    申请号:US10050778

    申请日:2002-01-18

    Abstract: The present invention provides a pattern defect inspecting apparatus wherein an amount-of-light monitor unit detects a variation in the amount of ultraviolet laser light during inspection to thereby determine the presence or absence of an influence thereof exerted on the inspection and detects the prediction of the life of a light source and a malfunction thereof, and the interior of an optical system is cleaned up to thereby ensure the prolongation of the life of each optical part and long-term reliability thereof, and a method thereof.

    Abstract translation: 本发明提供了一种图案缺陷检查装置,其中光量监视器单元检测检查期间紫外激光量的变化,从而确定其对检查的影响的有无,并检测预测 光源的寿命和故障以及光学系统的内部被清理,从而确保每个光学部件的寿命延长及其长期可靠性及其方法。

    Apparatus and method for inspecting pattern
    13.
    发明授权
    Apparatus and method for inspecting pattern 失效
    用于检查图案的装置和方法

    公开(公告)号:US08149395B2

    公开(公告)日:2012-04-03

    申请号:US13069091

    申请日:2011-03-22

    Abstract: A method and apparatus for inspecting defects includes emitting an ultraviolet light from an ultraviolet light source, illuminating a specimen with the ultraviolet light in which a polarization condition of the ultraviolet light is controlled, controlling a polarization condition of light reflected from the specimen which is illuminated by the polarization condition controlled ultraviolet light, detecting the light reflected from the specimen, processing the detected light so as to detect defects, and outputting information about the defects. The ultraviolet light source is disposed in a clean environment supplied with clean gas and separated from outside.

    Abstract translation: 用于检查缺陷的方法和装置包括从紫外光源发射紫外光,用受紫外光的偏振条件的紫外线照射样本,控制从被照射的样本反射的光的偏振状态 通过偏光条件控制的紫外光,检测从样本反射的光,处理检测到的光以检测缺陷,并输出关于缺陷的信息。 紫外光源设置在清洁环境中,并提供清洁气体并与外界分离。

    Programmable digital machine vision inspection system
    15.
    发明公开
    Programmable digital machine vision inspection system 审中-公开
    程序员数据库MASCHINENSICHTINSPEKTIONSSYSTEM

    公开(公告)号:EP2915597A1

    公开(公告)日:2015-09-09

    申请号:EP15157488.6

    申请日:2015-03-04

    Abstract: The present invention discloses a programmable digital machine vision inspection system, comprising: a programmable automatic feeding system configured to supply elements to be inspected; a programmable robot system comprising a robot and a first vision system, wherein the robot configured to grip the element supplied by the programmable automatic feeding system and transmit the gripped element into an inspection area under the guidance of the first vision system; and a programmable inspection system comprising a second vision system configured to identify features of the elements transmitted into the inspection area and determine whether the element is a qualified product based on the identified features. If the element is determined to be a qualified product, the robot places the element into a first container for receiving the qualified product; If the element is determined to be an unqualified product, the robot places the element into a second container for receiving the unqualified product. The programmable digital machine vision inspection system is adapted to inspect different types of elements, and switching between inspection operations of different types of elements is very quickly.

    Abstract translation: 本发明公开了一种可编程数字机器视觉检测系统,包括:可编程自动馈送系统,被配置为提供要检查的元件; 一种包括机器人和第一视觉系统的可编程机器人系统,其中所述机器人被配置为夹持由所述可编程自动馈送系统提供的元件,并且在所述第一视觉系统的引导下将所述夹持的元件传送到检查区域; 以及可编程检查系统,包括第二视觉系统,其被配置为识别发送到检查区域中的元件的特征,并且基于所识别的特征来确定元件是否是合格的产品。 如果元件被确定为合格产品,则机器人将元件放置在第一容器中以接收合格产品; 如果该元件被确定为不合格产品,则机器人将元件放入用于接收不合格产品的第二容器中。 可编程数字机器视觉检测系统适用于检查不同类型的元件,并且不同类型元件的检查操作之间的切换非常快。

    Surface analysis method and apparatus
    16.
    发明公开
    Surface analysis method and apparatus 失效
    表面分析方法和装置

    公开(公告)号:EP0377446A2

    公开(公告)日:1990-07-11

    申请号:EP90100051.3

    申请日:1990-01-02

    Applicant: HITACHI, LTD.

    Abstract: A method of and an apparatus for analyzing a surface are disclosed, in which the intensity profile of a probe beam at the surface of a sample (2 ) is measured, the intensity distribution of a detection signal along the surface of the sample is measured by scanning the surface of the sample with the probe beam, and mathematical transformation is carried out for each of the measured intensity profile and the measured signal-intensity distribution, to make surface analysis with high resolution.

    Abstract translation: 公开了一种用于分析表面的方法和设备,其中测量样品(2)表面处的探测光束的强度分布,通过测量沿样品表面的检测信号的强度分布 用探针光束扫描样品的表面,并对测量的强度分布和测量的信号强度分布中的每一个进行数学变换,以高分辨率进行表面分析。

    Tomography System and Method for Large-volume Recordings

    公开(公告)号:US20170123083A1

    公开(公告)日:2017-05-04

    申请号:US15340927

    申请日:2016-11-01

    Applicant: Robert Divoky

    Inventor: Robert Divoky

    Abstract: A tomography system includes a first radiation source and a first detector that is assigned to the first radiation source. The tomography system also includes a second radiation source and a second detector that is assigned to the second radiation source. The tomography system is prepared to perform a scan. In a first plane of rotation, the first detector is guided along a first circular segment-shaped path. In a second plane of rotation, the second detector is guided in synchrony along a second circular segment-shaped path. The tomography system is configured to obtain a first data record with the first detector and a second data record with the second detector. The first plane of rotation and the second plane of rotation are arranged at a distance from one another.

    Apparatus and method for inspecting pattern
    18.
    发明授权
    Apparatus and method for inspecting pattern 有权
    用于检查图案的装置和方法

    公开(公告)号:US07911601B2

    公开(公告)日:2011-03-22

    申请号:US12263682

    申请日:2008-11-03

    Abstract: A method and apparatus for inspecting defects includes emitting an ultraviolet light from an ultraviolet light source, illuminating a specimen with the ultraviolet light in which a polarization condition of the ultraviolet light is controlled, controlling a polarization condition of light reflected from the specimen which is illuminated by the polarization condition controlled ultraviolet light, detecting the light reflected from the specimen, processing the detected light so as to detect defects, and outputting information about the defects. The ultraviolet light source is disposed in a clean environment supplied with clean gas and separated from outside.

    Abstract translation: 用于检查缺陷的方法和装置包括从紫外线光源发射紫外光,用紫外光的紫外线照射样本,其中控制紫外光的偏振条件,控制从被照射的样本反射的光的偏振状态 通过偏光条件控制的紫外光,检测从样本反射的光,处理检测到的光以检测缺陷,并输出关于缺陷的信息。 紫外光源设置在清洁环境中,并提供清洁气体并与外界分离。

    Apparatus And Method For Inspecting Pattern
    19.
    发明申请
    Apparatus And Method For Inspecting Pattern 有权
    检查模式的装置和方法

    公开(公告)号:US20090066943A1

    公开(公告)日:2009-03-12

    申请号:US12263682

    申请日:2008-11-03

    Abstract: A method and apparatus for inspecting defects includes emitting an ultraviolet light from an ultraviolet light source, illuminating a specimen with the ultraviolet light in which a polarization condition of the ultraviolet light is controlled, controlling a polarization condition of light reflected from the specimen which is illuminated by the polarization condition controlled ultraviolet light, detecting the light reflected from the specimen, processing the detected light so as to detect defects, and outputting information about the defects. The ultraviolet light source is disposed in a clean environment supplied with clean gas and separated from outside.

    Abstract translation: 用于检查缺陷的方法和装置包括从紫外光源发射紫外光,用受紫外光的偏振条件的紫外线照射样本,控制从被照射的样本反射的光的偏振状态 通过偏光条件控制的紫外光,检测从样本反射的光,处理检测到的光以检测缺陷,并输出关于缺陷的信息。 紫外光源设置在清洁环境中,并提供清洁气体并与外界分离。

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