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公开(公告)号：US20170146458A1
公开(公告)日：2017-05-25
申请号：US15316568
申请日：2015-06-03
Applicant: Ludwig-Maximilians-Universität München
Inventor： Robert Alexander Huber , Sebastian Karpf , Matthias Eibl
CPC classification number: G01N21/6456 , G01J3/0218 , G01J3/10 , G01J3/44 , G01J3/4406 , G01N21/6408 , G01N21/65 , G01N2021/6484 , G01N2201/06146 , G01N2201/0635 , G01N2201/105 , G01N2201/11 , G01N2201/12 , H01S3/06712 , H01S3/06754 , H01S3/094007 , H01S3/10015 , H01S3/1618 , H01S3/2316 , H01S3/302 , H01S2301/02
Abstract: Described is a system for inducing and detecting multi-photon processes, in particular multi-photon fluorescence or higher harmonic generation in a sample. The system comprises a dynamically-controllable light source, said dynamically-controllable light source comprising a first sub-light source, said first sub-light source being electrically controllable such as to generate controllable time-dependent intensity patterns of light having a first wavelength, and at least one optical amplifier, thereby allowing for active time-control of creation of multi-photon-excitation. The system further comprises a beam delivery unit for delivering light generated by said dynamically-controllable light source to a sample site, and a detector unit or detector assembly for detecting signals indicative of said multi-photon process, in particular multi-photon fluorescence signals or higher harmonics signals.
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公开(公告)号：US09851303B2
公开(公告)日：2017-12-26
申请号：US15316568
申请日：2015-06-03
Applicant: Ludwig-Maximilians-Universität München
Inventor： Robert Alexander Huber , Sebastian Karpf , Matthias Eibl
CPC classification number: G01N21/6456 , G01J3/0218 , G01J3/10 , G01J3/44 , G01J3/4406 , G01N21/6408 , G01N21/65 , G01N2021/6484 , G01N2201/06146 , G01N2201/0635 , G01N2201/105 , G01N2201/11 , G01N2201/12 , H01S3/06712 , H01S3/06754 , H01S3/094007 , H01S3/10015 , H01S3/1618 , H01S3/2316 , H01S3/302 , H01S2301/02
Abstract: Described is a system for inducing and detecting multi-photon processes, in particular multi-photon fluorescence or higher harmonic generation in a sample. The system comprises a dynamically-controllable light source, said dynamically-controllable light source comprising a first sub-light source, said first sub-light source being electrically controllable such as to generate controllable time-dependent intensity patterns of light having a first wavelength, and at least one optical amplifier, thereby allowing for active time-control of creation of multi-photon-excitation. The system further comprises a beam delivery unit for delivering light generated by said dynamically-controllable light source to a sample site, and a detector unit or detector assembly for detecting signals indicative of said multi-photon process, in particular multi-photon fluorescence signals or higher harmonics signals.
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公开(公告)号：US08553229B2
公开(公告)日：2013-10-08
申请号：US12259235
申请日：2008-10-27
Applicant: Motohiro Furuki , Shingo Imanishi , Masataka Shinoda , Akitoshi Suzuki , Kazushi Miyake
Inventor： Motohiro Furuki , Shingo Imanishi , Masataka Shinoda , Akitoshi Suzuki , Kazushi Miyake
CPC classification number: G01N15/1425 , G01N15/1436 , G01N15/1459 , G01N15/1484 , G01N21/6428 , G01N21/645 , G01N2015/1006 , G01N2015/1497 , G01N2021/058 , G01N2021/6419 , G01N2021/6421 , G01N2201/10 , G01N2201/11
Abstract: A fine particle measuring method of performing optical measurement of fine particles introduced into a plurality of sample fluidic channels provided at predetermined distances on a substrate by scanning light to the sample fluidic channels is disclosed. The method includes: sequentially irradiating the light to at least two or more reference regions provided together with the sample fluidic channels; detecting a change of optical property occurring in the light due to the reference regions; and controlling timing of emission of the light to the sample fluidic channels.
Abstract translation: 公开了一种微粒测量方法，其通过向样品流体通道扫描光来对引入到以预定距离设置在基板上的多个样品流体通道中的微粒进行光学测量。 该方法包括：顺序地将光照射到与样品流体通道一起提供的至少两个或更多个参考区域; 检测由于参考区域而在光中发生的光学特性的变化; 并控制向样品流体通道发射光的定时。
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公开(公告)号：US08222615B2
公开(公告)日：2012-07-17
申请号：US12666035
申请日：2009-02-13
Applicant: Alois Schausberger , Andreas Gfrörer , Wolfgang Fuchs
Inventor： Alois Schausberger , Andreas Gfrörer , Wolfgang Fuchs
IPC: G01J1/58
CPC classification number: G02B21/26 , G01N21/278 , G01N21/6458 , G01N2021/6419 , G01N2201/104 , G01N2201/11 , G02B21/0076
Abstract: Method has laser scanner for pixel-precise imaging of fluorescent samples having fluorescent dyes. The scanner has sample table, laser and first optical system providing laser beam for exciting the samples, scanner head with deflecting element for scanning sample, first lens, second optical system for forwarding emission beams triggered by the laser beam and deflected by first lens and deflecting element to a detector, position encoder emitting position signals indicating location of the scanner head, electronic element for filtering the detector signals with a time constant and an A/D converter for digitizing the filtered detector signals. The filtered detector signals and the position encoder signals are acquired independently, in parallel and continuously by a computer and are related to a common time base, the A/D conversion being carried out often so that each pixel of an image is always assigned more than one data point.
Abstract translation: 方法具有用于具有荧光染料的荧光样品的像素精确成像的激光扫描仪。 扫描仪具有样品台，激光和第一光学系统，提供用于激发样品的激光束，扫描头具有用于扫描样品的偏转元件，第一透镜，用于转发由激光束触发并由第一透镜偏转的发射光束的第二光学系统 发送位置信号的位置编码器，用于指示扫描仪头部的位置，用于对时间常数进行检测器信号的滤波的电子元件和用于数字化滤波的检测器信号的A / D转换器。 经滤波的检测器信号和位置编码器信号由计算机并行并连续地获取并且与公共时基相关，经常执行A / D转换，使得图像的每个像素总是被分配多于 一个数据点。
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公开(公告)号：WO2009103663A1
公开(公告)日：2009-08-27
申请号：PCT/EP2009/051689
申请日：2009-02-13
Applicant: TECAN TRADING AG , SCHAUSBERGER, Alois , GFÖRER, Andreas , FUCHS, Wolfgang
Inventor： SCHAUSBERGER, Alois , GFÖRER, Andreas , FUCHS, Wolfgang
CPC classification number: G02B21/26 , G01N21/278 , G01N21/6458 , G01N2021/6419 , G01N2201/104 , G01N2201/11 , G02B21/0076
Abstract: Betrifft ein Datenerfassungsverfahren mit einem Laser Scanner-Gerät zum pixelgenauen Abbilden von auf Objektträgern befindlichen, mit Fluoreszenzfarbstoffen behandelten, fluoreszierenden Proben. Ein solches Laser Scanner-Gerät umfasst einen Probentisch; mindestens einen Laser und ein erstes optisches System zum Bereitstellen mindestens eines Laserstrahls zur Anregung der fluoreszierenden Proben; einen Scanner-Kopf (50) mit einem optischen Umlenkelement zum Abrastern dieser Probe in mindestens einer Bewegungsrichtung (75); ein erstes Objektiv; ein zweites optisches System zum Weiterleiten von durch die Laserstrahlen an der Probe ausgelösten und durch das erste Objektiv und das Umlenkelement umgelenkten Emissionsstrahlenbündeln zu mindestens einem Detektor; einen Weggeber (91), der Weggeber-Signale (92) aussendet, die den momentanen Aufenthaltsort des Scanner-Kopfs (50) in Bezug auf einen Nullpunkt anzeigen; ein elektronisches Element zur Filterung der Detektor-Signale (93) mit einer definierten Zeitkonstante; und einen A/D-Wandler zur Digitalisierung der gefilterten Detektor-Signale (93). Das erfindungsgemässe Datenerfassungsverfahren ist dadurch gekennzeichnet, dass die gefilterten Detektor-Signale (93) des A/D-Wandlers und die Weggeber-Signale (92) unabhängig, parallel und kontinuierlich von einer Rechnereinheit bzw. einer Steuerung (40) erfasst und auf eine gemeinsame Zeitbasis (94) bezogen werden, wobei die A/D-Wandlung so häufig erfolgt, dass jedem Pixel (95) eines Bildes stets mehr als ein Datenpunkt des A/D-Wandlers zugeordnet wird.
Abstract translation: 涉及数据采集与用于成像像素精度的激光扫描装置中，设置在用荧光染料，荧光的样品处理幻灯片的方法。 这样的激光扫描装置包括一个试样台; 至少一个激光和用于至少提供激光束以激发荧光样品的第一光学系统; 具有用于在移动中的至少一个方向上扫描样本的光学偏转器的扫描头（50）（75）; 的第一透镜; 用于通过激光束对样品触发并由第一物镜和所述偏转元件发射的辐射束到至少一个检测器偏转转发的第二光学系统; 发射的位置编码器（91），指示所述扫描头（50）相对于零点的当前位置的编码器信号（92）; 的电子元件来过滤具有限定时间常数的检测器信号（93）; 和用于数字化经滤波的检测器信号的A / D转换器（93）。 本发明的数据记录方法的特征在于，所述A / D转换器的经滤波的检测器信号（93）和所述位置编码器信号（92）独立的，并行且连续地由一个计算机单元或控制器（40）检测和共用的 时基（94）获得，其中所述A / D转换，以便经常，一个图像的每个像素（95）总是被分配到A / D转换器的一个以上的数据点进行的。
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Patent Agency Ranking16.发明申请OPTICAL ELEMENT ROTATION TYPE MUELLER-MATRIX ELLIPSOMETER AND METHOD FOR MEASURING MUELLER-MATRIX OF SAMPLE USING THE SAME 审中-公开光学元件旋转型MUELLER-MATRIX ELLIPSOMETER和用于测量使用其的样品的MUELLER-MATRIX的方法
公开(公告)号：WO2015030343A1
公开(公告)日：2015-03-05
申请号：PCT/KR2014/004267
申请日：2014-05-13
Inventor： CHO, Yong Jai , CHEGAL, Won , CHO, Hyun Mo
IPC: G01N21/17
CPC classification number: G01N21/211 , G01J4/04 , G01N2021/213 , G01N2201/061 , G01N2201/0633 , G01N2201/0683 , G01N2201/11
Abstract: Provided is an optical element rotation type Mueller-matrix ellipsometer for solving a problem of measurement accuracy and measurement precision occurring due to residual polarization of a light source, polarization dependence of a photo-detector, measurement values of Fourier coefficients of a high order term in dual optical element rotation type Mueller-matrix ellipsometers according to the related art capable of measuring some or all of components of a Mueller-matrix for any sample.
Abstract translation: 提供一种光学元件旋转型米勒矩阵椭偏仪，用于解决由于光源的残余极化产生的测量精度和测量精度的问题，光检测器的偏振度依赖性，高阶项的傅里叶系数的测量值 根据相关技术的双光学元件旋转型米勒矩阵椭偏仪能够测量任何样品的Mueller矩阵的一些或全部组分。
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公开(公告)号：US20240255415A1
公开(公告)日：2024-08-01
申请号：US18104198
申请日：2023-01-31
Applicant: Lawrence Livermore National Security, LLC
Inventor： Brian Giera , Adam Jaycox , Brian Au , Alex Caviness , Alexander Blum , Nishant Ojal
IPC: G01N21/01
CPC classification number: G01N21/01 , G01N2021/1734 , G01N2021/1757 , G01N2021/1785 , G01N2201/0675 , G01N2201/11
Abstract: A method is disclosed for selecting an optimal value for an adjustable parameter of a structured light metrology (SLM) system, for scanning an object. The SLM system performs test scans of the object to acquire a plurality of sets of measurements of the object, wherein a different value is used for the parameter for each test scan. For each test scan, a value of a quality metric is calculated, based on the set of measurements of the object associated with the test scan and simulation data representing a simulated scan of the object by the SLM system. A test scan is then identified that has a quality metric value that satisfies a specified optimization criterion; and a value of the adjustable parameter that was used for the identified test scan is selected as the optimal value of the adjustable parameter, for scanning the object.
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18.发明申请公开(公告)号：US20170363543A1
公开(公告)日：2017-12-21
申请号：US15493779
申请日：2017-04-21
Applicant: FUJIFILM Corporation
Inventor： Takashi KOBAYASHI
IPC: G01N21/64
CPC classification number: G01N21/6456 , G01N21/6428 , G01N21/6486 , G01N27/44717 , G01N27/44721 , G01N2021/6419 , G01N2021/6421 , G01N2021/6439 , G01N2201/06193 , G01N2201/11
Abstract: There are provided a control device of an image reading apparatus, an operation method and an operation program thereof, and an image detection system capable of quickly and easily outputting an image having an appropriate density for analysis from an image reading apparatus. An image receiving unit receives a pre-image output in pre-scanning performed before main scanning for outputting a main image for analysis in an image reading apparatus. A region information receiving unit receives information of a region in the pre-image designated by a user. A calculation unit calculates an appropriate voltage value that is a voltage value of the photomultiplier at which a density of the region becomes an appropriate density for analysis. A scanning conditions setting unit sets the appropriate voltage value as temporary scanning conditions of main scanning.
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公开(公告)号：US09518932B2
公开(公告)日：2016-12-13
申请号：US14517751
申请日：2014-10-17
Applicant: KLA-Tencor Corporation
Inventor： Allen Park , Craig MacNaughton , Ellis Chang
CPC classification number: G01N21/93 , G01B11/06 , G01B11/0675 , G01B2210/56 , G01N21/9501 , G01N21/956 , G01N2201/061 , G01N2201/105 , G01N2201/11 , G01N2201/125 , G03F7/705 , G03F7/70616
Abstract: Methods and systems for determining one or more parameters of a wafer inspection process are provided. One method includes acquiring metrology data for a wafer generated by a wafer metrology system. The method also includes determining one or more parameters of a wafer inspection process for the wafer or another wafer based on the metrology data.
Abstract translation: 提供了用于确定晶片检查过程的一个或多个参数的方法和系统。 一种方法包括获取由晶片计量系统产生的晶片的度量数据。 该方法还包括基于测量数据确定晶片或另一晶片的晶片检查过程的一个或多个参数。
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公开(公告)号：US20150124247A1
公开(公告)日：2015-05-07
申请号：US14517751
申请日：2014-10-17
Applicant: KLA-Tencor Corporation
Inventor： Allen Park , Craig MacNaughton , Ellis Chang
CPC classification number: G01N21/93 , G01B11/06 , G01B11/0675 , G01B2210/56 , G01N21/9501 , G01N21/956 , G01N2201/061 , G01N2201/105 , G01N2201/11 , G01N2201/125 , G03F7/705 , G03F7/70616
Abstract: Methods and systems for determining one or more parameters of a wafer inspection process are provided. One method includes acquiring metrology data for a wafer generated by a wafer metrology system. The method also includes determining one or more parameters of a wafer inspection process for the wafer or another wafer based on the metrology data.
Abstract translation: 提供了用于确定晶片检查过程的一个或多个参数的方法和系统。 一种方法包括获取由晶片计量系统产生的晶片的度量数据。 该方法还包括基于测量数据确定晶片或另一晶片的晶片检查过程的一个或多个参数。
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