Abstract:
A cathode has electropositive atoms (80) directly bonded to a carbon-containing substrate (60). Preferably, the substrate comprises diamond or diamond-like (sp3) carbon, and the electropositive atoms are Cs. The cathode displays superior efficiency and durability. In one embodiment, the cathode has a negative electron affinity (NEA). The cathode can be used for field emission, thermionic emission, or photoemission. Upon exposure to air or oxygen, the cathode performance can be restored by annealing or other methods. Applications include detectors, electron multipliers, sensors, imaging systems, and displays, particularly flat panel displays.
Abstract:
A plasma device including the magnesium oxide minute particle of the specific cathode light-emitting property is provided to decrease the discharge delay time and lower the discharge voltage. A plasma device comprises the front substrate(1) and the backplane substrate(8), the electrode(2), and dielectric layers(3,6). The front substrate and the backplane substrate are faced with each other. The discharge space is positioned between the front substrate and the backplane substrate. The dielectric layer coats each electrode. The magnesium oxide minute particle(11) does not have the cathodluminiscence peak less than the wavelength area 300 nm. The magnesium oxide minute particle has the cathodluminiscence peak between 350~500 nm. The magnesium oxide minute particle has one or more cathodluminiscence peak between 550~650 nm and 700~800 nm. The magnesium oxide minute particle is included in the discharge space between the backplane substrate and the front substrate.
Abstract:
An alkali metal generating agent (1) for use in forming a photoelectric surface emitting a photoelectron corresponding to an incident light or a secondary electron emission surface emitting a secondary electron corresponding to an incident electron, which comprises an oxidizing agent comprising at least one vanadate having an alkali metal ion as a counter cation and a reducing agent for reducing the above cation. The above metal generating agent (1), which includes a vanadate having weaker oxidizing power than that of a chromate, undergoes slower oxidation-reduction reaction, which results in easier reaction rate control as compared to a conventional technique using a chromate, leading to the generation of an alkali metal with good stability.
Abstract:
An alkali metal generating agent (1) for use in forming a photoelectric surface emitting a photoelectron corresponding to an incident light or a secondary electron emission surface emitting a secondary electron corresponding to an incident electron, which comprises an oxidizing agent comprising at least one tungstate having an alkali metal ion as a counter cation and a reducing agent for reducing the above cation. The above metal generating agent (1), which includes a tungstate having weaker oxidizing power than that of a chromate, undergoes slower oxidation-reduction reaction, which results in easier reaction rate control as compared to a conventional technique using a chromate, leading to the generation of an alkali metal with good stability.
Abstract:
A cathode (5) for emitting photoelectrons or secondary electrons comprises a nickel electrode substrate (5c) with an aluminum layer (5b) deposited on it; an intermediate layer (5a) consisting of carbon nanotubes formed on the aluminum layer; and an alkaline metal layer (5d) formed on the intermediate layer (5a) and composed, for example, of particles of an alkali antimony compound that either emits photoelectrons in response to incident light or emits secondary electrons in response to incident electrons. The decrease in defect density of the particles reduces the probability of recombination of electron and hole remarkably, thus increasing quantum efficiency.
Abstract:
A method for manufacturing a discrete dynode electron multiplier includes employing micromachining and thin film techniques to produce tapered apertures in an etchable substrate, bonding the substrates together and activating the internal surfaces of the etched substrate using chemical vapor deposition or oxidizing and nitriding techniques.