Abstract:
Multiple sample introduction means have been configured in Atmospheric Pressure Ion sources which are interfaced to mass analyzers. Different samples can be introduced through multiple Electrospray (ES) or Atmospheric Pressure Chemical Ionization (APCI) probes individually or simultaneously and ionized. The gas phase ion mixture resulting from individual solutions sprayed from multiple ES or APCI probe inputs is mass analyzed. In this manner a calibration solution can be introduced through one ES or APCI probe while one or more sample solutions are spray from additional probes. Simultaneous spraying of calibration and sample solutions, results in an acquired mass spectrum containing peaks of ions with known molecular weights as well as sample related peaks. The calibration peaks can be used as an internal calibration standard during data analysis. Acquisition of mass spectra containing internal calibration peaks can be achieved by spraying different solutions simultaneously from multiple inlet probes without having to mix calibration and sample solutions in the liquid phase. Arrangements of ES and APCI probes can be configured in one API source chamber and the solution flow through any combination of ES or APCI probes can be switched on or off during an analytical run. A single mass analyzer can serve as a detector for multiple separation systems each delivering sample solution through separate ES or APCI inlet probes into an atmospheric pressure ion source.
Abstract:
Collisional cooling of ions in mass spectrometry has been known for sometime. It is known that collisional cooling can promote focusing of ions along the axis of an ion guide. A similar technique has been used to enhance coupling of a pulsed ion source such as a MALDI source to a Time of Flight instrument. It is now realized that it is desirable to provide, immediately adjacent to a MALDI or other ion source, a low-pressure region to promote ionization conditions most favorable for the particular ion source. Then, with the ions released and free, the ions are subjected to relatively rapid collisional cooling in a high pressure region adjacent to the ionization region. This will dissipate excess of internal energy in the ions, so as to substantially reduce the incidence of metastable fragmentation of the ions. The ions can then be subjected to conventional mass analysis steps.
Abstract:
A method of manufacturing an electron source is provided in which the manufacturing steps of the electron source provided with a plurality of surface conduction electron-emitting devices can be simplified and which attains an improvement in electron-emitting characteristics of the respective devices, and a method of manufacturing an image-forming apparatus is also provided. The method of manufacturing an electro source comprising the steps of: providing a substrate on which a plurality of units, each unit including a pair of electrodes and a polymer film of connecting the pair of electrodes, selecting one or more units from the plurality of units, applying a potential difference across the pair of electrodes that is included in each of the selected one or more units, and irradiating light or a particle beam to the polymer film included in each of the selected one or more units in a state of being applied with the potential difference. And, the step of irradiating the light or particle beam is adapted so as to be started after starting the step of applying the potential difference. As a result, a carbon film used for an electron-emitting portion can be formed with a small number of steps in accordance with the manufacturing method.
Abstract:
A method for reducing a dinitrogen (N2) ion concentration in an ion implanter including providing an ion implanter having an ion source chamber for producing source ions said ion source chamber surrounded by a plurality of source magnets having a current supply for altering a position of said source ions; providing a gaseous source of material to the ion source chamber for ionization thereby creating a supply of source ions for implantation; creating a supply of source ions to include dinitrogen (N2) ions and nitrogen (N) ions supplied for implantation; and, increasing a current supply to at least one of the plurality of source magnets such that a ratio of dinitrogen (N2) ions to nitrogen (N) ions supplied for implantation is reduced.
Abstract:
An ion source for an ion implanter is provided, comprising: (i) a sublimator (52) having a cavity (66) for receiving a source material (68) to be sublimated and for sublimating the source material; (ii) a gas injector (104) for injecting gas into the cavity (66); (iii) an ionization chamber (58) for ionizing the sublimated source material, the ionization chamber located remotely from the sublimator; and (iv) a feed tube (62) for connecting the sublimator (52) to the ionization chamber (58). The gas injected into the cavity may be either helium or hydrogen, and is designed to improve the heat transferability between walls (64) of the sublimator (52) and the source material (68).
Abstract:
Methods and apparatus for simultaneous vaporization and ionization of a sample in a spectrometer prior to introducing the sample into the drift tube of the analyzer are disclosed. The apparatus includes a vaporization/ionization source having an electrically conductive conduit configured to receive sample particulate which is conveyed to a discharge end of the conduit. Positioned proximate to the discharge end of the conduit is an electrically conductive reference device. The conduit and the reference device act as electrodes and have an electrical potential maintained between them sufficient to cause a corona effect, which will cause at least partial simultaneous ionization and vaporization of the sample particulate. The electrical potential can be maintained to establish a continuous corona, or can be held slightly below the breakdown potential such that arrival of particulate at the point of proximity of the electrodes disrupts the potential, causing arcing and the corona effect. The electrical potential can also be varied to cause periodic arcing between the electrodes such that particulate passing through the arc is simultaneously vaporized and ionized. The invention further includes a spectrometer containing the source. The invention is particularly useful for ion mobility spectrometers and atmospheric pressure ionization mass spectrometers.
Abstract:
In an ion implantation method using an ion implantation equipment having an extraction electrode and a post accelerator, ion is uniformly implanted into a shallow region from the surface of a sample by setting an applied volt. of the post accelerator higher than an applied volt. of the extraction electrode.
Abstract:
An oxygen ion containing plasma is generated using a hot filament ion source. The oxygen ions in the plasma come from an oxide source (e.g., a metal oxide) which has a lower free energy of formation than that of the filament metal oxide (e.g., WO3) at the operating temperatures of the ion source. Consequently, oxidation of the filament and other metal components of the arc chamber is limited, or even prevented. Thus, the invention can advantageously lead to longer filament lives as compared to certain conventional processes that generate oxygen plasmas using hot filament sources.
Abstract:
An electrospray ion source is fitted with plural spray nozzles. A nebulization gas is supplied to the nozzles. The supply of the nebulization gas to at least a selected one of the spray nozzles is cut off for a given time. The application of the high voltage to the spray nozzle, for which the supply of the nebulization gas is cut off, is synchronously ceased.
Abstract:
According to the ion generation method, ion source material composed of an element of desired ions to be generated and I is heated so that vapor of the compound is generated, and the ions are generated by discharging the vapor. The iodide has no corrosiveness, and can be stably ionized. Further, it hardly reacts with oxygen or water and is safe.