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    Two-Dimensional Spatial Radiation Modulator
    202.
    发明申请
    Two-Dimensional Spatial Radiation Modulator 有权
    二维空间辐射调制器

    公开(公告)号：US20080043314A1

    公开(公告)日：2008-02-21

    申请号：US11925115

    申请日：2007-10-26

    Applicant: Thomas Hagler

    Inventor： Thomas Hagler

    IPC: G02F1/00

    CPC classification number: G01J3/02 ,  G01J3/0202 ,  G01J3/0208 ,  G01J3/021 ,  G01J3/0216 ,  G01J3/0218 ,  G01J3/0229 ,  G01J3/027 ,  G01J3/0289 ,  G01J3/06 ,  G01J3/1804 ,  G01J3/2846 ,  G01J3/42 ,  G01J2001/4242 ,  G01J2003/1217

    Abstract: A two dimensional spatial radiation modulator rotated about a rotation axis to modulate components of an incident radiation beam to encode the beam. The modulator includes sub-regions in a first annular segment being patterned to form a pair of radiation filters having substantially complementary modulation functions. The pair of radiation filters produces a first encoded component with a characteristic determined by the relative intensities of radiation from the beam incident on the pair of filters. The modulator also includes sub-regions in a second annular segment being patterned to form a filter that produces a second encoded component with a characteristic determined by the total intensity of radiation from the beam incident on the filter.

    Abstract translation: 围绕旋转轴旋转的二维空间辐射调制器，以调制入射辐射束的分量以编码光束。 调制器包括在第一环形区段中的子区域被图案化以形成具有实质上互补的调制功能的一对辐射滤波器。 该对辐射滤波器产生具有由入射在该对滤波器上的光束的辐射的相对强度确定的特性的第一编码分量。 调制器还包括被构图的第二环形区段中的子区域，以形成滤波器，该滤波器产生具有由入射在滤波器上的光束的总辐射强度确定的特性的第二编码分量。

    Optical spectrum analyzer
    204.
    发明申请
    Optical spectrum analyzer 有权
    光谱分析仪

    公开(公告)号：US20060170919A1

    公开(公告)日：2006-08-03

    申请号：US11338276

    申请日：2006-01-24

    Applicant: Yoshifumi Takahashi ,  Takanori Saitoh ,  Kenichi Nakamura

    Inventor： Yoshifumi Takahashi ,  Takanori Saitoh ,  Kenichi Nakamura

    IPC: G01J3/28

    CPC classification number: G01J3/28 ,  G01J3/02 ,  G01J3/0202 ,  G01J3/021 ,  G01J3/0243 ,  G01J3/1804 ,  G01J2003/2866

    Abstract: An optical spectrum analyzer measures to-be-measured light while carrying out calibration processing for correcting wavelength information of spectrum data of the to-be-measured light by a wavelength information correction device through a storage device based on the spectrum data of reference light that is obtained by causing the reference light whose wavelength is known to be incident on a tunable wavelength filter from light incident devices at all times together with the to-be-measured light. Since the optical spectrum analyzer can continuously measure the to-be-measured light in a wide wavelength range at high speed while maintaining high wavelength accuracy, it can continuously obtain the spectrum data of the to-be-measured light with high wavelength accuracy even if it is installed in a place in which an environment intensely changes.

    Abstract translation: 光谱分析仪在进行基于参考光的频谱数据的基于光的参考光的频谱数据的波长信息校正装置进行用于校正待测光的光谱数据的波长信息的校准处理时， 通过使波长已知的参考光与待测光一起入射到可调谐波长滤光器上，并从光入射装置始终进入。 由于光谱分析仪可以在保持高波长精度的同时高速连续地测量宽波长范围内的被测光，所以即使在高频波长精度的情况下也可以连续获得待测光的光谱数据 它安装在环境剧烈变化的地方。

    Diffraction grating element
    205.
    发明授权
    Diffraction grating element 有权

    公开(公告)号：US07085054B2

    公开(公告)日：2006-08-01

    申请号：US11147381

    申请日：2005-06-08

    Applicant: Manabu Shiozaki ,  Masakazu Shigehara

    Inventor： Manabu Shiozaki ,  Masakazu Shigehara

    IPC: G02B27/44

    CPC classification number: G01J3/02 ,  G01J3/0286 ,  G01J3/1804 ,  G02B5/18 ,  G02B5/1866 ,  G02B7/008

    Abstract: The present invention provides a diffraction grating element that allows the temperature control mechanism to be dispensed with or simplified. The diffraction grating element of the present invention comprises a transparent plate having a first surface and a second surface that are substantially parallel with one another; and a diffraction grating which is formed on a first surface side with respect to the second surface and is substantially parallel with the first surface. At any temperature within a temperature range −20° C. to +80° C., the sum of the rate of change in the period per unit length of the diffraction grating with respect to a temperature change, and the temperature coefficient of the refractive index of a medium that surrounds the diffraction grating element is 0.

    Diffraction grating element
    207.
    发明申请
    Diffraction grating element 有权
    衍射光栅元件

    公开(公告)号：US20040212890A1

    公开(公告)日：2004-10-28

    申请号：US10761433

    申请日：2004-01-22

    Inventor： Manabu Shiozaki ,  Masakazu Shigehara

    IPC: G02B027/44

    CPC classification number: G01J3/02 ,  G01J3/0286 ,  G01J3/1804 ,  G02B5/18 ,  G02B5/1866 ,  G02B7/008

    Abstract: nullProblemnull Provided is a diffraction grating element that allows the temperature control mechanism to be dispensed with or simplified. nullMeans of Solutionnull A diffraction grating element 1 is a diffraction grating element in which, in a transparent flat plate 10 having a first surface 10A and a second surface 10B which are parallel with one another and are in contact with a medium, a diffraction grating is formed on the first surface 10 A. The grating direction of the diffraction grating formed in the first surface 10A is parallel with the y axis direction, and a recess and protrusion are cyclically formed at a period null in the x axis direction. For example, the medium 21 and 22 are air, and the transparent flat plate 10 consists of silica glass. At any temperature within the temperature range from null20null C. to null80null C., the sum of a linear expansion coefficient of a period null of the diffraction grating and the temperature coefficient of the refractive index of the medium 21 and 22 is 0.

    Abstract translation: [问题]提供一种能够省略或简化温度控制机构的衍射光栅元件。 解决方案衍射光栅元件1是衍射光栅元件，其中在具有彼此平行并与介质接触的第一表面10A和第二表面10B的透明平板10中衍射 光栅形成在第一表面10A上。形成在第一表面10A中的衍射光栅的光栅方向与y轴方向平行，并且在x轴方向上的周期性λλ周期地形成凹部和突起。 例如，介质21和22是空气，透明平板10由石英玻璃构成。 在-20°C至+ 80°C的温度范围内的任何温度下，衍射光栅的周期λ的线性膨胀系数与介质21和22的折射率的温度系数之和为 0。

    High resolution spectral measurement device
    208.
    发明授权
    High resolution spectral measurement device 有权
    高分辨率光谱测量装置

    公开(公告)号：US06713770B2

    公开(公告)日：2004-03-30

    申请号：US10098975

    申请日：2002-03-15

    Applicant: Richard L. Sandstrom ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Scott T. Smith ,  Daniel J. W. Brown

    Inventor： Richard L. Sandstrom ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Scott T. Smith ,  Daniel J. W. Brown

    IPC: G01J314

    CPC classification number: G01J3/26 ,  G01J1/4257 ,  G01J3/02 ,  G01J3/0205 ,  G01J3/12 ,  G01J3/1804 ,  G01J3/22 ,  G01J9/02

    Abstract: A high resolution spectral measurement device. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow-band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the insulator and scanning the laser wavelength over a range which includes the monochromator slit wavelength. In a second embodiment the second slit and the light detector is replaced by a photodiod array and the bandwidth of a laser beam is determined by analyzing a set of scan data from the photodiode array. Alternately, the laser wavelength can be fixed near the middle of the spectrum range of the grating spectrometer, and the etalon can be scanned.

    Abstract translation: 高分辨率光谱测量装置。 优选的实施例在紫外线范围内呈现非常窄的狭缝功能，并且对于测量用于集成电路光刻的窄带准分子激光器的带宽是非常有用的。 来自激光的光被聚焦成漫射器，并且离开扩散器的漫射光照射标准具。 将其从标准具出射的光的一部分收集并引导到位于标准具的边缘图案处的狭缝中。 通过狭缝的光线被准直，并且准直光照射位于大约Littrow配置中的光栅，其根据波长散发光。 表示对应于所选择的标准具条纹的波长的调度光​​的一部分通过第二狭缝并由光检测器监视。 当标准具和光栅调谐到相同的精确波长时，定义狭缝功能，其极窄，例如约0.034μm（FWHM）和约0.091μm（95％积分）。 通过激光束的引导部分进入绝缘体并且在包括单色器狭缝波长的范围内扫描激光波长，可以非常精确地测量激光束的带宽。 在第二实施例中，第二狭缝和光检测器由光电二极管阵列替代，并且通过分析来自光电二极管阵列的一组扫描数据来确定激光束的带宽。 或者，激光波长可以固定在光栅光谱仪的光谱范围附近，可以扫描标准具。

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