Abstract:
The illumination power density of a multi-spot inspection system is adjusted in response to detecting a large particle in the inspection path of an array of primary illumination spots. At least one low power, secondary illumination spot is located in the inspection path of an array of relatively high power primary illumination spots. Light scattered from the secondary illumination spot is collected and imaged onto one or more detectors without overheating the particle and damaging the wafer. Various embodiments and methods are presented to distinguish light scattered from secondary illumination spots. In response to determining the presence of a large particle in the inspection path of a primary illumination spot, a command is transmitted to an illumination power density attenuator to reduce the illumination power density of the primary illumination spot to a safe level before the primary illumination spot reaches the large particle.
Abstract:
A high-throughput optical suspension characterization instrument is disclosed, which can include hydraulically separate and at least partially transparent sample containers. A selection mechanism is operative to selectively direct light from a light source (12) through different ones of the sample containers along an optical axis, and an off-axis scattering detector (38,24) is responsive to scattered light from the light source after it has interacted with a sample. Phase analysis light scattering is used to determine the electrophoretic mobility and zeta potential of samples. A second instrument is disclosed, wherein all sample containers are illuminated simultaneously. Transmitted light is collected by a camera. The electrophoretic mobility and hydrodynamic size of the samples may be determined.
Abstract:
A surface inspecting apparatus rotates a semiconductor wafer 100 (inspection object) as a main scan while translating the semiconductor wafer 100 as an auxiliary scan, illuminates the surface of the semiconductor wafer 100 with illuminating light 21, thereby forms an illumination spot 3 as the illumination area of the illuminating light 21, detects scattered or diffracted or reflected light from the illumination spot, and detects a foreign object existing on the surface of the semiconductor wafer 100 or in a part of the semiconductor wafer 100 in the vicinity of the surface based on the result of the detection. In the surface inspecting apparatus, the translation speed of the auxiliary scan is controlled according to the distance from the rotation center of the semiconductor wafer 100 in the main scan to the illumination spot. With this control, the inspection time can be shortened while the deterioration in the detection sensitivity and the increase in the thermal damage during the surface inspection are suppressed.
Abstract:
In an examining apparatus or method, values of thickness and characteristic of an object, or distributions thereof can be simultaneously acquired. The examining apparatus includes a portion 9 for irradiating an object 2 with radiation, a portion 10 for detecting the radiation from the object, an acquiring portion 26, a storing portion 21 and a calculating portion 20. The acquiring portion acquires transmission time associated with detection time of radiation, and amplitude of the radiation. The storing portion beforehand stores relationship data between the transmission time and amplitude, and representative values of characteristic of the object. The calculating portion obtains values of thickness and characteristic of the object based on the transmission time, amplitude and relationship data.
Abstract:
The present invention relates generally to the field of biochemical laboratory instrumentation for different applications of measuring properties of samples on e.g. microtitration plates and corresponding sample supports. The object of the invention is achieved by providing an optical measurement instrumentation wherein a sample (281-285) is activated (212AS, 218AS) and the emission is detected (291, 292), wherein between the activation and detection phases of measuring the sample, a shift is made in the relative position between the sample and means (218) directing the activation radiation to the sample as well as in the relative position between the sample and the means (293) receiving the emission radiation from the sample. This can be implemented e.g. by moving (299) the sample assay plate and/or a measuring head between the activation and emission phases of a sample. The invention allows a simultaneous activation of a first sample and detecting emission from a second sample thus enhancing efficiency of the measurement.
Abstract:
Methods for determining corrosion products on a substrate are disclosed. In one embodiment, a non-destructive method for determining an amount of corrosion product on a metallic substrate includes non-destructively determining a value Ia of infrared energy absorbed in a corrosion product on a metallic substrate; and correlating the value Ia of the infrared energy absorbed to an amount of the corrosion product.
Abstract:
The disclosure is directed to systems and methods for precisely measuring birefringence properties of large-format samples of optical elements. A gantry-like configuration is employed for precise movement of birefringence measurement system components relative to the sample. There is also provided an effective large-format sample holder that adequately supports the sample to prevent induced birefringence therein while still presenting a large area of the sample to the unhindered passage of light.
Abstract:
A non-destructive method is provided for determining amount and distribution of a corrosion product on a metallic substrate. A value of infrared energy reflected from the metallic substrate without corrosion is determined. A value of infrared energy reflected from the metallic substrate with the corrosion product is determined. A value of infrared energy absorbed in the corrosion product is determined, and the value of the infrared energy absorbed in the corrosion product is correlated to an amount of the corrosion product.
Abstract:
The disclosure is directed to systems and methods for precisely measuring birefringence properties of large-format samples of optical elements. A gantry-like configuration is employed for precise movement of birefringence measurement system components relative to the sample. There is also provided an effective large-format sample holder that adequately supports the sample to prevent induced birefringence therein while still presenting a large area of the sample to the unhindered passage of light.
Abstract:
Apparatus for the manipulation, processing and observation of small particles, in particular biological particles, is disclosed. A first laser (4) generates light beams in a first wavelength range, which are focused with a first optical device (12, 13; 14, 15) and form an optical trap. A object holder (22) serves to contain the relevant particles. In addition a light source (17) for observation light is provided, whereas observation and recording devices serve to observe particles and record their behavior. A second laser (3) generates light beams in a second wavelength range, which are focused in order to manipulate particles in the object holder. The optical devices for the individual light beams can be positioned and focused independently of one another, and at the beginning of manipulation and observation the beams are focused in the same object plane of the object holder independently of their wavelengths.